I. Babich

880 total citations
18 papers, 538 citations indexed

About

I. Babich is a scholar working on Electrical and Electronic Engineering, Surfaces, Coatings and Films and Biomedical Engineering. According to data from OpenAlex, I. Babich has authored 18 papers receiving a total of 538 indexed citations (citations by other indexed papers that have themselves been cited), including 16 papers in Electrical and Electronic Engineering, 7 papers in Surfaces, Coatings and Films and 6 papers in Biomedical Engineering. Recurrent topics in I. Babich's work include Advancements in Photolithography Techniques (9 papers), Electron and X-Ray Spectroscopy Techniques (6 papers) and Semiconductor materials and devices (4 papers). I. Babich is often cited by papers focused on Advancements in Photolithography Techniques (9 papers), Electron and X-Ray Spectroscopy Techniques (6 papers) and Semiconductor materials and devices (4 papers). I. Babich collaborates with scholars based in United States. I. Babich's co-authors include E. Sikorski, K.W. Guarini, Charles T. Black, Hansoo Kim, M. Ieong, Wilfried Haensch, Huiling Shang, H.‐S. Philip Wong, P. Kozlowski and C. D’Emic and has published in prestigious journals such as Journal of materials research/Pratt's guide to venture capital sources, IEEE Electron Device Letters and IBM Journal of Research and Development.

In The Last Decade

I. Babich

16 papers receiving 508 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
I. Babich United States 10 372 235 160 89 59 18 538
E. Sikorski United States 8 264 0.7× 266 1.1× 128 0.8× 69 0.8× 52 0.9× 12 445
Koji Asakawa Japan 12 296 0.8× 224 1.0× 238 1.5× 86 1.0× 145 2.5× 45 515
Naoko Kihara Japan 11 147 0.4× 224 1.0× 138 0.9× 46 0.5× 70 1.2× 50 333
Ralph Kurt Switzerland 9 119 0.3× 330 1.4× 108 0.7× 48 0.5× 31 0.5× 12 414
Toshiyuki Yoshimura Japan 11 386 1.0× 77 0.3× 235 1.5× 147 1.7× 90 1.5× 29 497
Emanuele Poliani Germany 10 128 0.3× 221 0.9× 114 0.7× 64 0.7× 17 0.3× 15 309
Byung-Jae Kim South Korea 13 184 0.5× 289 1.2× 111 0.7× 34 0.4× 44 0.7× 25 430
R. A. Griffiths United Kingdom 4 113 0.3× 161 0.7× 124 0.8× 66 0.7× 34 0.6× 6 298
Richard A. Lawson United States 13 344 0.9× 223 0.9× 245 1.5× 23 0.3× 110 1.9× 67 538
S. Matthias Germany 9 235 0.6× 277 1.2× 203 1.3× 222 2.5× 47 0.8× 13 479

Countries citing papers authored by I. Babich

Since Specialization
Citations

This map shows the geographic impact of I. Babich's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by I. Babich with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites I. Babich more than expected).

Fields of papers citing papers by I. Babich

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by I. Babich. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by I. Babich. The network helps show where I. Babich may publish in the future.

Co-authorship network of co-authors of I. Babich

This figure shows the co-authorship network connecting the top 25 collaborators of I. Babich. A scholar is included among the top collaborators of I. Babich based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with I. Babich. I. Babich is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

18 of 18 papers shown
1.
Black, Charles T., K.W. Guarini, Ricardo Ruiz, et al.. (2006). Polymer self assembly in semiconductor microelectronics. 12. 1–4. 11 indexed citations
2.
Steen, S.E., Sharee J. McNab, L. Šekarić, et al.. (2006). Hybrid lithography: The marriage between optical and e-beam lithography. A method to study process integration and device performance for advanced device nodes. Microelectronic Engineering. 83(4-9). 754–761. 14 indexed citations
3.
Steen, S.E., Sharee J. McNab, L. Šekarić, et al.. (2005). Looking into the crystal ball: future device learning using hybrid e-beam and optical lithography (Keynote Paper). Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5751. 26–26. 10 indexed citations
4.
Rim, K., K. Chan, L. Shi, et al.. (2004). Fabrication and mobility characteristics of ultra-thin strained Si directly on insulator (SSDOI) MOSFETs. 3.1.1–3.1.4. 103 indexed citations
5.
Shang, Huiling, P. Kozlowski, C. D’Emic, et al.. (2004). Self-Aligned n-Channel Germanium MOSFETs With a Thin Ge Oxynitride Gate Dielectric and Tungsten Gate. IEEE Electron Device Letters. 25(3). 135–137. 136 indexed citations
6.
Guarini, K.W., Charles T. Black, Y. Zhang, et al.. (2004). Low voltage, scalable nanocrystal flash memory fabricated by templated self assembly. 22.2.1–22.2.4. 26 indexed citations
7.
Black, Charles T., K.W. Guarini, Hansoo Kim, et al.. (2004). High-Capacity, Self-Assembled Metal–Oxide–Semiconductor Decoupling Capacitors. IEEE Electron Device Letters. 25(9). 622–624. 77 indexed citations
8.
Guarini, K.W., et al.. (2002). Process integration of self-assembled polymer templates into silicon nanofabrication. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 20(6). 2788–2792. 115 indexed citations
9.
Krasnoperova, Azalia A., Ying Zhang, I. Babich, et al.. (2001). 100-nm gate lithography for double-gate transistors. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 4346. 925–925.
10.
O’Sullivan, E. J., Emanuel I. Cooper, L. T. Romankiw, et al.. (1998). Integrated, variable-reluctance magnetic minimotor. IBM Journal of Research and Development. 42(5). 681–694. 17 indexed citations
11.
Aviram, Ari, et al.. (1998). New family of non-chemically amplified resists. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 3331. 349–349. 3 indexed citations
12.
Maldonado, Juan R., et al.. (1993). Measurement of the effective wavelength of x-ray lithography sources. Microelectronic Engineering. 21(1-4). 113–116. 1 indexed citations
13.
Acosta, R. E., I. Babich, Patricia G. Blauner, & Alfred Wagner. (1993). Electrodeposited Gold: Real Time Stress And Structural Change At Room Temperature.. MRS Proceedings. 306. 1 indexed citations
14.
Maldonado, José R., et al.. (1991). Light scattering properties of x-ray lithography mask substrates. Microelectronic Engineering. 13(1-4). 347–350. 1 indexed citations
15.
Berry, B. S., et al.. (1991). Stress and thermal expansion of β–SiC films by the vibrating-membrane method. Journal of materials research/Pratt's guide to venture capital sources. 6(5). 1061–1065. 3 indexed citations
16.
Viswanathan, R., R. E. Acosta, David E. Seeger, et al.. (1989). Fully scaled 0.5μm MOS circuits by synchrotron radiation X-ray lithography: Mask fabrication and chraterization. Microelectronic Engineering. 9(1-4). 93–96. 2 indexed citations
17.
Uzoh, Cyprian, et al.. (1988). Mechanical characterization of membranes for x-ray lithography masks. Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena. 6(6). 2178–2183. 8 indexed citations
18.
Viswanathan, R., R. E. Acosta, David E. Seeger, et al.. (1988). Fully scaled 0.5 μm metal–oxide semiconductor circuits by synchrotron x-ray lithography: Mask fabrication and characterization. Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena. 6(6). 2196–2201. 10 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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