Anupama Mallikarjunan

747 citations

27 papers · 500 indexed · h-index 13

Electronic, Optical and Magnetic Materials top 10%
- Copper Interconnects and Reliability 16
Surfaces, Coatings and Films top 10%
Electrical and Electronic Engineering top 10%
- Semiconductor materials and devices 24
- Advanced Memory and Neural Computing 3
- Thin-Film Transistor Technologies 3
Mechanics of Materials top 10%
- Metal and Thin Film Mechanics 8
Materials Chemistry
- High voltage insulation and dielectric phenomena 3
- Silicon Nanostructures and Photoluminescence 3
- Diamond and Carbon-based Materials Research 2

Co-authors: Toh‐Ming Lu S. P. Murarka G.-C. Wang Dexian Ye Tansel Karabacak J. P. Singh Agnes Derecskei‐Kovacs Manchao Xiao
Cited by: Electronic, Optical and Magnetic Materials Surfaces, Coatings and Films Electrical and Electronic Engineering
Journals: Applied Physics Letters (4 papers)Journal of The Electrochemical Society (3 papers)Journal of Vacuum Science & Technology A Vacuum Surfaces and Films (3 papers)
Partner nations: United States Australia Netherlands

In The Last Decade

Anupama Mallikarjunan

25 papers receiving 480 citations

Peers

Countries citing papers authored by Anupama Mallikarjunan

Since Specialization

Citations

This map shows the geographic impact of Anupama Mallikarjunan's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Anupama Mallikarjunan with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Anupama Mallikarjunan more than expected).

Fields of papers citing papers by Anupama Mallikarjunan

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Anupama Mallikarjunan. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Anupama Mallikarjunan. The network helps show where Anupama Mallikarjunan may publish in the future.

Co-authorship network

The 25 scholars most cited alongside Anupama Mallikarjunan, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with Anupama Mallikarjunan Line = papers co-authored together Anupama Mallikarjunan links everyone, so they are left out of the graph.

