J. L. Mauer

576 total citations
20 papers, 369 citations indexed

About

J. L. Mauer is a scholar working on Electrical and Electronic Engineering, Surfaces, Coatings and Films and Radiation. According to data from OpenAlex, J. L. Mauer has authored 20 papers receiving a total of 369 indexed citations (citations by other indexed papers that have themselves been cited), including 14 papers in Electrical and Electronic Engineering, 8 papers in Surfaces, Coatings and Films and 3 papers in Radiation. Recurrent topics in J. L. Mauer's work include Advancements in Photolithography Techniques (8 papers), Electron and X-Ray Spectroscopy Techniques (8 papers) and Integrated Circuits and Semiconductor Failure Analysis (7 papers). J. L. Mauer is often cited by papers focused on Advancements in Photolithography Techniques (8 papers), Electron and X-Ray Spectroscopy Techniques (8 papers) and Integrated Circuits and Semiconductor Failure Analysis (7 papers). J. L. Mauer collaborates with scholars based in United States. J. L. Mauer's co-authors include G. J. Schulz, J. S. Logan, G. C. Schwartz, Patricia G. Blauner, David J. Spence, Alfred Wagner, D. A. Smith, J. M. E. Harper, D.D. Tang and M. B. Ketchen and has published in prestigious journals such as The Journal of Chemical Physics, Applied Physics Letters and IEEE Transactions on Electron Devices.

In The Last Decade

J. L. Mauer

20 papers receiving 345 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name	h						Papers	Cites
J. L. Mauer United States	11	247	98	82	68	52	20	369
Stefan Wurm United States	14	505 2.0×	62 0.6×	97 1.2×	58 0.9×	31 0.6×	59	647
R.E. Hurley United Kingdom	11	225 0.9×	38 0.4×	128 1.6×	125 1.8×	63 1.2×	30	321
Hideo Todokoro Japan	12	255 1.0×	50 0.5×	200 2.4×	64 0.9×	11 0.2×	55	482
Chiew-Seng Koay United States	13	344 1.4×	51 0.5×	185 2.3×	27 0.4×	170 3.3×	40	482
R. J. Winfield Ireland	12	129 0.5×	64 0.7×	130 1.6×	77 1.1×	35 0.7×	31	320
W. Beezhold United States	12	351 1.4×	135 1.4×	91 1.1×	194 2.9×	21 0.4×	33	485
D. R. Denison United States	10	120 0.5×	51 0.5×	105 1.3×	50 0.7×	50 1.0×	25	298
K. Guinn United States	11	446 1.8×	92 0.9×	39 0.5×	71 1.0×	137 2.6×	37	483
S. G. Ingram United Kingdom	9	328 1.3×	36 0.4×	100 1.2×	52 0.8×	104 2.0×	23	355
Kouji Kakizaki Japan	9	239 1.0×	63 0.6×	139 1.7×	33 0.5×	53 1.0×	52	295

Countries citing papers authored by J. L. Mauer

Since Specialization

Citations

This map shows the geographic impact of J. L. Mauer's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by J. L. Mauer with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites J. L. Mauer more than expected).

Fields of papers citing papers by J. L. Mauer

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by J. L. Mauer. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by J. L. Mauer. The network helps show where J. L. Mauer may publish in the future.

Co-authorship network of co-authors of J. L. Mauer

This figure shows the co-authorship network connecting the top 25 collaborators of J. L. Mauer. A scholar is included among the top collaborators of J. L. Mauer based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with J. L. Mauer. J. L. Mauer is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

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20 of 20 papers shown

Mauer, J. L., et al.. (2005). Analysis Of Cluster Tool Performance In Semiconductor Manufacturing. 129–134. 2 indexed citations

Davari, B., Charles W. Koburger, T. Furukawa, et al.. (2003). A variable-stress shallow trench isolation (STL) technology with diffused sidewall doping for submicron CMOS. 92–95. 10 indexed citations

Koburger, Charles W., R. Schulz, J.D. Warnock, et al.. (2003). A new planarization technique, using a combination of RIE and chemical mechanical polish (CMP). 61–64. 6 indexed citations

Mauer, J. L., et al.. (1994). Using simulation to analyze integrated tool performance in semiconductor manufacturing. Microelectronic Engineering. 25(2-4). 139–146. 11 indexed citations

Blauner, Patricia G. & J. L. Mauer. (1993). X-ray mask repair. IBM Journal of Research and Development. 37(3). 421–434. 4 indexed citations

Mauer, J. L., et al.. (1993). The simulation of integrated tool performance in semiconductor manufacturing. 814–818. 10 indexed citations

Wagner, Alfred, et al.. (1992). Diffraction effects and image blurring in x-ray proximity printing. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 10(6). 3212–3216. 5 indexed citations

Harper, J. M. E., et al.. (1992). Focused ion beam imaging of grain growth in copper thin films. Applied Physics Letters. 61(6). 663–665. 35 indexed citations

Wagner, Alfred, et al.. (1992). Diffraction effects in x-ray proximity printing. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 10(5). 2234–2242. 3 indexed citations

10.

Wagner, Alfred, et al.. (1990). X-ray mask repair with focused ion beams. Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena. 8(6). 1557–1564. 54 indexed citations

11.

Seeger, David E., et al.. (1989). X-ray transmission through low atomic number particles. Microelectronic Engineering. 9(1-4). 139–142. 4 indexed citations

12.

Ning, T.H., et al.. (1987). An advanced high-performance trench-isolated self-aligned bipolar technology. IEEE Transactions on Electron Devices. 34(11). 2246–2254. 32 indexed citations

13.

Tang, D.D., G.P. Li, Ching-Te Chuang, et al.. (1986). 73ps si bipolar ECL circuits. 104–105. 14 indexed citations

14.

Mauer, J. L. & J. S. Logan. (1979). Reactant supply in reactive ion etching. Journal of Vacuum Science and Technology. 16(2). 404–406. 11 indexed citations

15.

Mauer, J. L., et al.. (1978). Mechanism of silicon etching by a CF4 plasma. Journal of Vacuum Science and Technology. 15(5). 1734–1738. 77 indexed citations

16.

Mauer, J. L.. (1978). Averaging of electron-beam aberrations. Journal of Vacuum Science and Technology. 15(3). 853–856. 2 indexed citations

17.

Mauer, J. L., H. C. Pfeiffer, & W. Stickel. (1977). Electron Optics of an Electron-Beam Lithographic System. IBM Journal of Research and Development. 21(6). 514–521. 8 indexed citations

18.

Mauer, J. L., H. C. Pfeiffer, & W. Stickel. (1976). Electron optics of the electron-beam lithography system, EL1. 434–436. 4 indexed citations

19.

Mauer, J. L. & G. J. Schulz. (1973). Associative Detachment ofO−with CO,H2, andO2. Physical review. A, General physics. 7(2). 593–605. 39 indexed citations

20.

Spence, David J., J. L. Mauer, & G. J. Schulz. (1972). Measurement of Total Inelastic Cross Sections for Electron Impact in N2 and CO2. The Journal of Chemical Physics. 57(12). 5516–5521. 38 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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