Mark L. O’Neill

1.1k total citations
28 papers, 898 citations indexed

About

Mark L. O’Neill is a scholar working on Electrical and Electronic Engineering, Materials Chemistry and Electronic, Optical and Magnetic Materials. According to data from OpenAlex, Mark L. O’Neill has authored 28 papers receiving a total of 898 indexed citations (citations by other indexed papers that have themselves been cited), including 13 papers in Electrical and Electronic Engineering, 12 papers in Materials Chemistry and 9 papers in Electronic, Optical and Magnetic Materials. Recurrent topics in Mark L. O’Neill's work include Semiconductor materials and devices (13 papers), Copper Interconnects and Reliability (9 papers) and Polymer Foaming and Composites (7 papers). Mark L. O’Neill is often cited by papers focused on Semiconductor materials and devices (13 papers), Copper Interconnects and Reliability (9 papers) and Polymer Foaming and Composites (7 papers). Mark L. O’Neill collaborates with scholars based in United States, Canada and Taiwan. Mark L. O’Neill's co-authors include Keith P. Johnston, Y. P. Handa, Matthew Z. Yates, Qing Cao, Mingliang Fang, Judith L. Kerschner, Peeter Kruus, Bing Han, Agnes Derecskei‐Kovacs and Manchao Xiao and has published in prestigious journals such as The Journal of Chemical Physics, Applied Physics Letters and Macromolecules.

In The Last Decade

Mark L. O’Neill

26 papers receiving 866 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Mark L. O’Neill United States 13 425 348 284 211 192 28 898
Maria T. Mota-Martinez Netherlands 13 258 0.6× 84 0.2× 184 0.6× 94 0.4× 56 0.3× 22 683
Christopher Chan United States 8 101 0.2× 257 0.7× 165 0.6× 231 1.1× 22 0.1× 15 703
Yangbin Shen China 19 191 0.4× 47 0.1× 388 1.4× 325 1.5× 166 0.9× 43 967
E. Lalik Poland 17 172 0.4× 115 0.3× 638 2.2× 140 0.7× 22 0.1× 46 960
Grit Kupgan United States 11 111 0.3× 209 0.6× 327 1.2× 291 1.4× 42 0.2× 12 799
Arnaud Viola France 13 138 0.3× 98 0.3× 220 0.8× 66 0.3× 30 0.2× 34 493
Yifei Yang China 14 204 0.5× 50 0.1× 392 1.4× 134 0.6× 29 0.2× 48 705
Charles S. Spanjers United States 11 235 0.6× 50 0.1× 305 1.1× 53 0.3× 27 0.1× 15 608
David Suleiman Puerto Rico 15 316 0.7× 80 0.2× 82 0.3× 244 1.2× 22 0.1× 42 554
Mingxia Yuan China 14 211 0.5× 47 0.1× 374 1.3× 349 1.7× 43 0.2× 21 677

Countries citing papers authored by Mark L. O’Neill

Since Specialization
Citations

This map shows the geographic impact of Mark L. O’Neill's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Mark L. O’Neill with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Mark L. O’Neill more than expected).

Fields of papers citing papers by Mark L. O’Neill

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Mark L. O’Neill. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Mark L. O’Neill. The network helps show where Mark L. O’Neill may publish in the future.

