M. Jaso

1.1k total citations · 1 hit paper
25 papers, 857 citations indexed

About

M. Jaso is a scholar working on Electrical and Electronic Engineering, Electronic, Optical and Magnetic Materials and Materials Chemistry. According to data from OpenAlex, M. Jaso has authored 25 papers receiving a total of 857 indexed citations (citations by other indexed papers that have themselves been cited), including 22 papers in Electrical and Electronic Engineering, 11 papers in Electronic, Optical and Magnetic Materials and 7 papers in Materials Chemistry. Recurrent topics in M. Jaso's work include Semiconductor materials and devices (15 papers), Copper Interconnects and Reliability (7 papers) and Semiconductor materials and interfaces (4 papers). M. Jaso is often cited by papers focused on Semiconductor materials and devices (15 papers), Copper Interconnects and Reliability (7 papers) and Semiconductor materials and interfaces (4 papers). M. Jaso collaborates with scholars based in United States. M. Jaso's co-authors include D.J. Pearson, F. B. Kaufman, W. L. Guthrie, Daniel B. Thompson, M. B. Small, G. S. Oehrlein, J.C. Jacco, B. Greenberg, G. M. Loiacono and K. Chan and has published in prestigious journals such as Applied Physics Letters, Journal of Applied Physics and Journal of The Electrochemical Society.

In The Last Decade

M. Jaso

24 papers receiving 794 citations

Hit Papers

Chemical‐Mechanical Polishing for Fabricating Patterned W... 1991 2026 2002 2014 1991 100 200 300 400

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
M. Jaso United States 13 486 428 285 242 179 25 857
Pirouz Pirouz United States 18 674 1.4× 247 0.6× 543 1.9× 196 0.8× 220 1.2× 31 1.2k
S. L. McCarthy United States 15 581 1.2× 489 1.1× 177 0.6× 353 1.5× 110 0.6× 25 1.0k
Hannes Will United States 8 885 1.8× 252 0.6× 458 1.6× 204 0.8× 134 0.7× 14 1.3k
Н. А. Феоктистов Russia 15 423 0.9× 159 0.4× 492 1.7× 316 1.3× 99 0.6× 116 813
Maria Ronay United States 16 301 0.6× 144 0.3× 283 1.0× 172 0.7× 127 0.7× 40 677
Tohru Hara Japan 17 748 1.5× 168 0.4× 262 0.9× 338 1.4× 93 0.5× 110 992
R. W. Tustison United States 15 341 0.7× 134 0.3× 456 1.6× 189 0.8× 61 0.3× 32 757
G. Lucadamo United States 16 305 0.6× 152 0.4× 434 1.5× 465 1.9× 304 1.7× 37 998
J.P. Peyrade France 17 228 0.5× 175 0.4× 529 1.9× 261 1.1× 348 1.9× 71 872
M. B. Small United States 18 888 1.8× 435 1.0× 479 1.7× 514 2.1× 246 1.4× 61 1.4k

Countries citing papers authored by M. Jaso

Since Specialization
Citations

This map shows the geographic impact of M. Jaso's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by M. Jaso with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites M. Jaso more than expected).

Fields of papers citing papers by M. Jaso

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by M. Jaso. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by M. Jaso. The network helps show where M. Jaso may publish in the future.

