Harm C. M. Knoops

4.0k total citations
78 papers, 3.3k citations indexed

About

Harm C. M. Knoops is a scholar working on Electrical and Electronic Engineering, Materials Chemistry and Electronic, Optical and Magnetic Materials. According to data from OpenAlex, Harm C. M. Knoops has authored 78 papers receiving a total of 3.3k indexed citations (citations by other indexed papers that have themselves been cited), including 73 papers in Electrical and Electronic Engineering, 49 papers in Materials Chemistry and 15 papers in Electronic, Optical and Magnetic Materials. Recurrent topics in Harm C. M. Knoops's work include Semiconductor materials and devices (63 papers), Electronic and Structural Properties of Oxides (25 papers) and ZnO doping and properties (16 papers). Harm C. M. Knoops is often cited by papers focused on Semiconductor materials and devices (63 papers), Electronic and Structural Properties of Oxides (25 papers) and ZnO doping and properties (16 papers). Harm C. M. Knoops collaborates with scholars based in Netherlands, United Kingdom and Finland. Harm C. M. Knoops's co-authors include W. M. M. Kessels, M. C. M. van de Sanden, E. Langereis, Tahsin Faraz, Peter H. L. Notten, Adriaan J. M. Mackus, Karsten Arts, Merijn E. Donders, F. Roozeboom and S. B. S. Heil and has published in prestigious journals such as The Journal of Chemical Physics, Applied Physics Letters and Journal of Applied Physics.

In The Last Decade

Harm C. M. Knoops

73 papers receiving 3.3k citations

Peers

Countries citing papers authored by Harm C. M. Knoops

Since Specialization

Citations

This map shows the geographic impact of Harm C. M. Knoops's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Harm C. M. Knoops with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Harm C. M. Knoops more than expected).

Fields of papers citing papers by Harm C. M. Knoops

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Harm C. M. Knoops. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Harm C. M. Knoops. The network helps show where Harm C. M. Knoops may publish in the future.

Co-authorship network of co-authors of Harm C. M. Knoops

This figure shows the co-authorship network connecting the top 25 collaborators of Harm C. M. Knoops. A scholar is included among the top collaborators of Harm C. M. Knoops based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Harm C. M. Knoops. Harm C. M. Knoops is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

