Mitsuru Okigawa

693 total citations
29 papers, 597 citations indexed

About

Mitsuru Okigawa is a scholar working on Electrical and Electronic Engineering, Materials Chemistry and Electronic, Optical and Magnetic Materials. According to data from OpenAlex, Mitsuru Okigawa has authored 29 papers receiving a total of 597 indexed citations (citations by other indexed papers that have themselves been cited), including 24 papers in Electrical and Electronic Engineering, 12 papers in Materials Chemistry and 8 papers in Electronic, Optical and Magnetic Materials. Recurrent topics in Mitsuru Okigawa's work include Plasma Diagnostics and Applications (16 papers), Thin-Film Transistor Technologies (8 papers) and Ga2O3 and related materials (6 papers). Mitsuru Okigawa is often cited by papers focused on Plasma Diagnostics and Applications (16 papers), Thin-Film Transistor Technologies (8 papers) and Ga2O3 and related materials (6 papers). Mitsuru Okigawa collaborates with scholars based in Japan, United States and South Korea. Mitsuru Okigawa's co-authors include Seiji Samukawa, Yasushi Ishikawa, Makoto Sekine, Miyako Matsui, Tomoaki Tatsumi, Takashi Shinohe, Katsuaki Kawara, Yuichi Oshima, Takeyoshi Nakayama and Satoshi Morishita and has published in prestigious journals such as Applied Physics Letters, Japanese Journal of Applied Physics and Solid State Communications.

In The Last Decade

Mitsuru Okigawa

28 papers receiving 565 citations

Peers

Countries citing papers authored by Mitsuru Okigawa

Since Specialization

Citations

This map shows the geographic impact of Mitsuru Okigawa's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Mitsuru Okigawa with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Mitsuru Okigawa more than expected).

Fields of papers citing papers by Mitsuru Okigawa

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Mitsuru Okigawa. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Mitsuru Okigawa. The network helps show where Mitsuru Okigawa may publish in the future.

Co-authorship network of co-authors of Mitsuru Okigawa

This figure shows the co-authorship network connecting the top 25 collaborators of Mitsuru Okigawa. A scholar is included among the top collaborators of Mitsuru Okigawa based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Mitsuru Okigawa. Mitsuru Okigawa is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