All Works

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20 of 20 papers shown

#	Work
1	Atomic layer deposition of carbon doped silicon oxide by precursor design and process tuning Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ·Meiliang Wang,任龙飞李文军,Xinjian Lei,Anupama Mallikarjunan,Ralph Marlett,Manchao Xiao	2018	5
2	Role of Trimethylaluminum in Low Temperature Atomic Layer Deposition of Silicon Nitride Chemistry of Materials ·Dewill Jones,Charith E. Nanayakkara,Anupama Mallikarjunan,Xinjian Lei,Ronald M. Pearlstein,Agnes Derecskei‐Kovacs,Jérémy Cure,Alain Estève,Yves J. Chabal	2017	5
3	Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N₂Plasma on Planar and 3D Substrate Topographies ACS Applied Materials & Interfaces ·Tahsin Faraz,瀧本俊晴,Harm C. M. Knoops,Anupama Mallikarjunan,Iain Buchanan,Dennis M. Hausmann,陈秀亮,W. M. M. Kessels	2016	45
4	Atomic Layer Deposition of Silicon Dioxide Using Aminosilanes Di-sec-butylaminosilane and Bis(tert-butylamino)silane with Ozone The Journal of Physical Chemistry C ·Luis Fabián Peña,Charith E. Nanayakkara,Anupama Mallikarjunan,任龙飞李文军,Manchao Xiao,Xinjian Lei,Ronald M. Pearlstein,Agnes Derecskei‐Kovacs,Yves J. Chabal	2016	34
5	Designing high performance precursors for atomic layer deposition of silicon oxide Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ·Anupama Mallikarjunan,任龙飞李文军,Manchao Xiao,Xinjian Lei,Ronald M. Pearlstein,Marie-Dominique Genoud-Champeaux,Mark L. O’Neill,Agnes Derecskei‐Kovacs,Bing Han	2014	22
6	Understanding the Impact of Porosity and Pore Structure in Ultra Low Dielectric Constant Organosilicate Glasses MRS Proceedings ·Irene J. Hsu,Raymond N. Vrtis,Kishan Harakhani,Anupama Mallikarjunan,Edwin Maurice Glover,John M. Zielinski	2012	1
7	Silicon precursor development for advanced dielectric barriers for VLSI technology Microelectronic Engineering ·Anupama Mallikarjunan,С С Мосияш,Laura M. Matz,Raymond N. Vrtis,Agnes Derecskei‐Kovacs,Xuezhong Jiang,Manchao Xiao	2011	23
8	Low-k spacers for advanced low power CMOS devices with reduced parasitic capacitances Elbert Huang,Eric Joseph,Huiming Bu,Xinlin Wang,Nicholas Fuller,DIANNE M. MAMANGON,E. Simonyi,H. Shobha,Kai Hotaka,Anupama Mallikarjunan,Isaac Lauer,Neşe CAN,Wilfried Haensch,J Waiting Deborah,Sampath Purushothaman,G. Shahidi	2008	4
9	Methods of producing plasma enhanced chemical vapor deposition silicon nitride thin films with high compressive and tensile stress Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ·Michael Belyansky,M. A. Chace,Oleg Gluschenkov,Charles Mavhunga,N. Klymko,Anita Madan,Anupama Mallikarjunan,S. Molis,Paul Ronsheim,A. Trostl,Liangqiong Peng,M. Kessler Robb	2008	26
10	Molecular Caulking Journal of The Electrochemical Society ·Christopher Jezewski,Jacqueline Mattick,Dexian Ye,Anupama Mallikarjunan,Giovanni Rondonuwu,Clair Woods‐Brown,W. A. Lanford,G.-C. Wang,Jay J. Senkevich,Toh‐Ming Lu	2004	24
11	Separation of copper ion-induced and intrinsic polymer instabilities in polyarylether using triangular voltage sweep Journal of Applied Physics ·Anupama Mallikarjunan,S. P. Murarka,Toh‐Ming Lu	2004	6
12	Supercritical carbon dioxide extraction of porogens for the preparation of ultralow-dielectric-constant films Applied Physics Letters ·Rajagopalan Thiruvengadathan,Bashar Lahlouh,Jorge Lubguban,D. Goltermann,S. Gangopadhyay,Izabel Marques Feitoza de Araújo,Dinghai Huang,Sindee L. Simon,Anupama Mallikarjunan,H.-C. Kim,Willi Volksen,Michael F. Toney,E. Huang,E.G. Likhnikevich,Eugene Delenia,R. Miller	2003	20
13	Hindered Copper Ion Penetration in Parylene-N Films Electrochemical and Solid-State Letters ·Anupama Mallikarjunan,C. Wiegand,Jay J. Senkevich,G.‐R. Yang,Jared Gómez Rivera,Toh‐Ming Lu	2003	12
14	β -phase tungsten nanorod formation by oblique-angle sputter deposition Applied Physics Letters ·Tansel Karabacak,Anupama Mallikarjunan,J. P. Singh,Dexian Ye,G.-C. Wang,Toh‐Ming Lu	2003	105
15	The Effect of Interfacial Chemistry on Metal Ion Penetration into Polymeric Films MRS Proceedings ·Anupama Mallikarjunan,Ulrike Gruenewald-Schneider,Simon S. Wing,S. P. Murarka,Toh‐Ming Lu	2002	1
16	Mechanical Enhancement Of Nanoporous Low-K Films As Interlayer Dielectrics By Ion Implantation MRS Proceedings ·L. F. Montaggionis,Shi Shu-ding,Anupama Mallikarjunan,H. Bakhru,Toh‐Ming Lu	2002	0
17	Plasma surface modification for ion penetration barrier in organosiloxane polymer Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ·Anupama Mallikarjunan,G.‐R. Yang,S. P. Murarka,Toh‐Ming Lu	2002	11
18	Metal drift behavior in low dielectric constant organosiloxane polymer Applied Physics Letters ·Anupama Mallikarjunan,S. P. Murarka,Toh‐Ming Lu	2001	60
19	Electrical Behavior of Cu Thin Fluorinated PECVD Oxide MIS Capacitors Journal of The Electrochemical Society ·Anupama Mallikarjunan,S. P. Murarka,Christoph Steinbrüchel,Abhishek Kumar,M. V. Kulik	2000	4
20	Resistivity of Copper Films at Thicknesses Near the Mean Free Path of Electrons in Copper Minimization of the Diffuse Scattering in Copper Electrochemical and Solid-State Letters ·Anupama Mallikarjunan	1999	27

About Anupama Mallikarjunan

Anupama Mallikarjunan is a scholar working on Electronic, Optical and Magnetic Materials, Electrical and Electronic Engineering, Mechanics of Materials, Ceramics and Composites and Materials Chemistry, having authored 27 papers that have together received 500 indexed citations. Recurring topics across this work include Semiconductor materials and devices (24 papers), Copper Interconnects and Reliability (16 papers), Metal and Thin Film Mechanics (8 papers), Advanced Memory and Neural Computing (3 papers), High voltage insulation and dielectric phenomena (3 papers), Silicon Nanostructures and Photoluminescence (3 papers), Thin-Film Transistor Technologies (3 papers) and Diamond and Carbon-based Materials Research (2 papers). The work is most often cited by research in Electronic, Optical and Magnetic Materials (203 citations), Surfaces, Coatings and Films (47 citations), Electrical and Electronic Engineering (373 citations), Mechanics of Materials (132 citations) and Materials Chemistry (221 citations). Anupama Mallikarjunan has collaborated with scholars based in United States, Australia and Netherlands. Frequent co-authors include Toh‐Ming Lu, S. P. Murarka, G.-C. Wang, Dexian Ye, Tansel Karabacak, J. P. Singh, Agnes Derecskei‐Kovacs, Manchao Xiao, Xinjian Lei and Ronald M. Pearlstein. Their work appears in journals such as Applied Physics Letters, Journal of The Electrochemical Society, Journal of Vacuum Science & Technology A Vacuum Surfaces and Films, Electrochemical and Solid-State Letters and Chemistry of Materials.

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