Masaki Yoshimaru

888 total citations
57 papers, 695 citations indexed

About

Masaki Yoshimaru is a scholar working on Electrical and Electronic Engineering, Electronic, Optical and Magnetic Materials and Materials Chemistry. According to data from OpenAlex, Masaki Yoshimaru has authored 57 papers receiving a total of 695 indexed citations (citations by other indexed papers that have themselves been cited), including 50 papers in Electrical and Electronic Engineering, 26 papers in Electronic, Optical and Magnetic Materials and 17 papers in Materials Chemistry. Recurrent topics in Masaki Yoshimaru's work include Semiconductor materials and devices (43 papers), Copper Interconnects and Reliability (24 papers) and Metal and Thin Film Mechanics (8 papers). Masaki Yoshimaru is often cited by papers focused on Semiconductor materials and devices (43 papers), Copper Interconnects and Reliability (24 papers) and Metal and Thin Film Mechanics (8 papers). Masaki Yoshimaru collaborates with scholars based in Japan and United States. Masaki Yoshimaru's co-authors include Satoshi Koizumi, Koya Shimokawa, Satoshi Yamauchi, Shih-Chang Chen, Hiroyuki Tamura, Noriyuki Inoue, Hideaki Matsuhashi, Masahiro Moniwa, Nobutaka Shimizu and Makoto Wada and has published in prestigious journals such as Journal of Applied Physics, Journal of The Electrochemical Society and Journal of Physics D Applied Physics.

In The Last Decade

Masaki Yoshimaru

54 papers receiving 662 citations

Peers

Countries citing papers authored by Masaki Yoshimaru

Since Specialization

Citations

This map shows the geographic impact of Masaki Yoshimaru's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Masaki Yoshimaru with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Masaki Yoshimaru more than expected).

Fields of papers citing papers by Masaki Yoshimaru

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Masaki Yoshimaru. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Masaki Yoshimaru. The network helps show where Masaki Yoshimaru may publish in the future.

Co-authorship network of co-authors of Masaki Yoshimaru

This figure shows the co-authorship network connecting the top 25 collaborators of Masaki Yoshimaru. A scholar is included among the top collaborators of Masaki Yoshimaru based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Masaki Yoshimaru. Masaki Yoshimaru is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

