Bernd Loechel

479 total citations
33 papers, 363 citations indexed

About

Bernd Loechel is a scholar working on Electrical and Electronic Engineering, Biomedical Engineering and Surfaces, Coatings and Films. According to data from OpenAlex, Bernd Loechel has authored 33 papers receiving a total of 363 indexed citations (citations by other indexed papers that have themselves been cited), including 24 papers in Electrical and Electronic Engineering, 17 papers in Biomedical Engineering and 6 papers in Surfaces, Coatings and Films. Recurrent topics in Bernd Loechel's work include Advancements in Photolithography Techniques (14 papers), Nanofabrication and Lithography Techniques (10 papers) and Advanced Surface Polishing Techniques (7 papers). Bernd Loechel is often cited by papers focused on Advancements in Photolithography Techniques (14 papers), Nanofabrication and Lithography Techniques (10 papers) and Advanced Surface Polishing Techniques (7 papers). Bernd Loechel collaborates with scholars based in Germany, United States and Taiwan. Bernd Loechel's co-authors include Hans‐Henning Strehblow, G. Gruetzner, Yao Cheng, Martin Bednarzik, Der‐Hsin Wei, A. Erko, Jost Goettert, Gisela Ahrens, Yohannes M. Desta and А. А. Firsov and has published in prestigious journals such as Optics Express, Corrosion Science and Journal of Microelectromechanical Systems.

In The Last Decade

Bernd Loechel

32 papers receiving 332 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Bernd Loechel Germany 10 206 161 72 70 45 33 363
Stéphane Perrin France 12 168 0.8× 424 2.6× 161 2.2× 52 0.7× 57 1.3× 38 502
Minghua Wang China 12 358 1.7× 92 0.6× 157 2.2× 239 3.4× 25 0.6× 43 514
Peide Han China 11 210 1.0× 111 0.7× 65 0.9× 168 2.4× 17 0.4× 31 392
M. Marty France 12 197 1.0× 65 0.4× 56 0.8× 79 1.1× 28 0.6× 28 371
Hiroyuki Ishigaki Japan 11 92 0.4× 90 0.6× 38 0.5× 73 1.0× 36 0.8× 46 340
Jeong‐Soo Lee South Korea 12 235 1.1× 75 0.5× 51 0.7× 96 1.4× 8 0.2× 45 361
Lucie Gembalová Czechia 10 121 0.6× 153 1.0× 123 1.7× 67 1.0× 37 0.8× 25 394
Pinyen Lin United States 6 202 1.0× 145 0.9× 78 1.1× 45 0.6× 22 0.5× 12 324
Feng Wen China 14 257 1.2× 127 0.8× 76 1.1× 214 3.1× 10 0.2× 37 485

Countries citing papers authored by Bernd Loechel

Since Specialization
Citations

This map shows the geographic impact of Bernd Loechel's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Bernd Loechel with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Bernd Loechel more than expected).

Fields of papers citing papers by Bernd Loechel

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Bernd Loechel. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Bernd Loechel. The network helps show where Bernd Loechel may publish in the future.

Co-authorship network of co-authors of Bernd Loechel

This figure shows the co-authorship network connecting the top 25 collaborators of Bernd Loechel. A scholar is included among the top collaborators of Bernd Loechel based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Bernd Loechel. Bernd Loechel is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Agócs, Emil, Bernd Bodermann, Sven Burger, et al.. (2015). Scatterometry reference standards to improve tool matching and traceability in lithographical nanomanufacturing. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9556. 955610–955610. 9 indexed citations
2.
Senf, F., et al.. (2014). Status of laminar grating manufacturing via lithography at HZB. Microsystem Technologies. 20(10-11). 2061–2064. 4 indexed citations
3.
Firsov, А. А., et al.. (2014). Fabrication of digital rainbow holograms and 3-D imaging using SEM based e-beam lithography. Optics Express. 22(23). 28756–28756. 26 indexed citations
4.
Bodermann, Bernd, Bernd Loechel, Frank Scholze, et al.. (2014). Development of a scatterometry reference standard. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9132. 91320A–91320A. 3 indexed citations
5.
Loechel, Bernd, et al.. (2013). Replication of sub-100 nm structures using h- and s-PDMS composite stamps. Microsystem Technologies. 20(10-11). 2001–2004. 2 indexed citations
6.
Goettert, Jost, et al.. (2012). Soft X-Ray Lithography for High-Aspect Ratio Sub-Micrometer Structures. TechConnect Briefs. 2(2012). 188–191. 1 indexed citations
7.
Ahrens, Gisela, et al.. (2008). Investigations of SU-8 removal from metallic high aspect ratio microstructures with a novel plasma technique. Microsystem Technologies. 14(9-11). 1607–1612. 19 indexed citations
8.
Loechel, Bernd, Jost Goettert, G. Gruetzner, et al.. (2008). Extreme aspect ratio NiFe gear wheels for the production of commercially available Micro Harmonic Drive® gears. Microsystem Technologies. 14(9-11). 1675–1681. 5 indexed citations
9.
Barth, Michael, et al.. (2007). SiN photonic crystal cavities: promising tools for the manipulation of light in the visible. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6645. 664503–664503.
10.
Barth, Michael, et al.. (2007). Fabrication and optical characterization of Si 3 N 4 2D-photonic crystals for applications in visible range. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6645. 664505–664505. 2 indexed citations
11.
Loechel, Bernd, et al.. (2006). Fabrication of Nanoimprint stamps for photonic crystals. Journal of Physics Conference Series. 34. 897–903. 15 indexed citations
12.
Loechel, Bernd, et al.. (2006). A new removable resist for high aspect ratio applications. Microsystem Technologies. 13(3-4). 335–338. 5 indexed citations
13.
Loechel, Bernd, et al.. (2003). Cost-effective masks for deep x-ray lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5116. 775–775. 7 indexed citations
14.
Cheng, Yao, et al.. (1999). Wall profile of thick photoresist generated via contact printing. Journal of Microelectromechanical Systems. 8(1). 18–26. 34 indexed citations
15.
Loechel, Bernd, et al.. (1996). Advanced resist processing for thick photoresist applications. Microelectronic Engineering. 30(1-4). 551–554. 2 indexed citations
16.
Loechel, Bernd, et al.. (1996). <title>Influence of resist-baking on the pattern quality of thick photoresists</title>. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 2879. 174–181. 5 indexed citations
17.
Loechel, Bernd, et al.. (1995). Application of ultraviolet depth lithography for surface micromachining. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 13(6). 2934–2939. 6 indexed citations
18.
Loechel, Bernd, et al.. (1995). <title>Surface microcomponents fabricated by UV depth lithography and electroplating</title>. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 2639. 174–184. 3 indexed citations
19.
Strehblow, Hans‐Henning, et al.. (1979). The breakdown of passivity of iron and nickel by fluoride. Corrosion Science. 19(12). 1047–1057. 29 indexed citations
20.
Strehblow, Hans‐Henning, et al.. (1979). The breakdown of passivity of iron and nickel by fluoride. Corrosion Science. 19(7). 1047–1057. 31 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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