C. Y. Ting

1.4k citations

32 papers · 1.1k indexed · h-index 17

Electrical and Electronic Engineering top 5%
Atomic and Molecular Physics, and Optics top 5%
Mechanics of Materials top 5%
Materials Chemistry
Electronic, Optical and Magnetic Materials top 10%

Co-authors: M. Wittmer F. M. d’Heurle Subramanian S. Iyer P. M. Fryer E. A. Irene L. Krusin‐Elbaum Charles Y. Chen K. N. Tu
Topics: Semiconductor materials and interfaces (21 papers)Semiconductor materials and devices (14 papers)Integrated Circuits and Semiconductor Failure Analysis (8 papers)
Cited by: Atomic and Molecular Physics, and Optics Electrical and Electronic Engineering Mechanics of Materials
Journals: Applied Physics Letters Journal of Applied Physics Journal of The Electrochemical Society
Partner nations: United States Italy

In The Last Decade

C. Y. Ting

31 papers receiving 1.0k citations

Peers

Countries citing papers authored by C. Y. Ting

Since Specialization

Citations

This map shows the geographic impact of C. Y. Ting's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by C. Y. Ting with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites C. Y. Ting more than expected).

Fields of papers citing papers by C. Y. Ting

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by C. Y. Ting. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by C. Y. Ting. The network helps show where C. Y. Ting may publish in the future.

Co-authorship network of co-authors of C. Y. Ting

This figure shows the co-authorship network connecting the top 25 collaborators of C. Y. Ting. A scholar is included among the top collaborators of C. Y. Ting based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with C. Y. Ting. C. Y. Ting is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

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20 of 20 papers shown

#	Work	Indexed citations
1	Submicron Tungsten Gate MOSFET with 10 nm Gate Oxide 1987 ·Symposium on VLSI Technology ·B. Davari,C. Y. Ting,K. Y. Ahn,S. Basavaiah,C.‐K. Hu,Yuan Taur,M.R. Wordeman,(unknown),L. Krusin‐Elbaum,(unknown),M.R. Polcari	6
2	Study of contact and shallow junction characteristics in submicron CMOS with self-aligned titanium silicide 1987 ·IBM Journal of Research and Development ·Yuan Taur,B. Davari,D. Moy,J.Y.-C. Sun,C. Y. Ting	7
3	On the resistivity of TiSi₂: The implication for low-temperature applications 1987 ·IEEE Transactions on Electron Devices ·L. Krusin‐Elbaum,J.Y.-C. Sun,C. Y. Ting	10
4	Cross-sectional transmission electron microscopy investigation of Ti/Si reaction on phosphorus-doped polycrystalline silicon gate 1986 ·Journal of Applied Physics ·C. Y. Wong,(unknown),P.A. McFarland,F. M. d’Heurle,C. Y. Ting	13
5	A self-aligned 1-µm-channel CMOS technology with retrograde n-well and thin epitaxy 1985 ·IEEE Transactions on Electron Devices ·Yuan Taur,G. Hu,R.H. Dennard,Lewis M. Terman,C. Y. Ting,Karen Petrillo	36
6	Electromigration Study of the Al-Cu/Ti/Al-Cu System 1984 ·Subramanian S. Iyer,C. Y. Ting	6
7	Silicide for contacts and interconnects 1984 ·C. Y. Ting	14
8	Electromigration lifetime sudies of submicrometer-linewidth Al-Cu conductors 1984 ·IEEE Transactions on Electron Devices ·Shankar S. Iyer,C. Y. Ting	24
9	Investigation of Tin films reactively sputtered using a sputter gun 1983 ·Thin Solid Films ·K. Y. Ahn,M. Wittmer,C. Y. Ting	49
10	Oxidation of silicide thin films: TiSi2 1983 ·Applied Physics Letters ·F. M. d’Heurle,E. A. Irene,C. Y. Ting	68
11	Redistribution of As during Pd2Si formation: Electrical measurements 1983 ·Journal of Applied Physics ·M. Wittmer,C. Y. Ting,K. N. Tu	21
12	ZrN diffusion barrier in aluminum metallization schemes 1983 ·Thin Solid Films ·L. Krusin‐Elbaum,M. Wittmer,C. Y. Ting,J. J. Cuomo	67
13	Atomic motion of dopant during interfacial silicide formation 1983 ·Thin Solid Films ·M. Wittmer,C. Y. Ting,K. N. Tu	13
14	Controlled Collapse Reflow for Josephson Chip Bonding 1982 ·Journal of The Electrochemical Society ·C. Y. Ting,(unknown),(unknown)	11
15	Atomic Motion of Dopant During Interfacial Silicide Formation 1982 ·MRS Proceedings ·M. Wittmer,C. Y. Ting,K. N. Tu	0
16	The use of titanium-based contact barrier layers in silicon technology 1982 ·Thin Solid Films ·C. Y. Ting,M. Wittmer	135
17	ZrN Diffusion Barrier in Aluminum Metallization Schemes 1982 ·MRS Proceedings ·L. Krusin‐Elbaum,M. Wittmer,C. Y. Ting,J. J. Cuomo	1
18	TiN formed by evaporation as a diffusion barrier between Al and Si 1982 ·Journal of Vacuum Science and Technology ·C. Y. Ting	145
19	Redistribution of As during Pd2Si formation: Ion channeling measurements 1982 ·Journal of Applied Physics ·M. Wittmer,C. Y. Ting,Iwao Ohdomari,K. N. Tu	32
20	Current Crowding Effects at Aluminun-Silicon Contacts 1970 ·Reliability physics ·(unknown),C. Y. Ting,(unknown)	1

About C. Y. Ting

C. Y. Ting is a scholar working on Atomic and Molecular Physics, and Optics, Electrical and Electronic Engineering and Electronic, Optical and Magnetic Materials, having authored 32 papers that have together received 1.1k indexed citations. Recurring topics across this work include Semiconductor materials and interfaces (21 papers), Semiconductor materials and devices (14 papers) and Integrated Circuits and Semiconductor Failure Analysis (8 papers). The work is most often cited by research in Atomic and Molecular Physics, and Optics (542 citations), Electrical and Electronic Engineering (834 citations) and Mechanics of Materials (346 citations). C. Y. Ting has collaborated with scholars based in United States and Italy. Frequent co-authors include M. Wittmer, F. M. d’Heurle, Subramanian S. Iyer, P. M. Fryer, E. A. Irene, L. Krusin‐Elbaum, Charles Y. Chen, K. N. Tu, K. Y. Ahn and J. J. Cuomo. Their work appears in journals such as Applied Physics Letters, Journal of Applied Physics and Journal of The Electrochemical Society.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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