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20 of 20 papers shown

#	Work	Indexed citations
1	The Observation of “Conduction Spot” on NiO Resistance Random Access Memory 2011 ·Japanese Journal of Applied Physics ·Hirofumi Kondo, Masashi Arita, Takashi Fujii, (unknown), Masahiro Moniwa, Takeshi Yamaguchi, Ichiro Fujiwara, Masaki Yoshimaru, Yasuo Takahashi	16
2	I-V measurement of NiO nanoregion during observation by transmission electron microscopy 2011 ·Journal of Applied Physics ·Takashi Fujii, Masashi Arita, (unknown), Hirofumi Kondo, (unknown), Yasuo Takahashi, Masahiro Moniwa, Ichiro Fujiwara, Takeshi Yamaguchi, Masaki Aoki, (unknown), Toshio Kobayashi, Masaki Yoshimaru	19
3	Damage characterization of low-k layers through Cu damascene process using monoenergetic positron beams 2010 ·Akira Uedono, N. Inoue, Y. Hayashi, Kazuhiro Eguchi, T. Nakamura, Yujiro Hirose, Masaki Yoshimaru, Nagayasu Oshima, Toshiyuki Ohdaira, Ryoichi Suzuki	1
4	Structure-designable method to form super low-kSiOC film (k= 2.2) by neutral-beam-enhanced chemical vapour deposition 2009 ·Journal of Physics D Applied Physics ·(unknown), (unknown), (unknown), (unknown), S. Kadomura, Masaki Yoshimaru, N. Matsunaga, Tomohiro Kubota, Hiroto Ohtake, Seiji Samukawa	19
5	Floating Gate Memory with Biomineralized Nanodots Embedded in High-kGate Dielectric 2009 ·Applied Physics Express ·(unknown), Ichiro Yamashita, (unknown), Masahiro Moniwa, Masaki Yoshimaru, Yukiharu Uraoka	9
6	Impact of film structure on damage to low-kSiOCH film during plasma exposure 2009 ·Journal of Physics D Applied Physics ·(unknown), (unknown), (unknown), (unknown), S. Kadomura, Masaki Yoshimaru, Nobutomo Matsunaga, Seiji Samukawa	23
7	Floating Gate Memory Based on Ferritin Nanodots with High-k Gate Dielectrics 2009 ·Japanese Journal of Applied Physics ·(unknown), Yukiharu Uraoka, Takashi Fuyuki, Ichiro Yamashita, (unknown), Masahiro Moniwa, Masaki Yoshimaru	13
8	Reduction of Process-induced Damage and Improvement of Imprint Characteristics in SrBi₂Ta₂O₉ Capacitors by Postmetallization Annealing 2007 ·Japanese Journal of Applied Physics ·(unknown), (unknown), (unknown), Masaki Yoshimaru, Ichiro Koiwa	2
9	Highly reliable copper dual-damascene interconnects with self-formed MnSi/sub x/O/sub y/ barrier Layer 2006 ·IEEE Transactions on Electron Devices ·T. Usui, (unknown), (unknown), Nobutaka Shimizu, Takehiro Nishikawa, Masaki Yoshimaru, H. Shibata, Makoto Wada, Junichi Koike	60
10	Deoxidization of Water Desorbed from APCVD TEOS-O[sub 3] SiO[sub 2] Film with Thin Titanium Cap Film 2004 ·Journal of The Electrochemical Society ·Masaki Yoshimaru, (unknown), (unknown), Hiroshi Onoda	3
11	Effects of Substrate on the Growth Characteristics of Silicon Oxide Films Deposited by Atmospheric Pressure Chemical Vapor Deposition Using Si ( OC 2 H 5 ) 4 and O 3 1998 ·Journal of The Electrochemical Society ·Masaki Yoshimaru, (unknown)	16
12	Structure of fluorine-doped silicon oxide films deposited by plasma-enhanced chemical vapor deposition 1997 ·Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ·Masaki Yoshimaru, Satoshi Koizumi, Koya Shimokawa	35
13	Properties of Highly Oriented Ta2O5 on Metal Electrodes 1997 ·(unknown), (unknown), Shih-Chang Chen, Masaki Yoshimaru	1
14	Interaction between water and fluorine-doped silicon oxide films deposited by plasma-enhanced chemical vapor deposition 1997 ·Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ·Masaki Yoshimaru, Satoshi Koizumi, Koya Shimokawa	41
15	Water Desorption Control of Interlayer Dielectrics to Reduce MOSFET Hot Carrier Degradation (Special Issue on Quarter Micron Si Device and Process Technologies) 1994 ·IEICE Transactions on Electronics ·(unknown), (unknown), Masaki Yoshimaru	1
16	Water Desorption Control of Interlayer Dielectrics to Reduce MOSFET Hot Carrier Degradation 1994 ·IEICE Transactions on Electronics ·(unknown), (unknown), Masaki Yoshimaru	1
17	Low Dielectric Constant Interlayer Using Fluorine-Doped Silicon Oxide 1994 ·Japanese Journal of Applied Physics ·(unknown), (unknown), Masaki Yoshimaru	107
18	Low Dielectric Constant Interlayer Using Fluorine Doped Silicon Oxide 1993 ·(unknown), (unknown), Masaki Yoshimaru	1
19	Two step Deposited Rugged Surface (TDRS) Storagenode and Self Aligned Bitline-Contact-Penetrating Cellplate (SABPEC) for 64MbDRAM STC Cell 1991 ·(unknown), (unknown), Masaru Takahashi, (unknown), (unknown), Akira Endoh, (unknown), Masaki Yoshimaru, (unknown), (unknown)	7
20	Highly Stable Fluorinated Plasma CVD Silicon Nitride Film by SiH4 Addition for ULSI Passivation 1989 ·Koya Shimokawa, Masaki Yoshimaru, Hiroyuki Matsui	1

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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