E. J. H. Collart

810 total citations
64 papers, 652 citations indexed

About

E. J. H. Collart is a scholar working on Electrical and Electronic Engineering, Computational Mechanics and Atomic and Molecular Physics, and Optics. According to data from OpenAlex, E. J. H. Collart has authored 64 papers receiving a total of 652 indexed citations (citations by other indexed papers that have themselves been cited), including 59 papers in Electrical and Electronic Engineering, 21 papers in Computational Mechanics and 17 papers in Atomic and Molecular Physics, and Optics. Recurrent topics in E. J. H. Collart's work include Silicon and Solar Cell Technologies (45 papers), Integrated Circuits and Semiconductor Failure Analysis (37 papers) and Ion-surface interactions and analysis (21 papers). E. J. H. Collart is often cited by papers focused on Silicon and Solar Cell Technologies (45 papers), Integrated Circuits and Semiconductor Failure Analysis (37 papers) and Ion-surface interactions and analysis (21 papers). E. J. H. Collart collaborates with scholars based in United Kingdom, United States and Netherlands. E. J. H. Collart's co-authors include Robert J. Visser, N. E. B. Cowern, D. J. Gravesteijn, Susan B. Felch, J. G. M. van Berkum, A. Murrell, M.A. Foad, D. Giubertoni, W. Vandervorst and M. Bersani and has published in prestigious journals such as Physical review. B, Condensed matter, Applied Physics Letters and Journal of Applied Physics.

In The Last Decade

E. J. H. Collart

60 papers receiving 618 citations

Peers

Countries citing papers authored by E. J. H. Collart

Since Specialization

Citations

This map shows the geographic impact of E. J. H. Collart's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by E. J. H. Collart with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites E. J. H. Collart more than expected).

Fields of papers citing papers by E. J. H. Collart

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by E. J. H. Collart. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by E. J. H. Collart. The network helps show where E. J. H. Collart may publish in the future.

Co-authorship network of co-authors of E. J. H. Collart

This figure shows the co-authorship network connecting the top 25 collaborators of E. J. H. Collart. A scholar is included among the top collaborators of E. J. H. Collart based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with E. J. H. Collart. E. J. H. Collart is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

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20 of 20 papers shown

#	Work	Indexed citations
1	Predictive Maintenance Practices for Cryogenic Pumps in Semiconductor Manufacturing 2022 ·E. J. H. Collart, (unknown), (unknown), John A. Nordquist, Paul M. Matthews	1
2	Providing Key Process Enabling Vacuum Capability Through Integrated Sub-Fab Data Management 2019 ·E. J. H. Collart, Michael A. Mooney, (unknown), (unknown), David Hunt, (unknown), (unknown)	1
3	The Carbon Co-implant with Spike RTA Solution for Boron Extension 2006 ·MRS Proceedings ·Bartek Pawlak, E. Augendre, S. Severi, Pierre Eyben, Tom Janssens, (unknown), P. Absil, Wilfried Vandervorst, Susan B. Felch, E. J. H. Collart, R. Schreutelkamp, N. E. B. Cowern	4
4	Applied Quantum X Implant System: Technology Enhancements to Enable Production-Worthy Performance at the 45 nm Node 2006 ·AIP conference proceedings ·A. Murrell, (unknown), R. D. Goldberg, (unknown), (unknown), E. J. H. Collart, (unknown), (unknown), (unknown), (unknown), (unknown), (unknown), (unknown)	1
5	Suppression of phosphorus diffusion by carbon co-implantation 2006 ·Applied Physics Letters ·(unknown), Ray Duffy, (unknown), W. Vandervorst, Susan B. Felch, E. J. H. Collart, N. E. B. Cowern	45
6	Langmuir probe analysis of a BF3 discharge in a high current ion source 2005 ·Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms ·(unknown), B.J. Sealy, E. J. H. Collart, D.G. Armour, R. Gwilliam	1
7	Understanding the role of buried Si/SiO2 interface on dopant and defect evolution in PAI USJ 2005 ·Materials Science and Engineering B ·(unknown), E. J. H. Collart, B. Colombeau, M. Bersani, D. Giubertoni, (unknown), N. E. B. Cowern, K.J. Kirkby	2
8	Suppression of boron interstitial clusters in SOI using vacancy engineering 2005 ·Materials Science and Engineering B ·A. J. Smith, B. Colombeau, R. Gwilliam, N. E. B. Cowern, B.J. Sealy, M. Milosavljević, E. J. H. Collart, S. Gennaro, M. Bersani, Mario Barozzi	7
9	Electrical profiles of ultra-low energy antimony implants in silicon 2004 ·MRS Proceedings ·(unknown), R. Gwilliam, N. G. Emerson, B.J. Sealy, E. J. H. Collart	2
10	AVS Newsletter Conference Report USJ-2003: The Seventh International Workshop on: Fabrication, Characterization, and Modeling of Ultra-Shallow Doping Profiles in Semiconductors 2003 ·Joseph J. Kopanski, E. J. H. Collart	0
11	Use of two beam energies in secondary ion mass spectrometry analysis of shallow implants: Resolution-matched profiling 2000 ·Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ·G. A. Cooke, (unknown), Mark Dowsett, (unknown), A. Murrell, E. J. H. Collart	3
12	Determination of the Distribution of Ion Implantation Boron in Silicon 2000 ·MRS Proceedings ·(unknown), A.G. Cullis, E. J. H. Collart, A. Murrell, M.A. Foad	1
13	Process interactions between low-energy ion implantation and rapid-thermal annealing for optimized ultrashallow junction formation 2000 ·Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ·A. Murrell, E. J. H. Collart, M.A. Foad, (unknown)	14
14	Practical Aspects of Forming Ultra-Shallow Junctions by Sub-keV Boron Implants 1999 ·MRS Proceedings ·M.A. Foad, A. Murrell, E. J. H. Collart, (unknown), D. A. Jennings, Michael Current	8
15	Characterisation of Low Energy Boron Implantation and Fast Ramp-Up Rapid Thermal Annealing 1998 ·MRS Proceedings ·E. J. H. Collart, (unknown), A. Murrell, M.A. Foad	6
16	Low energy boron implantation in silicon and room temperature diffusion 1998 ·Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms ·E. J. H. Collart, (unknown), N. E. B. Cowern, (unknown), (unknown), J. G. M. van Berkum, D. J. Gravesteijn	17
17	Characterization of low-energy (100 eV–10 keV) boron ion implantation 1998 ·Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ·E. J. H. Collart, (unknown), D. J. Gravesteijn, J. G. M. van Berkum	38
18	A Growth Model of Stress Voids in Integrated Circuit Metallization 1997 ·MRS Proceedings ·(unknown), E. J. H. Collart	1
19	Deep-level transient spectroscopy study of narrow SiGe quantum wells with high Ge content 1996 ·Physical review. B, Condensed matter ·K. Schmalz, I. N. Yassievich, E. J. H. Collart, D. J. Gravesteijn	24
20	Ion-induced etching of organic polymers in argon and oxygen radio-frequency plasmas 1994 ·Journal of Applied Physics ·(unknown), Robert J. Visser, E. J. H. Collart	46

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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