D. Basting

827 total citations
69 papers, 557 citations indexed

About

D. Basting is a scholar working on Electrical and Electronic Engineering, Computational Mechanics and Spectroscopy. According to data from OpenAlex, D. Basting has authored 69 papers receiving a total of 557 indexed citations (citations by other indexed papers that have themselves been cited), including 67 papers in Electrical and Electronic Engineering, 26 papers in Computational Mechanics and 17 papers in Spectroscopy. Recurrent topics in D. Basting's work include Laser Design and Applications (62 papers), Solid State Laser Technologies (30 papers) and Laser Material Processing Techniques (26 papers). D. Basting is often cited by papers focused on Laser Design and Applications (62 papers), Solid State Laser Technologies (30 papers) and Laser Material Processing Techniques (26 papers). D. Basting collaborates with scholars based in Germany and Russia. D. Basting's co-authors include G. Marowsky, F. P. Schäfer, Uwe Stamm, F. P. Sch�fer, Harald R. Telle, Sergei V. Govorkov, Ulrich Sowada, Evgueni Slobodtchikov, A Yu Vinokhodov and Guido Schriever and has published in prestigious journals such as Japanese Journal of Applied Physics, Review of Scientific Instruments and Applied Physics A.

In The Last Decade

D. Basting

63 papers receiving 490 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
D. Basting Germany 11 317 169 117 108 107 69 557
David E. Seeger United States 14 366 1.2× 99 0.6× 194 1.7× 109 1.0× 177 1.7× 43 714
P. Randall Staver United States 7 174 0.5× 191 1.1× 62 0.5× 171 1.6× 42 0.4× 15 432
E. Sutcliffe Switzerland 11 143 0.5× 215 1.3× 294 2.5× 106 1.0× 111 1.0× 13 636
D. Maydan United Kingdom 16 412 1.3× 244 1.4× 85 0.7× 111 1.0× 123 1.1× 32 645
C. W. Jurgensen United States 13 764 2.4× 118 0.7× 119 1.0× 171 1.6× 178 1.7× 30 917
H. Vora India 11 236 0.7× 107 0.6× 100 0.9× 229 2.1× 68 0.6× 41 558
Masaru Izawa Japan 15 485 1.5× 86 0.5× 46 0.4× 196 1.8× 57 0.5× 50 612
Frederico Nunes Brazil 14 274 0.9× 273 1.6× 36 0.3× 163 1.5× 205 1.9× 46 818
G. Auvert France 15 315 1.0× 113 0.7× 177 1.5× 342 3.2× 106 1.0× 78 740
Е. И. Демихов Russia 14 63 0.2× 169 1.0× 22 0.2× 193 1.8× 114 1.1× 71 610

Countries citing papers authored by D. Basting

Since Specialization
Citations

This map shows the geographic impact of D. Basting's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by D. Basting with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites D. Basting more than expected).

Fields of papers citing papers by D. Basting

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by D. Basting. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by D. Basting. The network helps show where D. Basting may publish in the future.

Co-authorship network of co-authors of D. Basting

This figure shows the co-authorship network connecting the top 25 collaborators of D. Basting. A scholar is included among the top collaborators of D. Basting based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with D. Basting. D. Basting is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Basting, D. & Uwe Stamm. (2002). History and future prospects of excimer laser technology. 1 indexed citations
2.
Schriever, Guido, et al.. (2001). <title>Compact Z-pinch EUV source for photolithography</title>. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 4343. 615–620. 11 indexed citations
3.
Schriever, Guido, et al.. (2000). <title>Extreme ultraviolet light generation based on laser-produced plasmas (LPP) and gas-discharge-based pinch plasmas: a comparison of different concepts</title>. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 3997. 162–168. 6 indexed citations
4.
Govorkov, Sergei V., et al.. (2000). Effect of the wavelength on high-aspect ratio microdrilling of steel with an all-solid-state laser. 580–581. 2 indexed citations
5.
Basting, D., et al.. (1999). New aspects of micromachining and microlithography using 157-nm excimer laser radiation. Applied Physics A. 69(7). S305–S307. 7 indexed citations
6.
Basting, D., et al.. (1999). New ultraviolet lasers for material processing in industrial applications. Journal of Laser Applications. 11(1). 1–6. 24 indexed citations
7.
Schroeder, Thomas, et al.. (1999). <title>High-power ultraviolet all-solid-state laser for industrial applications</title>. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 3618. 396–402.
8.
Борисов, В М, et al.. (1998). Compact 600-W KrF laser. Quantum Electronics. 28(2). 119–122. 3 indexed citations
9.
Stamm, Uwe, et al.. (1998). Advanced ArF excimer laser for 193 nm lithography. Microelectronic Engineering. 41-42. 75–78. 2 indexed citations
10.
Govorkov, Sergei V., et al.. (1998). Efficient High Average Power and Narrow Spectral Linewidth Operation of Ce:LiCAF Laser at 1 kHz Repetition Rate. Advanced Solid-State Lasers. 71. UL1–UL1. 5 indexed citations
11.
Stamm, Uwe, et al.. (1998). ArF excimer laser for 193-nm lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 3334. 1010–1010. 1 indexed citations
12.
Basting, D., et al.. (1995). Excimer laser: a new tool for precision micromachining. Optical and Quantum Electronics. 27(12). 1319–1335. 18 indexed citations
13.
Basting, D., et al.. (1995). New KrF and ArF Excimer Lasers for Advanced Deep Ultraviolet Optical Lithography. Japanese Journal of Applied Physics. 34(8R). 4050–4050. 10 indexed citations
14.
Stamm, Uwe, et al.. (1992). High-spectral-brightness 1.0-pm bandwidth DUV lithography excimer laser. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 1674. 669–669. 3 indexed citations
15.
Basting, D.. (1989). Kilowatt Excimer Lasers: A European Joint Effort. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 1023. 268–268. 2 indexed citations
16.
Basting, D., et al.. (1989). Excimer Laser In The Kilowatt Range. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 1041. 193–193. 1 indexed citations
17.
Basting, D., et al.. (1989). High Power Excimer Laser: First Results. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 1023. 51–51. 1 indexed citations
18.
Brinkmann, U., et al.. (1987). New excimer laser producing long pulses at 388 nm. Conference on Lasers and Electro-Optics. 1 indexed citations
19.
Hohla, K., et al.. (1983). Excimer lasers with high spectral brightness working in the regenerative amplifier regime. AIP conference proceedings. 100. 80–98. 3 indexed citations
20.
Basting, D., et al.. (1976). The phenoxazones: A new class of laser dyes. Optics Communications. 18(3). 260–262. 41 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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