Raymond N. Vrtis

895 citations

31 papers · 709 indexed · h-index 16

Electrical and Electronic Engineering
Organic Chemistry top 10%
Inorganic Chemistry top 5%
Electronic, Optical and Magnetic Materials top 10%
Materials Chemistry

Co-authors: Stephen J. Lippard Simon G. Bott Ch. Pulla Rao Alfred P. Sattelberger David L. Clark David A. Roberts P. H. Townsend Alvin L. S. Loke
Topics: Copper Interconnects and Reliability (19 papers)Semiconductor materials and devices (18 papers)Metal and Thin Film Mechanics (10 papers)
Cited by: Inorganic Chemistry Process Chemistry and Technology Electronic, Optical and Magnetic Materials
Journals: Journal of the American Chemical Society Applied Physics Letters Journal of The Electrochemical Society
Partner nations: United States Japan India

In The Last Decade

Raymond N. Vrtis

31 papers receiving 664 citations

Peers

Countries citing papers authored by Raymond N. Vrtis

Since Specialization

Citations

This map shows the geographic impact of Raymond N. Vrtis's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Raymond N. Vrtis with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Raymond N. Vrtis more than expected).

Fields of papers citing papers by Raymond N. Vrtis

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Raymond N. Vrtis. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Raymond N. Vrtis. The network helps show where Raymond N. Vrtis may publish in the future.

Co-authorship network of co-authors of Raymond N. Vrtis

This figure shows the co-authorship network connecting the top 25 collaborators of Raymond N. Vrtis. A scholar is included among the top collaborators of Raymond N. Vrtis based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Raymond N. Vrtis. Raymond N. Vrtis is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

