Harm C. M. Knoops

4.0k total citations
78 papers, 3.3k citations indexed

About

Harm C. M. Knoops is a scholar working on Electrical and Electronic Engineering, Materials Chemistry and Electronic, Optical and Magnetic Materials. According to data from OpenAlex, Harm C. M. Knoops has authored 78 papers receiving a total of 3.3k indexed citations (citations by other indexed papers that have themselves been cited), including 73 papers in Electrical and Electronic Engineering, 49 papers in Materials Chemistry and 15 papers in Electronic, Optical and Magnetic Materials. Recurrent topics in Harm C. M. Knoops's work include Semiconductor materials and devices (63 papers), Electronic and Structural Properties of Oxides (25 papers) and ZnO doping and properties (16 papers). Harm C. M. Knoops is often cited by papers focused on Semiconductor materials and devices (63 papers), Electronic and Structural Properties of Oxides (25 papers) and ZnO doping and properties (16 papers). Harm C. M. Knoops collaborates with scholars based in Netherlands, United Kingdom and Finland. Harm C. M. Knoops's co-authors include W. M. M. Kessels, M. C. M. van de Sanden, E. Langereis, Tahsin Faraz, Peter H. L. Notten, Adriaan J. M. Mackus, Karsten Arts, Merijn E. Donders, F. Roozeboom and S. B. S. Heil and has published in prestigious journals such as The Journal of Chemical Physics, Applied Physics Letters and Journal of Applied Physics.

In The Last Decade

Harm C. M. Knoops

73 papers receiving 3.3k citations

Author Peers

Peers are selected by citation overlap in the author's most active subfields. citations · hero ref

Author Last Decade Papers Cites
Harm C. M. Knoops 2.9k 2.1k 519 324 231 78 3.3k
Yuri F. Zhukovskii 1.1k 0.4× 2.1k 1.0× 703 1.4× 119 0.4× 124 0.5× 129 2.8k
Cem Sevik 2.1k 0.7× 5.1k 2.5× 476 0.9× 147 0.5× 494 2.1× 119 5.6k
Johann W. Bartha 2.0k 0.7× 1.2k 0.6× 493 0.9× 364 1.1× 430 1.9× 163 2.7k
Nobuyuki Zettsu 1.2k 0.4× 979 0.5× 716 1.4× 98 0.3× 470 2.0× 112 2.4k
Barry Brennan 2.1k 0.7× 2.0k 1.0× 410 0.8× 71 0.2× 419 1.8× 85 3.1k
Félix Mouhat 1.0k 0.4× 2.9k 1.4× 810 1.6× 320 1.0× 136 0.6× 6 3.5k
Nebil A. Katcho 1.3k 0.5× 3.3k 1.6× 468 0.9× 121 0.4× 124 0.5× 43 3.9k
James C. Culbertson 1.3k 0.4× 2.5k 1.2× 714 1.4× 176 0.5× 660 2.9× 83 3.2k
Darshana Wickramaratne 1.5k 0.5× 2.5k 1.2× 561 1.1× 116 0.4× 266 1.2× 82 3.0k

Countries citing papers authored by Harm C. M. Knoops

Since Specialization
Citations

This map shows the geographic impact of Harm C. M. Knoops's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Harm C. M. Knoops with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Harm C. M. Knoops more than expected).

Fields of papers citing papers by Harm C. M. Knoops

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Harm C. M. Knoops. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Harm C. M. Knoops. The network helps show where Harm C. M. Knoops may publish in the future.

