P. Coane

762 total citations
39 papers, 443 citations indexed

About

P. Coane is a scholar working on Electrical and Electronic Engineering, Biomedical Engineering and Surfaces, Coatings and Films. According to data from OpenAlex, P. Coane has authored 39 papers receiving a total of 443 indexed citations (citations by other indexed papers that have themselves been cited), including 31 papers in Electrical and Electronic Engineering, 14 papers in Biomedical Engineering and 11 papers in Surfaces, Coatings and Films. Recurrent topics in P. Coane's work include Advancements in Photolithography Techniques (16 papers), Electron and X-Ray Spectroscopy Techniques (9 papers) and Advanced Surface Polishing Techniques (8 papers). P. Coane is often cited by papers focused on Advancements in Photolithography Techniques (16 papers), Electron and X-Ray Spectroscopy Techniques (9 papers) and Advanced Surface Polishing Techniques (8 papers). P. Coane collaborates with scholars based in United States and Germany. P. Coane's co-authors include Kody Varahramyan, Mangilal Agarwal, M. J. Vasile, C. R. Friedrich, Jost Goettert, D. P. Kern, Craig R. Friedrich, T. H. P. Chang, T. Bucelot and G. Shahidi and has published in prestigious journals such as Journal of The Electrochemical Society, Sensors and Actuators B Chemical and Materials Chemistry and Physics.

In The Last Decade

P. Coane

37 papers receiving 422 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
P. Coane United States 12 353 159 81 56 51 39 443
Bernd Loechel Germany 10 206 0.6× 161 1.0× 38 0.5× 72 1.3× 45 0.9× 33 363
Armin Klumpp Germany 17 714 2.0× 162 1.0× 57 0.7× 38 0.7× 25 0.5× 44 781
Yohannes M. Desta United States 10 203 0.6× 267 1.7× 74 0.9× 40 0.7× 30 0.6× 38 371
Alan Myers United States 15 441 1.2× 199 1.3× 178 2.2× 48 0.9× 141 2.8× 37 710
P. Bley Germany 12 261 0.7× 182 1.1× 49 0.6× 67 1.2× 21 0.4× 28 338
Cheryl Hartfield United States 8 130 0.4× 136 0.9× 31 0.4× 34 0.6× 55 1.1× 30 304
G J Ensell United Kingdom 13 376 1.1× 316 2.0× 50 0.6× 139 2.5× 21 0.4× 33 588
Gabi Grützner Germany 13 351 1.0× 494 3.1× 29 0.4× 120 2.1× 86 1.7× 31 593
M. Laudon United States 7 283 0.8× 175 1.1× 46 0.6× 123 2.2× 22 0.4× 15 365
Jae Wan Kwon United States 14 206 0.6× 231 1.5× 29 0.4× 66 1.2× 36 0.7× 51 407

Countries citing papers authored by P. Coane

Since Specialization
Citations

This map shows the geographic impact of P. Coane's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by P. Coane with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites P. Coane more than expected).

Fields of papers citing papers by P. Coane

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by P. Coane. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by P. Coane. The network helps show where P. Coane may publish in the future.

Co-authorship network of co-authors of P. Coane

This figure shows the co-authorship network connecting the top 25 collaborators of P. Coane. A scholar is included among the top collaborators of P. Coane based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with P. Coane. P. Coane is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Agarwal, Mangilal, et al.. (2005). Fluid-actuated variable focal length polymer microlens system. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5721. 170–170. 1 indexed citations
2.
Agarwal, Mangilal, et al.. (2004). Design and fabrication of fluid controlled dynamic optical lens system. Optics and Lasers in Engineering. 43(6). 686–703. 14 indexed citations
3.
Murthy, Shashi K., et al.. (2003). Electroless Deposition of Soft Magnetic CoNiP Thin Films. Journal of The Electrochemical Society. 151(1). C1–C1. 5 indexed citations
4.
Shahidi, G., J. Warnock, B. Davari, et al.. (2003). A high performance BiCMOS technology using 0.25 mu m CMOS and double poly 47 GHz bipolar. 28–29.
5.
Weinberg, Z. A., G. Bronner, P.A. McFarland, et al.. (2002). Trench storage capacitors for high density DRAMs. 835–838. 5 indexed citations
6.
Taur, Y., Shalom J. Wind, Y. J. Mii, et al.. (2002). High performance 0.1 μm CMOS devices with 1.5 V power supply. 127–130. 24 indexed citations
7.
Liu, Yuxin, et al.. (2002). Novel approach to form and pattern sol–gel polymethylsilsesquioxane-based spin-on glass thin and thick films. Sensors and Actuators B Chemical. 88(1). 75–79. 12 indexed citations
8.
Vasile, M. J., et al.. (2000). <title>Silica-like microstructures by x-ray irradiation of polymethylsilsesquioxane spin-on glass films</title>. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 4179. 88–95. 1 indexed citations
9.
Coane, P., et al.. (2000). <title>Preliminary results at the ultradeep x-ray lithography beamline at CAMD</title>. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 4019. 429–435. 3 indexed citations
10.
Coane, P., et al.. (1999). <title>Method for planarizing rigid graphite for use as an x-ray mask substrate</title>. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 3875. 150–154. 1 indexed citations
11.
Coane, P. & Craig R. Friedrich. (1996). Fabrication of composite x-ray masks by micromilling. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 2880. 130–130. 3 indexed citations
12.
Hanafi, H.I., et al.. (1993). The Design, Fabrication and Characterization of 0.15 μm MOS Devices. European Solid-State Device Research Conference. 181–184. 1 indexed citations
13.
Shahidi, G., B. Davari, T. Bucelot, et al.. (1993). Indium channel implant for improved short-channel behavior of submicrometer NMOSFETs. IEEE Electron Device Letters. 14(8). 409–411. 59 indexed citations
14.
Wilson, A.D., et al.. (1988). Advanced electron-beam lithography for 0.5-µm to 0.25-µm device fabrication. IBM Journal of Research and Development. 32(4). 514–522. 3 indexed citations
15.
Coane, P., et al.. (1987). CMOS 0.5-micron unified digital array using full E-beam lithography. 29–30. 1 indexed citations
16.
Coane, P., et al.. (1986). Electron beam / optical mixed lithography at half-micron ground rules. Microelectronic Engineering. 5(1-4). 133–140. 1 indexed citations
17.
Taur, Y., et al.. (1986). 0.5 Micron Gate CMOS Technology Using E-Beam/Optical Mix Lithography. 13–14. 9 indexed citations
18.
Kenney, John M., Janos Kirz, H. Rarback, et al.. (1984). Soft X-ray microscopy at the NSLS. Nuclear Instruments and Methods in Physics Research. 222(1-2). 37–41. 11 indexed citations
19.
Kern, D. P., et al.. (1983). Practical aspects of microfabrication in the 100 nm regime. Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena. 1(4). 1096–1100. 24 indexed citations
20.
Wolf, E. D., et al.. (1975). Composition and detection of alignment marks for electron-beam lithography. Journal of Vacuum Science and Technology. 12(6). 1266–1270. 11 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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