Bernd Loechel
- Electrical and Electronic Engineering
- Biomedical Engineering
- Atomic and Molecular Physics, and Optics
- Materials Chemistry
- Surfaces, Coatings and Films top 10%
- Co-authors
- Hans‐Henning StrehblowG. GruetznerYao ChengMartin BednarzikDer‐Hsin WeiA. ErkoJost GoettertGisela Ahrens
- Topics
- Advancements in Photolithography Techniques (14 papers)Nanofabrication and Lithography Techniques (10 papers)Advanced Surface Polishing Techniques (7 papers)
- Partner nations
- GermanyUnited StatesTaiwan
In The Last Decade
Bernd Loechel
32 papers receiving 332 citations
Peers
Comparison fields: 5 of 51
- Electrical and Electronic Engineering 206
- Biomedical Engineering 161
- Atomic and Molecular Physics, and Optics 72
- Materials Chemistry 70
- Surfaces, Coatings and Films 45
Countries citing papers authored by Bernd Loechel
This map shows the geographic impact of Bernd Loechel's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Bernd Loechel with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Bernd Loechel more than expected).
Fields of papers citing papers by Bernd Loechel
This network shows the impact of papers produced by Bernd Loechel. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Bernd Loechel. The network helps show where Bernd Loechel may publish in the future.
Co-authorship network of co-authors of Bernd Loechel
This figure shows the co-authorship network connecting the top 25 collaborators of Bernd Loechel. A scholar is included among the top collaborators of Bernd Loechel based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Bernd Loechel. Bernd Loechel is excluded from the visualization to improve readability, since they are connected to all nodes in the network.
All Works
| # | Work | Indexed citations |
|---|---|---|
| 1 | 9 | |
| 2 | 4 | |
| 3 | 26 | |
| 4 | 3 | |
| 5 | 2 | |
| 6 | Soft X-Ray Lithography for High-Aspect Ratio Sub-Micrometer Structures | 1 |
| 7 | 19 | |
| 8 | 5 | |
| 9 | 0 | |
| 10 | 2 | |
| 11 | 15 | |
| 12 | 5 | |
| 13 | 7 | |
| 14 | 34 | |
| 15 | 2 | |
| 16 | 5 | |
| 17 | 6 | |
| 18 | 3 | |
| 19 | 29 | |
| 20 | 31 |
About Bernd Loechel
Bernd Loechel is a scholar working on Surfaces, Coatings and Films, Metals and Alloys and Electrical and Electronic Engineering, having authored 33 papers that have together received 363 indexed citations. Recurring topics across this work include Advancements in Photolithography Techniques (14 papers), Nanofabrication and Lithography Techniques (10 papers) and Advanced Surface Polishing Techniques (7 papers). The work is most often cited by research in Metals and Alloys (38 citations), Surfaces, Coatings and Films (45 citations) and Biomedical Engineering (161 citations). Bernd Loechel has collaborated with scholars based in Germany, United States and Taiwan. Frequent co-authors include Hans‐Henning Strehblow, G. Gruetzner, Yao Cheng, Martin Bednarzik, Der‐Hsin Wei, A. Erko, Jost Goettert, Gisela Ahrens, Yohannes M. Desta and А. А. Firsov. Their work appears in journals such as Optics Express, Corrosion Science and Journal of Microelectromechanical Systems.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.