Russell B. Goodman

677 total citations
31 papers, 532 citations indexed

About

Russell B. Goodman is a scholar working on Electrical and Electronic Engineering, Biomedical Engineering and Materials Chemistry. According to data from OpenAlex, Russell B. Goodman has authored 31 papers receiving a total of 532 indexed citations (citations by other indexed papers that have themselves been cited), including 29 papers in Electrical and Electronic Engineering, 14 papers in Biomedical Engineering and 6 papers in Materials Chemistry. Recurrent topics in Russell B. Goodman's work include Advancements in Photolithography Techniques (26 papers), Nanofabrication and Lithography Techniques (10 papers) and Semiconductor materials and devices (7 papers). Russell B. Goodman is often cited by papers focused on Advancements in Photolithography Techniques (26 papers), Nanofabrication and Lithography Techniques (10 papers) and Semiconductor materials and devices (7 papers). Russell B. Goodman collaborates with scholars based in United States. Russell B. Goodman's co-authors include Roderick R. Kunz, T. M. Bloomstein, M. Rothschild, Theodore H. Fedynyshyn, Mark W. Horn, D. E. Hardy, S. T. Palmacci, Roger F. Sinta, S. W. Pang and J. M. Roberts and has published in prestigious journals such as Applied Physics Letters, Review of Scientific Instruments and IEEE Photonics Technology Letters.

In The Last Decade

Russell B. Goodman

31 papers receiving 478 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Russell B. Goodman United States 13 386 237 126 94 66 31 532
Andrew Grenville United States 14 521 1.3× 207 0.9× 119 0.9× 241 2.6× 77 1.2× 58 650
H. Gokan Japan 13 368 1.0× 177 0.7× 132 1.0× 57 0.6× 56 0.8× 31 517
Yun Cui China 13 275 0.7× 215 0.9× 249 2.0× 83 0.9× 218 3.3× 45 623
Kazuo Kajiwara Japan 13 307 0.8× 96 0.4× 171 1.4× 76 0.8× 148 2.2× 45 470
Ming‐Chung Liu Taiwan 13 213 0.6× 53 0.2× 172 1.4× 105 1.1× 92 1.4× 26 413
S. Iraj Najafi Canada 11 414 1.1× 83 0.4× 123 1.0× 96 1.0× 58 0.9× 56 592
Paul B. Geraghty United States 13 274 0.7× 161 0.7× 106 0.8× 14 0.1× 114 1.7× 21 482
Н. И. Боргардт Russia 13 199 0.5× 78 0.3× 226 1.8× 17 0.2× 92 1.4× 76 426
Shinzo Morita Japan 9 274 0.7× 146 0.6× 89 0.7× 88 0.9× 19 0.3× 57 403
Xing Yan United States 9 276 0.7× 84 0.4× 153 1.2× 183 1.9× 36 0.5× 12 436

Countries citing papers authored by Russell B. Goodman

Since Specialization
Citations

This map shows the geographic impact of Russell B. Goodman's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Russell B. Goodman with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Russell B. Goodman more than expected).

Fields of papers citing papers by Russell B. Goodman

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Russell B. Goodman. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Russell B. Goodman. The network helps show where Russell B. Goodman may publish in the future.

Co-authorship network of co-authors of Russell B. Goodman

This figure shows the co-authorship network connecting the top 25 collaborators of Russell B. Goodman. A scholar is included among the top collaborators of Russell B. Goodman based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Russell B. Goodman. Russell B. Goodman is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Kingsborough, Richard P., et al.. (2010). Electron-beam directed materials assembly. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7637. 76370N–76370N. 1 indexed citations
2.
Kingsborough, Richard P., Russell B. Goodman, & Theodore H. Fedynyshyn. (2009). Lithographically directed surface modification. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 27(6). 3031–3037. 2 indexed citations
3.
Kingsborough, Richard P., et al.. (2009). Lithographically directed materials assembly. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7271. 72712D–72712D. 9 indexed citations
4.
Fedynyshyn, Theodore H., et al.. (2008). Contributions of resist polymers to innate material roughness. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 26(6). 2281–2289. 8 indexed citations
5.
Roberts, J. M., et al.. (2006). Contributions to innate material roughness in resist. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6153. 61533U–61533U. 14 indexed citations
6.
Fedynyshyn, Theodore H., et al.. (2002). Fluoroaromatic Resists for 157-nm Lithography.. Journal of Photopolymer Science and Technology. 15(4). 655–666. 2 indexed citations
7.
Dentinger, Paul M., et al.. (2002). Photospeed considerations for extreme ultraviolet lithography resists. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 20(6). 2962–2967. 17 indexed citations
8.
Fedynyshyn, Theodore H., et al.. (2001). High-resolution fluorocarbon-based resist for 157-nm lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 4345. 296–296. 13 indexed citations
9.
Fedynyshyn, Theodore H., et al.. (2000). Prospects for using existing resists for evaluating 157-nm imaging systems. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 3999. 335–335. 9 indexed citations
10.
Fedynyshyn, Theodore H., et al.. (2000). Polymer photochemistry at advanced optical wavelengths. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 18(6). 3332–3339. 30 indexed citations
11.
Kunz, Roderick R., et al.. (1999). Outlook for 157 nm resist design. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 17(6). 3267–3272. 34 indexed citations
12.
Kunz, Roderick R., et al.. (1999). Outlook for 157-nm resist design. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 3678. 13–13. 42 indexed citations
13.
Bloomstein, T. M., et al.. (1998). Critical issues in 157 nm lithography. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 16(6). 3154–3157. 51 indexed citations
14.
Govorkov, S. A., et al.. (1997). A new method for measuring thermal conductivity of thin films. Review of Scientific Instruments. 68(10). 3828–3834. 41 indexed citations
15.
Horn, Mark W., et al.. (1996). Plasma-deposited silylation resist for 193 nm lithography. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 14(6). 4207–4211. 2 indexed citations
16.
Rothschild, M., Russell B. Goodman, Mark A. Hartney, et al.. (1992). Photolithography at 193 nm. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 10(6). 2989–2996. 15 indexed citations
17.
Goodman, Russell B., et al.. (1991). Optical phase difference measurement and correction using AlGaAs integrated guided-wave components. IEEE Photonics Technology Letters. 3(10). 902–904. 2 indexed citations
18.
Kunz, Roderick R., Mark W. Horn, Russell B. Goodman, et al.. (1990). Polysilyne thin films as resists for deep ultraviolet lithography. Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena. 8(6). 1820–1825. 12 indexed citations
19.
Pang, S. W., M. W. Geis, W. D. Goodhue, et al.. (1988). Pattern transfer by dry etching through stencil masks. Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena. 6(1). 249–252. 15 indexed citations
20.
Pang, S. W., et al.. (1988). Dry etching induced damage on vertical sidewalls of GaAs channels. Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena. 6(6). 1916–1920. 41 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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