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20 of 20 papers shown

#	Work	Indexed citations
1	Rapid growth of α -Ga ₂ O ₃ by HCl-boosted halide vapor phase epitaxy and effect of precursor supply conditions on crystal properties 2020 ·Semiconductor Science and Technology ·Yuichi Oshima, Katsuaki Kawara, Takayoshi Oshima, Mitsuru Okigawa, Takashi Shinohe	26
2	Phase-controlled epitaxial lateral overgrowth of α -Ga ₂ O ₃ by halide vapor phase epitaxy 2020 ·Japanese Journal of Applied Physics ·Yuichi Oshima, Katsuaki Kawara, Takayoshi Oshima, Mitsuru Okigawa, Takashi Shinohe	18
3	Elimination of threading dislocations inα-Ga₂O₃by double-layered epitaxial lateral overgrowth 2020 ·Applied Physics Express ·Katsuaki Kawara, Yuichi Oshima, Mitsuru Okigawa, Takashi Shinohe	32
4	Effects of Thermal Annealing for Restoration of UV Irradiation Damage during Plasma Etching Processes 2006 ·Japanese Journal of Applied Physics ·Yoshinari Ichihashi, Yasushi Ishikawa, Yuji Kato, (unknown), Mitsuru Okigawa, Seiji Samukawa	13
5	In vacuo measurements of dangling bonds created during Ar-diluted fluorocarbon plasma etching of silicon dioxide films 2005 ·Applied Physics Letters ·Kenji Ishikawa, Mitsuru Okigawa, Yasushi Ishikawa, Seiji Samukawa, Satoshi Yamasaki	14
6	On-wafer monitoring of plasma-induced electrical current in silicon dioxide to predict plasma radiation damage 2005 ·Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ·Mitsuru Okigawa, Yasushi Ishikawa, Seiji Samukawa	7
7	Plasma-Radiation-Induced Interface States in Metal-Nitride-Oxide-Silicon Structure of Charge-Coupled Device Image Sensor and Their Reduction Using Pulse-Time-Modulated Plasma 2003 ·Japanese Journal of Applied Physics ·Mitsuru Okigawa, Yasushi Ishikawa, Seiji Samukawa	33
8	Reduction of ultraviolet-radiation damage in SiO2 using pulse-time-modulated plasma and its application to charge coupled 44 device image sensor processes 2003 ·Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ·Mitsuru Okigawa, Yasushi Ishikawa, Seiji Samukawa	37
9	Reduction of ultra-violet-radiation induced damage and its time-resolved measurement using pulse-time-modulated plasma 2003 ·Mitsuru Okigawa, Yoji Ishikawa, Shinya Kumagai, Seiji Samukawa	2
10	CF and CF₂Radical Densities in 13.56-MHz CHF₃/Ar Inductively Coupled Plasma 2002 ·Japanese Journal of Applied Physics ·Hideo Nakagawa, Mitsuru Okigawa, Satoshi Morishita, Shuichi Noda, Hisataka Hayashi, (unknown), Masami Inoue, Makoto Sekine	10
11	On-Wafer Monitoring of Vacuum-Ultraviolet Radiation Damage in High-Density Plasma Processes 2001 ·Japanese Journal of Applied Physics ·Seiji Samukawa, Yasushi Ishikawa, Shinya Kumagai, Mitsuru Okigawa	48
12	Control of surface reactions in high-performance SiO2 etching 2000 ·Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ·Tomoaki Tatsumi, Miyako Matsui, Mitsuru Okigawa, Makoto Sekine	102
13	Characterization of 100 MHz inductively coupled plasma (ICP) by comparison with 13.56 MHz ICP 1999 ·Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ·Hideo Nakagawa, Satoshi Morishita, Shuichi Noda, Mitsuru Okigawa, (unknown), Makoto Sekine, Kohei Ito	14
14	Mechanism of fluorine reduction in C4F8/Ar parallel-plate-type electron-cyclotron-resonance plasma by a Si top plate 1999 ·Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ·Hisataka Hayashi, Mitsuru Okigawa, Satoshi Morishita, Makoto Sekine	7
15	Analyses of Radicals in Etching Plasma Using Laser Spectroscopy in Association of Super-Advanced Electronics Technologies 1998 ·The Review of Laser Engineering ·Naoshi Itabashi, Hisataka Hayashi, Tetsuya Tatsumi, Mitsuru Okigawa, Hideo Nakagawa, Masami Inoue	0
16	Monitoring of Electron Energy Distribution Change from Optical Emission for Nonmagnetic Ultrahigh-Frequency Plasma 1998 ·Japanese Journal of Applied Physics ·Keizo Kinoshita, Shuichi Noda, Mitsuru Okigawa, Yukinobu Hikosaka, Naoshi Itabashi, Masami Inoue	4
17	Mechanism of Radical Control in Capacitive RF Plasma for ULSI Processing 1998 ·Japanese Journal of Applied Physics ·Tetsuya Tatsumi, Hisataka Hayashi, Satoshi Morishita, Shuichi Noda, Mitsuru Okigawa, Naoshi Itabashi, Yukinobu Hikosaka, Masami Inoue	57
18	Plasma-Wall Interactions in Dual Frequency Narrow-Gap Reactive Ion Etching System 1998 ·Japanese Journal of Applied Physics ·Satoshi Morishita, Hisataka Hayashi, Tetsuya Tatsumi, Yukinobu Hikosaka, Shuichi Noda, Mitsuru Okigawa, Miyako Matsui, Masami Inoue, Makoto Sekine	12
19	A new type of laser-induced surface damage of GaAs 1984 ·Solid State Communications ·Mitsuru Okigawa, Takeyoshi Nakayama, Kazuyoshi Takayama, Noriaki Itoh	10
20	Dependence of laser-induced damage of surface layers of GaP on pulse width and wavelength 1983 ·Applied Physics Letters ·Mitsuru Okigawa, Takeyoshi Nakayama, Kenji Morita, Noriaki Itoh	9

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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