Co-authorship network of co-authors of Harm C. M. Knoops

This figure shows the co-authorship network connecting the top 25 collaborators of Harm C. M. Knoops. A scholar is included among the top collaborators of Harm C. M. Knoops based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Harm C. M. Knoops. Harm C. M. Knoops is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Riazimehr, Sarah, Martin Otto, Michael J. Powell, et al.. (2025). Plasma-enhanced atomic layer deposition of Al2O3 on graphene via an in situ-deposited interlayer. Materials Science in Semiconductor Processing. 199. 109829–109829.
2.
Verheijen, Marcel A., Michael J. Powell, L. Bailey, et al.. (2025). Superconducting NbxTi1−xN prepared at high deposition rates with plasma-enhanced atomic layer deposition and substrate biasing. AVS Quantum Science. 7(2).
3.
Knoops, Harm C. M., et al.. (2024). Plasma Processes for Vertical Niobium Nitride Superconducting Through Silicon Vias. IEEE Electron Device Letters. 46(2). 175–178.
4.
Maas, Joris, Ilker Tezsevin, Marc J. M. Merkx, et al.. (2024). Investigation of the atomic layer etching mechanism for Al2O3 using hexafluoroacetylacetone and H2 plasma. Journal of Materials Chemistry C. 13(3). 1345–1358. 5 indexed citations
5.
Merkx, Marc J. M., et al.. (2023). Ultrathin superconducting TaCxN1−x films prepared by plasma-enhanced atomic layer deposition with ion-energy control. Applied Physics Letters. 123(13). 6 indexed citations
6.
Wang, Haozhe, et al.. (2023). Isotropic plasma-thermal atomic layer etching of superconducting titanium nitride films using sequential exposures of molecular oxygen and SF6/H2 plasma. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 41(6). 9 indexed citations
7.
Shu, Yi, et al.. (2023). Isotropic atomic layer etching of GaN using SF6 plasma and Al(CH3)3. Journal of Applied Physics. 134(7). 8 indexed citations
8.
Arts, Karsten, et al.. (2021). Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO2. Chemistry of Materials. 33(13). 5002–5009. 22 indexed citations
9.
Vos, Martijn F. J., et al.. (2020). Isotropic plasma atomic layer etching of Al2O3 using a fluorine containing plasma and Al(CH3)3. Applied Physics Letters. 117(16). 21 indexed citations
10.
11.
Arts, Karsten, Mikko Utriainen, Riikka L. Puurunen, W. M. M. Kessels, & Harm C. M. Knoops. (2019). Correction to “Film Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO2, TiO2, Al2O3 and HfO2”. The Journal of Physical Chemistry C. 124(1). 1250–1250.
12.
Faraz, Tahsin, Karsten Arts, Saurabh Karwal, Harm C. M. Knoops, & W. M. M. Kessels. (2018). Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties. Plasma Sources Science and Technology. 28(2). 24002–24002. 74 indexed citations
13.
Faraz, Tahsin, Harm C. M. Knoops, Marcel A. Verheijen, et al.. (2018). Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies. ACS Applied Materials & Interfaces. 10(15). 13158–13180. 93 indexed citations
14.
Hemakumara, Dilini, et al.. (2017). The Impact on GaN MOS Capacitor Performance of In‐situ Processing in a Clustered ALD/ICP/RIE Tool. ENLIGHTEN (Jurnal Bimbingan dan Konseling Islam).
15.
Faraz, Tahsin, Harm C. M. Knoops, Anupama Mallikarjunan, et al.. (2016). Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N2Plasma on Planar and 3D Substrate Topographies. ACS Applied Materials & Interfaces. 9(2). 1858–1869. 45 indexed citations
16.
Faraz, Tahsin, F. Roozeboom, Harm C. M. Knoops, & W. M. M. Kessels. (2015). Atomic Layer Etching: What Can We Learn from Atomic Layer Deposition?. ECS Journal of Solid State Science and Technology. 4(6). N5023–N5032. 126 indexed citations
17.
Verheijen, Marcel A., et al.. (2014). Plasma‐Assisted Atomic Layer Deposition of PtOx from (MeCp)PtMe3 and O2 Plasma. Chemical Vapor Deposition. 20(7-8-9). 258–268. 11 indexed citations
18.
Knoops, Harm C. M., Merijn E. Donders, M. C. M. van de Sanden, Peter H. L. Notten, & W. M. M. Kessels. (2011). Atomic layer deposition for nanostructured Li-ion batteries. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 30(1). 117 indexed citations
19.
Langereis, E., et al.. (2009). In situ spectroscopic ellipsometry for atomic layer deposition. Munich Personal RePEc Archive (Ludwig Maximilian University of Munich). 2010(36). 36–41. 1 indexed citations
20.
Eriksson, Axel M., H. Nordman, P. Strand, et al.. (2007). Predictive simulations of toroidal momentum transport at JET. Plasma Physics and Controlled Fusion. 49(11). 1931–1943. 10 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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