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20 of 20 papers shown

#	Work	Indexed citations
1	Silicon precursor development for advanced dielectric barriers for VLSI technology 2011 ·Microelectronic Engineering ·Anupama Mallikarjunan,(unknown),Laura M. Matz,Raymond N. Vrtis,Agnes Derecskei‐Kovacs,Xuezhong Jiang,Manchao Xiao	23
2	Formation of Porous Organosilicate Glasses Produced by PECVD and UV Treatment 2007 ·MRS Proceedings ·Mark L. O’Neill,Lin‐Shu Du,(unknown),Brian K. Peterson,Scott J. Weigel,(unknown),Raymond N. Vrtis,(unknown),(unknown),(unknown)	2
3	Impact of Pore Size and Morphology of Porous Organosilicate Glasses on Integrated Circuit Manufacturing 2006 ·MRS Proceedings ·Mark L. O’Neill,(unknown),Brian K. Peterson,Raymond N. Vrtis,Scott J. Weigel,Dingjun Wu,(unknown),Eugene J. Karwacki	9
4	Optimized Materials Properties for Organosilicate Glasses Produced by Plasma-Enhanced Chemical Vapor Deposition 2003 ·MRS Proceedings ·Mark L. O’Neill,Raymond N. Vrtis,Jean‐Louis Vincent,(unknown),Eugene J. Karwacki,Brian K. Peterson,(unknown)	6
5	Plasma Enhanced Chemical Vapor Deposition of Porous Organosilicate Glass ILD Films With k ≤ 2.4. 2003 ·MRS Proceedings ·Raymond N. Vrtis,Mark L. O’Neill,Jean‐Louis Vincent,(unknown),Brian K. Peterson,(unknown),Eugene J. Karwacki	10
6	Annealing ultra thin Ta2O5 films deposited on bare and nitrogen passivated Si(100) 1999 ·Thin Solid Films ·(unknown),(unknown),(unknown),(unknown),John White,Dim‐Lee Kwong,David A. Roberts,Raymond N. Vrtis	17
7	Evaluation of Copper Penetration in Low-κ Polymer Dielectrics by Bias-Temperature Stress 1999 ·MRS Proceedings ·Alvin L. S. Loke,S.S. Wong,N. Talwalkar,J. T. Wetzel,P. H. Townsend,(unknown),Raymond N. Vrtis,(unknown),(unknown)	6
8	Ultra Thin High Quality Ta₂O₅Gate Dielectrics Prepared byIn-situRapid Thermal Processing 1999 ·MRS Proceedings ·H.F. Luan,(unknown),(unknown),(unknown),Raymond N. Vrtis,David A. Roberts,D. L. Kwong	20
9	Evaluation of Copper Penetration in Low-κ Polymer Dielectrics by Bias-Temperature Stress 1999 ·MRS Proceedings ·Alvin L. S. Loke,S.S. Wong,N. Talwalkar,J. T. Wetzel,P. H. Townsend,(unknown),Raymond N. Vrtis,(unknown),(unknown)	1
10	Effects of vacuum and inert gas annealing of ultrathin tantalum pentoxide films on Si(100) 1999 ·Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ·(unknown),(unknown),J.M. White,D. L. Kwong,David A. Roberts,Raymond N. Vrtis	17
11	Kinetics of copper drift in low-κ polymer interlevel dielectrics 1999 ·IEEE Transactions on Electron Devices ·Alvin L. S. Loke,J. T. Wetzel,P. H. Townsend,(unknown),Raymond N. Vrtis,(unknown),Devendra Kumar,(unknown),S.S. Wong	105
12	Ultrathin Ta2O5 film growth by chemical vapor deposition of Ta(N(CH3)2)5 and O2 on bare and SiOxNy-passivated Si(100) for gate dielectric applications 1998 ·Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ·(unknown),(unknown),(unknown),(unknown),E. D. Pylant,(unknown),John White,D. L. Kwong,David A. Roberts,Raymond N. Vrtis	33
13	Electrical Reliability of Cu and Low-KDielectric Integration 1998 ·MRS Proceedings ·S.S. Wong,Alvin L. S. Loke,J. T. Wetzel,P. H. Townsend,Raymond N. Vrtis,(unknown)	8
14	Chemical vapor deposition of ultrathin Ta2O5 films using Ta[N(CH3)2]5 1998 ·Applied Physics Letters ·(unknown),(unknown),Yong Sun,(unknown),(unknown),(unknown),John White,Dim‐Lee Kwong,David A. Roberts,Raymond N. Vrtis	40
15	Linear carbonyl-bridged, dinuclear tantalum siloxycarbyne complexes 1992 ·Organometallics ·Raymond N. Vrtis,Simon G. Bott,Stephen J. Lippard	17
16	MOCVD-TiN Barrier Layers for ULSI Applications 1992 ·MRS Proceedings ·Ivo J. Raaijmakers,Raymond N. Vrtis,Jack Yang,(unknown),(unknown),David A. Roberts,E. K. Broadbent	5
17	Reductive Coupling of Carbon Monoxide and Alkyl Isocyanide Ligands in Early Transition Metal Complexes: A Review 1990 ·Israel Journal of Chemistry ·Raymond N. Vrtis,Stephen J. Lippard	32
18	Lewis base adducts of uranium triiodide: a new class of synthetically useful precursors for trivalent uranium chemistry 1989 ·Inorganic Chemistry ·David L. Clark,Alfred P. Sattelberger,Simon G. Bott,Raymond N. Vrtis	98
19	Synthesis and stabilization of tantalum-coordinated dihydroxyacetylene from two reductively coupled carbon monoxide ligands 1988 ·Journal of the American Chemical Society ·Raymond N. Vrtis,Ch. Pulla Rao,Simon G. Bott,Stephen J. Lippard	32
20	Higher coordinate complexes. 23. Reductive coupling of carbon monoxide ligands to form coordinated bis(trimethylsiloxy)ethyne in seven-coordinate niobium(I) and tantalum(I) [M(CO)2(dmpe)2Cl] complexes 1987 ·Organometallics ·Patricia A. Bianconi,Raymond N. Vrtis,Ch. Pulla Rao,Ian D. Williams,(unknown),Stephen J. Lippard	55

About Raymond N. Vrtis

Raymond N. Vrtis is a scholar working on Electronic, Optical and Magnetic Materials, Mechanics of Materials and Catalysis, having authored 31 papers that have together received 709 indexed citations. Recurring topics across this work include Copper Interconnects and Reliability (19 papers), Semiconductor materials and devices (18 papers) and Metal and Thin Film Mechanics (10 papers). The work is most often cited by research in Inorganic Chemistry (236 citations), Process Chemistry and Technology (35 citations) and Electronic, Optical and Magnetic Materials (203 citations). Raymond N. Vrtis has collaborated with scholars based in United States, Japan and India. Frequent co-authors include Stephen J. Lippard, Simon G. Bott, Ch. Pulla Rao, Alfred P. Sattelberger, David L. Clark, David A. Roberts, P. H. Townsend, Alvin L. S. Loke, S.S. Wong and J. T. Wetzel. Their work appears in journals such as Journal of the American Chemical Society, Applied Physics Letters and Journal of The Electrochemical Society.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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