Jeffrey D. Gelorme

1.6k total citations
25 papers, 1.2k citations indexed

About

Jeffrey D. Gelorme is a scholar working on Electrical and Electronic Engineering, Biomedical Engineering and Surfaces, Coatings and Films. According to data from OpenAlex, Jeffrey D. Gelorme has authored 25 papers receiving a total of 1.2k indexed citations (citations by other indexed papers that have themselves been cited), including 24 papers in Electrical and Electronic Engineering, 9 papers in Biomedical Engineering and 4 papers in Surfaces, Coatings and Films. Recurrent topics in Jeffrey D. Gelorme's work include Advancements in Photolithography Techniques (12 papers), Integrated Circuits and Semiconductor Failure Analysis (5 papers) and Electronic Packaging and Soldering Technologies (5 papers). Jeffrey D. Gelorme is often cited by papers focused on Advancements in Photolithography Techniques (12 papers), Integrated Circuits and Semiconductor Failure Analysis (5 papers) and Electronic Packaging and Soldering Technologies (5 papers). Jeffrey D. Gelorme collaborates with scholars based in United States, Switzerland and Japan. Jeffrey D. Gelorme's co-authors include N. LaBianca, Jane M. Shaw, Laura L. Kosbar, Wanda Andreoni, Christos Dimitrakopoulos, Patrick R. L. Malenfant, Teresita Graham, Alessandro Curioni, Willard E. Conley and T. H. P. Chang and has published in prestigious journals such as Applied Physics Letters, IBM Journal of Research and Development and Journal of Industrial Ecology.

In The Last Decade

Jeffrey D. Gelorme

24 papers receiving 1.2k citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Jeffrey D. Gelorme United States 10 853 511 236 191 181 25 1.2k
Dimitri Janssen Belgium 12 939 1.1× 331 0.6× 232 1.0× 294 1.5× 155 0.9× 19 1.3k
Berend‐Jan de Gans Netherlands 13 776 0.9× 656 1.3× 109 0.5× 199 1.0× 53 0.3× 14 1.2k
Alexander Fian Austria 18 508 0.6× 281 0.5× 197 0.8× 366 1.9× 110 0.6× 53 871
Jakob Kjelstrup‐Hansen Denmark 18 640 0.8× 520 1.0× 169 0.7× 269 1.4× 220 1.2× 87 1.0k
Atsushi Kubono Japan 18 290 0.3× 399 0.8× 188 0.8× 311 1.6× 117 0.6× 62 827
Bin Tian China 17 658 0.8× 423 0.8× 107 0.5× 283 1.5× 275 1.5× 50 1.0k
Wenbo Wang China 17 464 0.5× 813 1.6× 113 0.5× 198 1.0× 126 0.7× 30 1.0k
Hsin Her Yu Taiwan 19 352 0.4× 359 0.7× 217 0.9× 183 1.0× 156 0.9× 58 863
Akihiro Tagaya Japan 19 561 0.7× 265 0.5× 291 1.2× 311 1.6× 257 1.4× 94 1.3k

Countries citing papers authored by Jeffrey D. Gelorme

Since Specialization
Citations

This map shows the geographic impact of Jeffrey D. Gelorme's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Jeffrey D. Gelorme with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Jeffrey D. Gelorme more than expected).

Fields of papers citing papers by Jeffrey D. Gelorme

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Jeffrey D. Gelorme. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Jeffrey D. Gelorme. The network helps show where Jeffrey D. Gelorme may publish in the future.

