Thorsten Lill

1.9k total citations · 1 hit paper
55 papers, 1.4k citations indexed

About

Thorsten Lill is a scholar working on Electrical and Electronic Engineering, Materials Chemistry and Computational Mechanics. According to data from OpenAlex, Thorsten Lill has authored 55 papers receiving a total of 1.4k indexed citations (citations by other indexed papers that have themselves been cited), including 49 papers in Electrical and Electronic Engineering, 27 papers in Materials Chemistry and 8 papers in Computational Mechanics. Recurrent topics in Thorsten Lill's work include Semiconductor materials and devices (44 papers), Plasma Diagnostics and Applications (24 papers) and Electronic and Structural Properties of Oxides (16 papers). Thorsten Lill is often cited by papers focused on Semiconductor materials and devices (44 papers), Plasma Diagnostics and Applications (24 papers) and Electronic and Structural Properties of Oxides (16 papers). Thorsten Lill collaborates with scholars based in United States, France and Austria. Thorsten Lill's co-authors include Keren J. Kanarik, Richard A. Gottscho, Samantha Tan, Vahid Vahedi, Jeffrey M. Marks, Eric A. Hudson, Saravanapriyan Sriraman, O. Joubert, Andreas Fischer and Steven M. George and has published in prestigious journals such as Science, Physical Review Letters and Physical review. B, Condensed matter.

In The Last Decade

Thorsten Lill

50 papers receiving 1.4k citations

Hit Papers

align trajectories

What are hit papers?

Hit papers significantly outperform the citation benchmark for their cohort. A paper qualifies if it has ≥500 total citations, achieves ≥1.5× the top-1% citation threshold for papers in the same subfield and year (this is the minimum needed to enter the top 1%, not the average within it), or reaches the top citation threshold in at least one of its specific research topics.

Overview of atomic layer etching in the semiconductor industry

2015 479 citations Keren J. Kanarik, Thorsten Lill et al. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films profile →

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name	h						Papers	Cites
Thorsten Lill United States	20	1.3k	611	317	166	156	55	1.4k
D. Leonhardt United States	20	653 0.5×	244 0.4×	342 1.1×	126 0.8×	80 0.5×	48	957
Tetsuya Tatsumi Japan	21	1.4k 1.1×	416 0.7×	494 1.6×	235 1.4×	310 2.0×	67	1.5k
Gilles Cunge France	17	750 0.6×	323 0.5×	297 0.9×	77 0.5×	48 0.3×	30	915
R. E. Sah Germany	13	405 0.3×	433 0.7×	221 0.7×	80 0.5×	36 0.2×	42	754
W. A. P. Claassen Netherlands	17	735 0.6×	489 0.8×	136 0.4×	85 0.5×	354 2.3×	22	1.1k
Lei Pan United States	19	785 0.6×	895 1.5×	87 0.3×	85 0.5×	169 1.1×	48	1.2k
J. C. Loulergue France	16	417 0.3×	294 0.5×	233 0.7×	174 1.0×	111 0.7×	49	899
N. N. Efremow United States	19	794 0.6×	851 1.4×	314 1.0×	284 1.7×	33 0.2×	40	1.4k
C. W. Jurgensen United States	13	764 0.6×	171 0.3×	267 0.8×	119 0.7×	141 0.9×	30	917
G. Este Canada	11	720 0.6×	369 0.6×	230 0.7×	65 0.4×	78 0.5×	19	947

Countries citing papers authored by Thorsten Lill

Since Specialization

Citations

This map shows the geographic impact of Thorsten Lill's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Thorsten Lill with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Thorsten Lill more than expected).

Fields of papers citing papers by Thorsten Lill

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Thorsten Lill. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Thorsten Lill. The network helps show where Thorsten Lill may publish in the future.

Co-authorship network of co-authors of Thorsten Lill

This figure shows the co-authorship network connecting the top 25 collaborators of Thorsten Lill. A scholar is included among the top collaborators of Thorsten Lill based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Thorsten Lill. Thorsten Lill is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

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20 of 20 papers shown

Lill, Thorsten, et al.. (2025). Formation and stability of ammonium fluorosilicate during etching of SiN x in CH2F2/Ar and SF6/H2 plasmas. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 43(6).

