Tahsin Faraz

968 total citations
18 papers, 813 citations indexed

About

Tahsin Faraz is a scholar working on Electrical and Electronic Engineering, Materials Chemistry and Mechanics of Materials. According to data from OpenAlex, Tahsin Faraz has authored 18 papers receiving a total of 813 indexed citations (citations by other indexed papers that have themselves been cited), including 16 papers in Electrical and Electronic Engineering, 11 papers in Materials Chemistry and 5 papers in Mechanics of Materials. Recurrent topics in Tahsin Faraz's work include Semiconductor materials and devices (14 papers), Electronic and Structural Properties of Oxides (7 papers) and Metal and Thin Film Mechanics (5 papers). Tahsin Faraz is often cited by papers focused on Semiconductor materials and devices (14 papers), Electronic and Structural Properties of Oxides (7 papers) and Metal and Thin Film Mechanics (5 papers). Tahsin Faraz collaborates with scholars based in Netherlands, United Kingdom and Germany. Tahsin Faraz's co-authors include W. M. M. Kessels, Harm C. M. Knoops, Karsten Arts, Marcel A. Verheijen, Saurabh Karwal, F. Roozeboom, Adriaan J. M. Mackus, Mariadriana Creatore, Dennis M. Hausmann and Adriana Szeghalmi and has published in prestigious journals such as Applied Physics Letters, Journal of Applied Physics and Chemistry of Materials.

In The Last Decade

Tahsin Faraz

17 papers receiving 787 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Tahsin Faraz Netherlands 15 721 472 163 93 61 18 813
Karsten Arts Netherlands 12 488 0.7× 366 0.8× 89 0.5× 67 0.7× 36 0.6× 16 562
Junqing Lu South Korea 13 235 0.3× 231 0.5× 251 1.5× 114 1.2× 53 0.9× 28 466
Joji Kurian India 11 235 0.3× 320 0.7× 104 0.6× 84 0.9× 55 0.9× 34 459
Yong Che China 13 399 0.6× 531 1.1× 77 0.5× 290 3.1× 29 0.5× 39 708
Victor P. Mammana Brazil 13 240 0.3× 585 1.2× 87 0.5× 84 0.9× 12 0.2× 27 692
Hexiang Han China 10 310 0.4× 448 0.9× 225 1.4× 24 0.3× 17 0.3× 29 578
P. J. Matsuo United States 13 598 0.8× 226 0.5× 272 1.7× 139 1.5× 15 0.2× 14 686
Arthur Sherman United States 8 278 0.4× 178 0.4× 118 0.7× 104 1.1× 21 0.3× 13 385

Countries citing papers authored by Tahsin Faraz

Since Specialization
Citations

This map shows the geographic impact of Tahsin Faraz's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Tahsin Faraz with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Tahsin Faraz more than expected).

Fields of papers citing papers by Tahsin Faraz

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Tahsin Faraz. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Tahsin Faraz. The network helps show where Tahsin Faraz may publish in the future.

Co-authorship network of co-authors of Tahsin Faraz

This figure shows the co-authorship network connecting the top 25 collaborators of Tahsin Faraz. A scholar is included among the top collaborators of Tahsin Faraz based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Tahsin Faraz. Tahsin Faraz is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

18 of 18 papers shown
1.
Faraz, Tahsin, P. Schmitt, Sven Schröder, et al.. (2022). Plasma-Enhanced Atomic Layer Deposition of HfO2 with Substrate Biasing: Thin Films for High-Reflective Mirrors. ACS Applied Materials & Interfaces. 14(12). 14677–14692. 16 indexed citations
2.
Vos, Martijn F. J., et al.. (2020). Isotropic plasma atomic layer etching of Al2O3 using a fluorine containing plasma and Al(CH3)3. Applied Physics Letters. 117(16). 21 indexed citations
3.
Faraz, Tahsin, et al.. (2020). Precise ion energy control with tailored waveform biasing for atomic scale processing. Journal of Applied Physics. 128(21). 41 indexed citations
4.
Merkx, Marc J. M., et al.. (2020). Area-Selective Atomic Layer Deposition of TiN Using Aromatic Inhibitor Molecules for Metal/Dielectric Selectivity. Chemistry of Materials. 32(18). 7788–7795. 54 indexed citations
5.
6.
Karwal, Saurabh, Marcel A. Verheijen, Karsten Arts, et al.. (2020). Plasma-Assisted ALD of Highly Conductive HfNx: On the Effect of Energetic Ions on Film Microstructure. Plasma Chemistry and Plasma Processing. 40(3). 697–712. 17 indexed citations
7.
Balasubramanyam, Shashank, Matthew A. Bloodgood, Tahsin Faraz, et al.. (2019). Probing the Origin and Suppression of Vertically Oriented Nanostructures of 2D WS2 Layers. ACS Applied Materials & Interfaces. 12(3). 3873–3885. 25 indexed citations
8.
Faraz, Tahsin, W. M. M. Kessels, P. Schenk, et al.. (2019). Effect of an electric field during the deposition of silicon dioxide thin films by plasma enhanced atomic layer deposition: an experimental and computational study. Nanoscale. 12(3). 2089–2102. 24 indexed citations
9.
Knoops, Harm C. M., Tahsin Faraz, Karsten Arts, & W. M. M. Kessels. (2019). Status and prospects of plasma-assisted atomic layer deposition. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 37(3). 176 indexed citations
10.
Faraz, Tahsin, Karsten Arts, Saurabh Karwal, Harm C. M. Knoops, & W. M. M. Kessels. (2018). Energetic ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties. Plasma Sources Science and Technology. 28(2). 24002–24002. 74 indexed citations
11.
Faraz, Tahsin, Harm C. M. Knoops, Marcel A. Verheijen, et al.. (2018). Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies. ACS Applied Materials & Interfaces. 10(15). 13158–13180. 93 indexed citations
12.
Karwal, Saurabh, Marcel A. Verheijen, B. L. Williams, et al.. (2018). Low resistivity HfNx grown by plasma-assisted ALD with external rf substrate biasing. Journal of Materials Chemistry C. 6(15). 3917–3926. 38 indexed citations
13.
14.
Faraz, Tahsin, Harm C. M. Knoops, Anupama Mallikarjunan, et al.. (2016). Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di(sec-butylamino)silane and N2Plasma on Planar and 3D Substrate Topographies. ACS Applied Materials & Interfaces. 9(2). 1858–1869. 45 indexed citations
15.
Faraz, Tahsin, et al.. (2016). Nucleation of microcrystalline silicon: on the effect of the substrate surface nature and nano-imprint topography. Journal of Physics D Applied Physics. 49(5). 55205–55205. 1 indexed citations
16.
Faraz, Tahsin, F. Roozeboom, Harm C. M. Knoops, & W. M. M. Kessels. (2015). Atomic Layer Etching: What Can We Learn from Atomic Layer Deposition?. ECS Journal of Solid State Science and Technology. 4(6). N5023–N5032. 126 indexed citations
17.
Faraz, Tahsin. (2012). Benefits of Concentrating Solar Power over Solar Photovoltaic for power generation in Bangladesh. 1–5. 27 indexed citations
18.
Faraz, Tahsin & Abul Azad. (2012). Solar Battery Charging Station and Torque Sensor Based Electrically Assisted Tricycle. BRAC University Institutional Repository (BRAC University). 18–22. 8 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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