Sa‐Kyun Rha

650 total citations
42 papers, 562 citations indexed

About

Sa‐Kyun Rha is a scholar working on Electrical and Electronic Engineering, Electronic, Optical and Magnetic Materials and Materials Chemistry. According to data from OpenAlex, Sa‐Kyun Rha has authored 42 papers receiving a total of 562 indexed citations (citations by other indexed papers that have themselves been cited), including 38 papers in Electrical and Electronic Engineering, 21 papers in Electronic, Optical and Magnetic Materials and 20 papers in Materials Chemistry. Recurrent topics in Sa‐Kyun Rha's work include Semiconductor materials and devices (21 papers), Copper Interconnects and Reliability (20 papers) and Electrodeposition and Electroless Coatings (16 papers). Sa‐Kyun Rha is often cited by papers focused on Semiconductor materials and devices (21 papers), Copper Interconnects and Reliability (20 papers) and Electrodeposition and Electroless Coatings (16 papers). Sa‐Kyun Rha collaborates with scholars based in South Korea and United States. Sa‐Kyun Rha's co-authors include Won‐Jun Lee, Chong-Ook Park, Youn-Seoung Lee, C. N. Whang, Seung Yun Lee, Dong‐Won Kim, Chong Ook Park, Kwan-Yong Lim, Yong‐Duck Chung and Chang Hee Han and has published in prestigious journals such as Journal of The Electrochemical Society, Applied Surface Science and Thin Solid Films.

In The Last Decade

Sa‐Kyun Rha

41 papers receiving 542 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Sa‐Kyun Rha South Korea 13 421 265 190 128 87 42 562
Hidemitsu Aoki Japan 13 351 0.8× 269 1.0× 157 0.8× 109 0.9× 49 0.6× 96 563
C. Chaneliere France 9 769 1.8× 460 1.7× 210 1.1× 83 0.6× 111 1.3× 12 908
Anupama Mallikarjunan United States 13 373 0.9× 221 0.8× 203 1.1× 132 1.0× 60 0.7× 27 500
Hideto Yanagisawa Japan 10 240 0.6× 190 0.7× 99 0.5× 155 1.2× 62 0.7× 30 387
Chiharu Kimura Japan 15 391 0.9× 546 2.1× 150 0.8× 175 1.4× 75 0.9× 86 808
Z. A. Sechrist United States 7 457 1.1× 582 2.2× 103 0.5× 87 0.7× 69 0.8× 9 758
Volkan Şenay Türkiye 15 363 0.9× 439 1.7× 117 0.6× 122 1.0× 76 0.9× 54 657
M.J. Thwaites United Kingdom 14 375 0.9× 418 1.6× 225 1.2× 71 0.6× 181 2.1× 29 720
P. Guérin France 14 226 0.5× 355 1.3× 107 0.6× 109 0.9× 41 0.5× 22 523

Countries citing papers authored by Sa‐Kyun Rha

Since Specialization
Citations

This map shows the geographic impact of Sa‐Kyun Rha's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Sa‐Kyun Rha with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Sa‐Kyun Rha more than expected).

Fields of papers citing papers by Sa‐Kyun Rha

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Sa‐Kyun Rha. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Sa‐Kyun Rha. The network helps show where Sa‐Kyun Rha may publish in the future.