Lill, Thorsten, Dong‐Jun Wu, Tae‐Won Kim, et al.. (2024). Low-temperature etching of silicon oxide and silicon nitride with hydrogen fluoride. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 42(6). 10 indexed citations

Shen, Meihua, et al.. (2023). Progress report on high aspect ratio patterning for memory devices. Japanese Journal of Applied Physics. 62(SI). SI0801–SI0801. 12 indexed citations

Johnson, Virginia L., Andrew S. Cavanagh, Andreas Fischer, et al.. (2023). Thermal Atomic Layer Etching of CoO, ZnO, Fe₂O₃, and NiO by Chlorination and Ligand Addition Using SO₂Cl₂ and Tetramethylethylenediamine. Chemistry of Materials. 35(5). 2058–2068. 15 indexed citations

Fischer, Andreas & Thorsten Lill. (2023). Plasma application in atomic layer etching. Physics of Plasmas. 30(8). 15 indexed citations

Lill, Thorsten, et al.. (2023). Neutral transport during etching of high aspect ratio features. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 41(3). 4 indexed citations

Lii-Rosales, Ann, Virginia L. Johnson, Andrew S. Cavanagh, et al.. (2022). Effectiveness of Different Ligands on Silane Precursors for Ligand Exchange to Etch Metal Fluorides. Chemistry of Materials. 34(19). 8641–8653. 6 indexed citations

Fischer, Andreas, et al.. (2022). Surface reaction modelling of thermal atomic layer etching on blanket hafnium oxide and its application on high aspect ratio structures. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 41(1). 4 indexed citations

Fischer, Andreas, et al.. (2022). Control of etch profiles in high aspect ratio holes via precise reactant dosing in thermal atomic layer etching. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 40(2). 5 indexed citations

10.

Lii-Rosales, Ann, Virginia L. Johnson, Sandeep Sharma, et al.. (2022). Volatile Products from Ligand Addition of P(CH₃)₃ to NiCl₂, PdCl₂, and PtCl₂: Pathway for Metal Thermal Atomic Layer Etching. The Journal of Physical Chemistry C. 126(19). 8287–8295. 9 indexed citations

11.

Lii-Rosales, Ann, Andrew S. Cavanagh, Andreas Fischer, Thorsten Lill, & Steven M. George. (2021). Spontaneous Etching of Metal Fluorides Using Ligand-Exchange Reactions: Landscape Revealed by Mass Spectrometry. Chemistry of Materials. 33(19). 7719–7730. 27 indexed citations

12.

Fischer, Andreas, et al.. (2020). Thermal etching of AlF3 and thermal atomic layer etching of Al2O3. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 38(2). 20 indexed citations

13.

Lill, Thorsten, Keren J. Kanarik, Samantha Tan, et al.. (2018). Atomic Layer Etching: Benefits and Challenges. 41–43. 3 indexed citations

14.

Kanarik, Keren J., Samantha Tan, Wenbing Yang, et al.. (2017). Predicting synergy in atomic layer etching. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 35(5). 98 indexed citations

15.

Lill, Thorsten, Samantha Tan, Keren J. Kanarik, et al.. (2015). Patterning in the era of atomic scale fidelity. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9428. 942809–942809. 6 indexed citations

16.

Lill, Thorsten, Keren J. Kanarik, Samantha Tan, et al.. (2015). (Invited) Divide Et Impera: Towards New Frontiers with Atomic Layer Etching. ECS Transactions. 69(7). 259–268. 2 indexed citations

17.

Kanarik, Keren J., Thorsten Lill, Eric A. Hudson, et al.. (2015). Overview of atomic layer etching in the semiconductor industry. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 33(2). 479 indexed citations breakdown →

18.

Joubert, O., et al.. (2005). Mass spectrometry studies of resist trimming processes in HBr∕O2 and Cl2∕O2 chemistries. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 23(1). 103–112. 20 indexed citations

19.

Vallier, L., J. Foucher, E. Pargon, et al.. (2003). Chemical topography analyses of silicon gates etched in HBr/Cl2/O2 and HBr/Cl2/O2/CF4 high density plasmas. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 21(2). 904–911. 21 indexed citations

20.

Layadi, N., et al.. (1999). Interferometry for end point prediction during plasma etching of various structures in complementary metal–oxide–semiconductor device fabrication. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 17(6). 2630–2637. 6 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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