Co-authorship network of co-authors of Mark L. O’Neill

This figure shows the co-authorship network connecting the top 25 collaborators of Mark L. O’Neill. A scholar is included among the top collaborators of Mark L. O’Neill based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Mark L. O’Neill. Mark L. O’Neill is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Sampurno, Yasa, et al.. (2020). Tribological, Thermal and Kinetic Characterization of SiO 2 and Si 3 N 4 Polishing for STI CMP on Blanket and Patterned Wafers. ECS Journal of Solid State Science and Technology. 9(4). 44008–44008. 6 indexed citations
2.
O’Neill, Mark L., et al.. (2019). Stirred Not Shaken: Facile Production of High-Quality, High-Concentration Graphene Aqueous Suspensions Assisted by a Protein. ACS Applied Materials & Interfaces. 12(3). 3815–3826. 6 indexed citations
3.
Huang, Liang, Bo Han, Bing Han, et al.. (2014). Density functional theory study on the full ALD process of silicon nitride thin film deposition via BDEAS or BTBAS and NH3. Physical Chemistry Chemical Physics. 16(34). 18501–18501. 31 indexed citations
4.
Mallikarjunan, Anupama, Manchao Xiao, Xinjian Lei, et al.. (2014). Designing high performance precursors for atomic layer deposition of silicon oxide. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 33(1). 22 indexed citations
5.
Huang, Liang, Bo Han, Bing Han, et al.. (2013). First-Principles Study of a Full Cycle of Atomic Layer Deposition of SiO2Thin Films with Di(sec-butylamino)silane and Ozone. The Journal of Physical Chemistry C. 542155922–542155922. 19 indexed citations
6.
O’Neill, Mark L., et al.. (2011). Impact of Aminosilane Precursor Structure on Silicon Oxides by Atomic Layer Deposition. The Electrochemical Society Interface. 20(4). 33–37. 38 indexed citations
7.
O’Neill, Mark L., et al.. (2007). Formation of Porous Organosilicate Glasses Produced by PECVD and UV Treatment. MRS Proceedings. 990. 2 indexed citations
8.
9.
Cheng, Yi-Lung, et al.. (2007). Optimization and integration of trimethylsilane-based organosilicate glass and organofluorinated silicate glass dielectric thin films for Cu damascene process. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 25(1). 96–101. 1 indexed citations
10.
O’Neill, Mark L., Brian K. Peterson, Raymond N. Vrtis, et al.. (2006). Impact of Pore Size and Morphology of Porous Organosilicate Glasses on Integrated Circuit Manufacturing. MRS Proceedings. 914. 9 indexed citations
11.
12.
O’Neill, Mark L., et al.. (2003). Optimized Materials Properties for Organosilicate Glasses Produced by Plasma-Enhanced Chemical Vapor Deposition. MRS Proceedings. 766. 6 indexed citations
13.
Vrtis, Raymond N., et al.. (2003). Plasma Enhanced Chemical Vapor Deposition of Porous Organosilicate Glass ILD Films With k ≤ 2.4.. MRS Proceedings. 766. 10 indexed citations
14.
Lin, Eric K., Hae‐Jeong Lee, Gary W. Lynn, Wen‐Li Wu, & Mark L. O’Neill. (2002). Structural characterization of a porous low-dielectric-constant thin film with a non-uniform depth profile. Applied Physics Letters. 81(4). 607–609. 11 indexed citations
15.
O’Neill, Mark L., et al.. (1998). Dispersion Polymerization in Supercritical CO2with a Siloxane-Based Macromonomer:  1. The Particle Growth Regime. Macromolecules. 31(9). 2838–2847. 92 indexed citations
16.
O’Neill, Mark L., et al.. (1998). Solubility of Homopolymers and Copolymers in Carbon Dioxide. Industrial & Engineering Chemistry Research. 37(8). 3067–3079. 297 indexed citations
17.
Handa, Y. P., Peeter Kruus, & Mark L. O’Neill. (1996). High-pressure calorimetric study of plasticization of poly(methyl methacrylate) by methane, ethylene, and carbon dioxide. Journal of Polymer Science Part B Polymer Physics. 34(15). 2635–2639. 60 indexed citations
18.
Handa, Y. P., et al.. (1994). On the plasticization of poly(2,6‐dimethyl phenylene oxide) by CO2. Journal of Polymer Science Part B Polymer Physics. 32(15). 2549–2553. 37 indexed citations
19.
Handa, Y. P., et al.. (1993). Compressed-gas-induced plasticization of polymers. Thermochimica Acta. 226. 177–185. 45 indexed citations
20.
O’Neill, Mark L., Peeter Kruus, & Robert Burk. (1993). Solvatochromic parameters and solubilities in supercritical fluid systems. Canadian Journal of Chemistry. 71(11). 1834–1840. 17 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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