Co-authorship network of co-authors of Sa‐Kyun Rha

This figure shows the co-authorship network connecting the top 25 collaborators of Sa‐Kyun Rha. A scholar is included among the top collaborators of Sa‐Kyun Rha based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Sa‐Kyun Rha. Sa‐Kyun Rha is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Rha, Sa‐Kyun, et al.. (2020). Catalytic characteristics of Ni(B)-coated YSZ powder by neutral electroless plating. Journal of the Korean Ceramic Society. 57(3). 338–344. 3 indexed citations
2.
Rha, Sa‐Kyun, et al.. (2015). Effects of Dimethylamine Borane in Electroless Ni–B Plating. Journal of Nanoscience and Nanotechnology. 15(10). 7444–7450. 6 indexed citations
3.
Rha, Sa‐Kyun & Youn-Seoung Lee. (2015). Investigation of Eco-friendly Electroless Copper Coating by Sodium-phosphinate. Journal of the Korean Ceramic Society. 52(4). 264–268. 1 indexed citations
4.
Rha, Sa‐Kyun, et al.. (2013). Characteristics of the Ni–B Film in Printed Circuit Board for High-Power Light-Emitting Diodes. Journal of Nanoscience and Nanotechnology. 13(9). 6307–6311. 1 indexed citations
5.
Kim, Jae‐Kyung, et al.. (2012). Atomic Layer Deposition of SiO<SUB>2</SUB> Thin Films Using Tetrakis(ethylamino)silane and Ozone. Journal of Nanoscience and Nanotechnology. 12(4). 3589–3592. 11 indexed citations
6.
Lee, Youn-Seoung, et al.. (2011). Characteristics of SiO<SUB>2</SUB>/Si<SUB>3</SUB>N<SUB>4</SUB>/SiO<SUB>2</SUB> Stacked-Gate Dielectrics Obtained via Atomic-Layer Deposition. Journal of Nanoscience and Nanotechnology. 11(7). 5795–5799. 4 indexed citations
7.
Lee, Seungwon, et al.. (2011). The electrical properties of dielectric stacks of SiO2 and Al2O3 prepared by atomic layer deposition method. Current Applied Physics. 12(2). 434–436. 8 indexed citations
8.
Lee, Youn-Seoung, et al.. (2009). Characterization of Electroplated Cu Thin Films on Electron-Beam-Evaporated Cu Seed Layers. Journal of the Korean Physical Society. 54(3). 1141–1145. 4 indexed citations
9.
Rha, Sa‐Kyun, Tammy P. Chou, Guozhong Cao, Youn-Seoung Lee, & Won‐Jun Lee. (2008). Characteristics of silicon oxide thin films prepared by sol electrophoretic deposition method using tetraethylorthosilicate as the precursor. Current Applied Physics. 9(2). 551–555. 16 indexed citations
10.
Lee, Won‐Jun, et al.. (2004). A comparative study on the Si precursors for the atomic layer deposition of silicon nitride thin films. Journal of the Korean Physical Society. 45(5). 1352–1355. 32 indexed citations
11.
Lee, Won‐Jun & Sa‐Kyun Rha. (2004). Chemical vapor deposition–physical vapor deposition aluminum plug process for dynamic random-access memory applications. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 22(4). 1931–1934. 1 indexed citations
12.
Kim, Un‐Jung, et al.. (2004). Investigation of Silicon Oxide Thin Films Prepared by Atomic Layer Deposition Using SiH2Cl2and O3as the Precursors. Japanese Journal of Applied Physics. 43(No. 3A). L328–L330. 34 indexed citations
13.
Lee, Won‐Jun, Youn-Seoung Lee, Sa‐Kyun Rha, et al.. (2003). Adhesion and interface chemical reactions of Cu/polyimide and Cu/TiN by XPS. Applied Surface Science. 205(1-4). 128–136. 96 indexed citations
14.
Lee, Won‐Jun, Sun-Jae Kim, Wonhee Lee, et al.. (2003). . Journal of Materials Science Materials in Electronics. 15(1). 9–13. 4 indexed citations
15.
Cho, Won-Ju, et al.. (2000). Improvement of sheet resistance and gate oxide integrity using phosphorus ion implantation in tungsten polycide gate. Solid-State Electronics. 44(3). 393–399. 4 indexed citations
16.
Lee, Won‐Jun, et al.. (2000). Thermally Stable Tungsten Bit-line Process Flow for the Capacitor Over Bit-line-Type Dynamic Random-Access Memory. Japanese Journal of Applied Physics. 39(6R). 3344–3344. 4 indexed citations
17.
Rha, Sa‐Kyun, et al.. (1998). Structural and chemical stability of Ta–Si–N thin film between Si and Cu. Thin Solid Films. 320(1). 141–146. 44 indexed citations
18.
Rha, Sa‐Kyun, et al.. (1997). Interdiffusions and reactions in Cu/TiN/Ti/Si and Cu/TiN/Ti/SiO2/Si multilayer structures. Journal of materials research/Pratt's guide to venture capital sources. 12(12). 3367–3372. 19 indexed citations
19.
Rha, Sa‐Kyun, Won‐Jun Lee, Seung-Yun Lee, Dong‐Won Kim, & Chong-Ook Park. (1997). Grain growth of copper films prepared by chemical vapour deposition. Journal of Materials Science Materials in Electronics. 8(4). 217–221. 6 indexed citations
20.
Lee, Seung-Yun, et al.. (1997). Effects of the Partial Pressure of Copper (I) Hexafluoroacetylacetonate Trimethylvinylsilane on the Chemical Vapor Deposition of Copper. Japanese Journal of Applied Physics. 36(8R). 5249–5249. 6 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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