Co-authorship network of co-authors of M. Jaso

This figure shows the co-authorship network connecting the top 25 collaborators of M. Jaso. A scholar is included among the top collaborators of M. Jaso based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with M. Jaso. M. Jaso is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Ahn, Dae-Hwan, C.-Y. Hong, Dong Pan, et al.. (2006). Waveguide Integrated Ge p-i-n Photodetectors on a Silicon-on-Insulator Platform. 1–4. 12 indexed citations
2.
Bucelot, T., et al.. (2003). Low-resistance submicron CVD W interlevel via plugs on Al-Cu-Si. 14. 113–121.
3.
Jaso, M., et al.. (2002). A novel application of polyimide-W-Al/Cu for VLSI interconnect. 75–81. 1 indexed citations
4.
Jaso, M., et al.. (2002). Evaluation of an advanced wafer carrier for ILD planarization. 419–421. 1 indexed citations
5.
Kaufman, F. B., S. A. Cohen, & M. Jaso. (1995). Characterization of Defects Produced in TEOS Thin Films due to Chemical-Mechanical Polishing (CMP). MRS Proceedings. 386. 3 indexed citations
6.
Ketchen, M. B., D.J. Pearson, Kevin Stawiasz, et al.. (1993). Octagonal washer DC SQUIDs and integrated susceptometers fabricated in a planarized sub- mu m Nb-AlO/sub x/-Nb technology. IEEE Transactions on Applied Superconductivity. 3(1). 1795–1799. 18 indexed citations
7.
Cohen, S. A., M. Jaso, & A. A. Bright. (1992). Electrical Properties of Chemical‐Mechanical Polished Tetraethyl Orthosilicate Films With and Without Capping Layers. Journal of The Electrochemical Society. 139(12). 3572–3574. 2 indexed citations
8.
Ketchen, M. B., Kevin Stawiasz, D.J. Pearson, et al.. (1992). Sub-μm linewidth input coils for low T c integrated thin-film dc superconducting quantum interference devices. Applied Physics Letters. 61(3). 336–338. 16 indexed citations
9.
Oehrlein, G. S., et al.. (1991). Selective Dry Etching of Germanium with Respect to Silicon and Vice Versa. Journal of The Electrochemical Society. 138(5). 1443–1452. 32 indexed citations
10.
Jaso, M., et al.. (1991). Polyimide Planarization With Polystyrene By Rie Etch-Back. MRS Proceedings. 227. 1 indexed citations
11.
Kaufman, F. B., Daniel B. Thompson, M. Jaso, et al.. (1991). Chemical‐Mechanical Polishing for Fabricating Patterned W Metal Features as Chip Interconnects. Journal of The Electrochemical Society. 138(11). 3460–3465. 403 indexed citations breakdown →
12.
Klepner, S. P., S. Basavaiah, A. Ray, et al.. (1991). Process Integration for a 2ns Cycle/4ns Access 512K CMOS SRAM. 920. 31–32. 1 indexed citations
13.
Ketchen, M. B., D.J. Pearson, A. W. Kleinsasser, et al.. (1991). Sub-μm, planarized, Nb-AlOx-Nb Josephson process for 125 mm wafers developed in partnership with Si technology. Applied Physics Letters. 59(20). 2609–2611. 87 indexed citations
14.
Moy, D., David E. Seeger, J. P. Silverman, et al.. (1990). A 0.5 μm fully scaled two-level metal fully planarized interconnect structure fabricated with X-ray lithography. 9–10. 2 indexed citations
15.
Oehrlein, G. S., K. Chan, M. Jaso, & Gary W. Rubloff. (1989). Surface analysis of realistic semiconductor microstructures. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 7(3). 1030–1034. 43 indexed citations
16.
Jaso, M., et al.. (1989). Etch Selectivity of Silicon Dioxide over Titanium Silicide Using  CF 4 /  H 2 Reactive Ion Etching. Journal of The Electrochemical Society. 136(12). 3812–3815. 4 indexed citations
17.
Haller, I., et al.. (1988). Selective Wet and Dry Etching of Hydrogenated Amorphous Silicon and Related Materials. Journal of The Electrochemical Society. 135(8). 2042–2045. 13 indexed citations
18.
Oehrlein, G. S., K. Chan, & M. Jaso. (1988). I ns i t u spatially resolved surface characterization of realistic semiconductor structure after reactive ion etching process. Journal of Applied Physics. 64(5). 2399–2402. 13 indexed citations
19.
20.
Oehrlein, G. S., R. Schad, & M. Jaso. (1986). Mechanism of silicon surface roughening by reactive ion etching. Surface and Interface Analysis. 8(6). 243–246. 26 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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