Co-authorship network of co-authors of Jeffrey D. Gelorme

This figure shows the co-authorship network connecting the top 25 collaborators of Jeffrey D. Gelorme. A scholar is included among the top collaborators of Jeffrey D. Gelorme based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Jeffrey D. Gelorme. Jeffrey D. Gelorme is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Nah, Jae-Woong, Jeffrey D. Gelorme, Paul Lauro, et al.. (2014). Wafer IMS (Injection molded solder) — A new fine pitch solder bumping technology on wafers with solder alloy composition flexibility. 1308–1313. 21 indexed citations
2.
Feger, C., et al.. (2005). Mixing, rheology, and stability of highly filled thermal pastes. IBM Journal of Research and Development. 49(4.5). 699–707. 13 indexed citations
3.
Kosbar, Laura L. & Jeffrey D. Gelorme. (2002). Biobased epoxy resins for computer components and printed wiring boards. 28–32. 7 indexed citations
4.
Malenfant, Patrick R. L., Christos Dimitrakopoulos, Jeffrey D. Gelorme, et al.. (2002). N-type organic thin-film transistor with high field-effect mobility based on a N,N′-dialkyl-3,4,9,10-perylene tetracarboxylic diimide derivative. Applied Physics Letters. 80(14). 2517–2519. 403 indexed citations
5.
Kang, S. K., Stephen L. Buchwalter, N. LaBianca, et al.. (2001). Development of conductive adhesive materials for via fill applications. IEEE Transactions on Components and Packaging Technologies. 24(3). 431–435. 14 indexed citations
6.
Kosbar, Laura L., et al.. (2000). Introducing Biobased Materials into the Electronics Industry. Journal of Industrial Ecology. 4(3). 93–105. 64 indexed citations
7.
Gelorme, Jeffrey D., et al.. (2000). Synthesis and lithographic performance of poly-4-hydroxphenyl-ethyl-methacrylate-based negative resists. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 3999. 559–559. 1 indexed citations
8.
Prokopowicz, Gregory, Jacque H. Georger, James W. Thackeray, et al.. (1999). Improved resolution with advanced negative DUV photoresist with 0.26N capability. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 3678. 1284–1284. 1 indexed citations
9.
Gelorme, Jeffrey D., et al.. (1998). Advanced negative resists using novel aminoplast crosslinkers. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 3333. 758–758. 2 indexed citations
10.
Bucchignano, J. J., et al.. (1997). Ultrasonic and dip resist development processes for 50 nm device fabrication. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 15(6). 2621–2626. 17 indexed citations
11.
Shaw, Jane M., et al.. (1997). Negative photoresists for optical lithography. IBM Journal of Research and Development. 41(1.2). 81–94. 246 indexed citations
12.
LaBianca, N. & Jeffrey D. Gelorme. (1995). <title>High-aspect-ratio resist for thick-film applications</title>. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 2438. 846–852. 90 indexed citations
13.
Brunsvold, William R., Will Conley, Jeffrey D. Gelorme, et al.. (1994). Further improvements in CGR formulation and process. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 2195. 329–329. 2 indexed citations
14.
Conley, Will, William R. Brunsvold, Richard A. Ferguson, et al.. (1993). <title>Negative DUV photoresist for 16Mb-DRAM production and future generations</title>. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 1925. 120–132. 2 indexed citations
15.
Seeger, David E., R. Viswanathan, C. D. Blair, Jeffrey D. Gelorme, & Will Conley. (1992). Single layer chemically amplified resist processes for device fabrication by x-ray lithography. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 10(6). 2620–2627. 1 indexed citations
16.
Babich, F., et al.. (1991). Comparison of vapor and liquid phase silylation processes of photoresists. Microelectronic Engineering. 13(1-4). 47–50. 1 indexed citations
17.
Trewhella, J.M., et al.. (1991). Photopatternable epoxy ridge waveguides. TuF7–TuF7. 1 indexed citations
18.
Gelorme, Jeffrey D., et al.. (1990). Polymeric Optical Waveguides. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 1177. 379–379. 22 indexed citations
19.
Conley, Will, et al.. (1990). Negative tone aqueous developable resist for photon, electron, and x-ray lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 1262. 49–49. 3 indexed citations
20.
Gelorme, Jeffrey D., et al.. (1990). Polymeric optical waveguides. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 1177. 0–0. 2 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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