Russell B. Goodman
- Electrical and Electronic Engineering top 10%
- Biomedical Engineering
- Materials Chemistry
- Surfaces, Coatings and Films top 5%
- Computational Mechanics top 10%
- Co-authors
- Roderick R. KunzT. M. BloomsteinM. RothschildMark W. HornTheodore H. FedynyshynD. E. HardyS. T. PalmacciRoger F. Sinta
- Topics
- Advancements in Photolithography Techniques (26 papers)Nanofabrication and Lithography Techniques (10 papers)Semiconductor materials and devices (7 papers)
- Partner nations
- United States
In The Last Decade
Russell B. Goodman
31 papers receiving 478 citations
Peers
Comparison fields: 5 of 54
- Electrical and Electronic Engineering 386
- Biomedical Engineering 237
- Materials Chemistry 126
- Surfaces, Coatings and Films 94
- Computational Mechanics 66
Countries citing papers authored by Russell B. Goodman
This map shows the geographic impact of Russell B. Goodman's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Russell B. Goodman with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Russell B. Goodman more than expected).
Fields of papers citing papers by Russell B. Goodman
This network shows the impact of papers produced by Russell B. Goodman. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Russell B. Goodman. The network helps show where Russell B. Goodman may publish in the future.
Co-authorship network of co-authors of Russell B. Goodman
This figure shows the co-authorship network connecting the top 25 collaborators of Russell B. Goodman. A scholar is included among the top collaborators of Russell B. Goodman based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Russell B. Goodman. Russell B. Goodman is excluded from the visualization to improve readability, since they are connected to all nodes in the network.
All Works
| # | Work | Indexed citations |
|---|---|---|
| 1 | 1 | |
| 2 | 2 | |
| 3 | 8 | |
| 4 | 14 | |
| 5 | 2 | |
| 6 | 17 | |
| 7 | 12 | |
| 8 | 13 | |
| 9 | 30 | |
| 10 | 9 | |
| 11 | 34 | |
| 12 | 11 | |
| 13 | 41 | |
| 14 | 2 | |
| 15 | 15 | |
| 16 | 2 | |
| 17 | 12 | |
| 18 | 9 | |
| 19 | 15 | |
| 20 | 41 |
About Russell B. Goodman
Russell B. Goodman is a scholar working on Surfaces, Coatings and Films, Electrical and Electronic Engineering and Biomedical Engineering, having authored 31 papers that have together received 532 indexed citations. Recurring topics across this work include Advancements in Photolithography Techniques (26 papers), Nanofabrication and Lithography Techniques (10 papers) and Semiconductor materials and devices (7 papers). The work is most often cited by research in Surfaces, Coatings and Films (94 citations), Electrical and Electronic Engineering (386 citations) and Biomedical Engineering (237 citations). Russell B. Goodman has collaborated with scholars based in United States. Frequent co-authors include Roderick R. Kunz, T. M. Bloomstein, M. Rothschild, Mark W. Horn, Theodore H. Fedynyshyn, D. E. Hardy, S. T. Palmacci, Roger F. Sinta, S. W. Pang and J. M. Roberts. Their work appears in journals such as Applied Physics Letters, Review of Scientific Instruments and IEEE Photonics Technology Letters.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.