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20 of 20 papers shown

#	Work	Indexed citations
1	Plasma-enhanced atomic layer deposition of Al2O3 on graphene via an in situ-deposited interlayer 2025 ·Materials Science in Semiconductor Processing ·Sarah Riazimehr, (unknown), Martin Otto, Michael J. Powell, Gordon Rinke, (unknown), (unknown), Max C. Lemme, (unknown), Harm C. M. Knoops	0
2	Superconducting NbxTi1−xN prepared at high deposition rates with plasma-enhanced atomic layer deposition and substrate biasing 2025 ·AVS Quantum Science ·(unknown), (unknown), (unknown), (unknown), (unknown), Marcel A. Verheijen, Michael J. Powell, L. Bailey, Robert H. Hadfield, W. M. M. Kessels, Harm C. M. Knoops	0
3	Plasma Processes for Vertical Niobium Nitride Superconducting Through Silicon Vias 2024 ·IEEE Electron Device Letters ·(unknown), (unknown), (unknown), Harm C. M. Knoops, Russ Renzas, Robert H. Hadfield, Mike Cooke	0
4	Investigation of the atomic layer etching mechanism for Al₂O₃ using hexafluoroacetylacetone and H₂ plasma 2024 ·Journal of Materials Chemistry C ·(unknown), Joris Maas, Ilker Tezsevin, Marc J. M. Merkx, Harm C. M. Knoops, W. M. M. Kessels, Adriaan J. M. Mackus	5
5	Ultrathin superconducting TaCxN1−x films prepared by plasma-enhanced atomic layer deposition with ion-energy control 2023 ·Applied Physics Letters ·(unknown), (unknown), Marc J. M. Merkx, Robert H. Hadfield, W. M. M. Kessels, Marcel A. Verheijen, Harm C. M. Knoops	6
6	Isotropic plasma-thermal atomic layer etching of superconducting titanium nitride films using sequential exposures of molecular oxygen and SF6/H2 plasma 2023 ·Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ·(unknown), Haozhe Wang, (unknown), M. S. Leung, Harm C. M. Knoops, Russ Renzas, Austin J. Minnich	9
7	Isotropic atomic layer etching of GaN using SF6 plasma and Al(CH3)3 2023 ·Journal of Applied Physics ·(unknown), Yi Shu, Simon D. Elliott, Harm C. M. Knoops, W. M. M. Kessels, Adriaan J. M. Mackus	8
8	Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO₂ 2021 ·Chemistry of Materials ·Karsten Arts, (unknown), Marcel A. Verheijen, Riikka L. Puurunen, W. M. M. Kessels, Harm C. M. Knoops	22
9	Isotropic plasma atomic layer etching of Al2O3 using a fluorine containing plasma and Al(CH3)3 2020 ·Applied Physics Letters ·(unknown), Martijn F. J. Vos, Tahsin Faraz, W. M. M. Kessels, Harm C. M. Knoops, Adriaan J. M. Mackus	21
10	Evidence for low-energy ions influencing plasma-assisted atomic layer deposition of SiO2: Impact on the growth per cycle and wet etch rate 2020 ·Applied Physics Letters ·Karsten Arts, (unknown), Tahsin Faraz, Riikka L. Puurunen, W. M. M. Kessels, Harm C. M. Knoops	19
11	Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties 2018 ·Plasma Sources Science and Technology ·Tahsin Faraz, Karsten Arts, Saurabh Karwal, Harm C. M. Knoops, W. M. M. Kessels	74
12	Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies 2018 ·ACS Applied Materials & Interfaces ·Tahsin Faraz, Harm C. M. Knoops, Marcel A. Verheijen, (unknown), Saurabh Karwal, Akhil Sharma, (unknown), Adriana Szeghalmi, Dennis M. Hausmann, (unknown), Mariadriana Creatore, W. M. M. Kessels	93
13	The Impact on GaN MOS Capacitor Performance of In‐situ Processing in a Clustered ALD/ICP/RIE Tool 2017 ·ENLIGHTEN (Jurnal Bimbingan dan Konseling Islam) ·Dilini Hemakumara, (unknown), (unknown), (unknown), Ivor Guiney, David A. J. Moran, (unknown), Aileen O׳Mahony, Harm C. M. Knoops, (unknown)	0
14	Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N₂Plasma on Planar and 3D Substrate Topographies 2016 ·ACS Applied Materials & Interfaces ·Tahsin Faraz, (unknown), Harm C. M. Knoops, Anupama Mallikarjunan, Iain Buchanan, Dennis M. Hausmann, (unknown), W. M. M. Kessels	45
15	Atomic Layer Etching: What Can We Learn from Atomic Layer Deposition? 2015 ·ECS Journal of Solid State Science and Technology ·Tahsin Faraz, F. Roozeboom, Harm C. M. Knoops, W. M. M. Kessels	126
16	Plasma‐Assisted Atomic Layer Deposition of PtO_x from (MeCp)PtMe₃ and O₂ Plasma 2014 ·Chemical Vapor Deposition ·(unknown), Marcel A. Verheijen, Harm C. M. Knoops, (unknown), F. Roozeboom, W. M. M. Kessels	11
17	Electrical transport and Al doping efficiency in nanoscale ZnO films prepared by atomic layer deposition 2013 ·Journal of Applied Physics ·Yongjun Wu, (unknown), Bas W. H. van de Loo, Harm C. M. Knoops, Stephen E. Potts, Marcel A. Verheijen, F. Roozeboom, W. M. M. Kessels	75
18	Atomic layer deposition for nanostructured Li-ion batteries 2011 ·Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ·Harm C. M. Knoops, Merijn E. Donders, M. C. M. van de Sanden, Peter H. L. Notten, W. M. M. Kessels	117
19	In situ spectroscopic ellipsometry for atomic layer deposition 2009 ·Munich Personal RePEc Archive (Ludwig Maximilian University of Munich) ·E. Langereis, (unknown), Harm C. M. Knoops, W. Keuning, M. C. M. van de Sanden, (unknown)	1
20	Predictive simulations of toroidal momentum transport at JET 2007 ·Plasma Physics and Controlled Fusion ·Axel M. Eriksson, H. Nordman, P. Strand, J. Weiland, T. Tala, E. Asp, G. Corrigan, C. Giroud, Martijn de Greef, I. Jenkins, Harm C. M. Knoops, P. Mantica, Karin Rantamäki, P.C. de Vries, (unknown), (unknown)	10

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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