Stephen T. Meyers

945 total citations
22 papers, 793 citations indexed

About

Stephen T. Meyers is a scholar working on Electrical and Electronic Engineering, Surfaces, Coatings and Films and Materials Chemistry. According to data from OpenAlex, Stephen T. Meyers has authored 22 papers receiving a total of 793 indexed citations (citations by other indexed papers that have themselves been cited), including 21 papers in Electrical and Electronic Engineering, 12 papers in Surfaces, Coatings and Films and 7 papers in Materials Chemistry. Recurrent topics in Stephen T. Meyers's work include Advancements in Photolithography Techniques (13 papers), Electron and X-Ray Spectroscopy Techniques (11 papers) and Integrated Circuits and Semiconductor Failure Analysis (8 papers). Stephen T. Meyers is often cited by papers focused on Advancements in Photolithography Techniques (13 papers), Electron and X-Ray Spectroscopy Techniques (11 papers) and Integrated Circuits and Semiconductor Failure Analysis (8 papers). Stephen T. Meyers collaborates with scholars based in United States, Belgium and Germany. Stephen T. Meyers's co-authors include Douglas A. Keszler, Jeremy T. Anderson, John F. Wager, John O. Thompson, William D. Hinsberg, David Hong, Andrew Grenville, Zachary L. Mensinger, Kai Jiang and Darren W. Johnson and has published in prestigious journals such as Journal of the American Chemical Society, Angewandte Chemie International Edition and Applied Physics Letters.

In The Last Decade

Stephen T. Meyers

21 papers receiving 780 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Stephen T. Meyers United States 12 667 467 135 131 123 22 793
Jeremy T. Anderson United States 7 732 1.1× 593 1.3× 172 1.3× 67 0.5× 110 0.9× 10 840
W. E. Guise United States 8 491 0.7× 619 1.3× 232 1.7× 28 0.2× 55 0.4× 11 789
James J. Mudd United Kingdom 14 280 0.4× 464 1.0× 68 0.5× 45 0.3× 67 0.5× 20 676
Aloysius A. Gunawan United States 8 287 0.4× 256 0.5× 82 0.6× 30 0.2× 38 0.3× 12 399
M. Schaer Switzerland 13 759 1.1× 260 0.6× 397 2.9× 21 0.2× 73 0.6× 19 942
Hajime Haneda Japan 7 399 0.6× 606 1.3× 29 0.2× 32 0.2× 120 1.0× 42 717
Igor L. Bolotin United States 13 383 0.6× 292 0.6× 36 0.3× 38 0.3× 85 0.7× 39 594
T. R. Lee United States 9 360 0.5× 191 0.4× 43 0.3× 138 1.1× 122 1.0× 12 498
Artoem Khassanov Germany 9 379 0.6× 166 0.4× 123 0.9× 17 0.1× 88 0.7× 13 496
Hussein Sabbah Kuwait 11 255 0.4× 198 0.4× 91 0.7× 28 0.2× 21 0.2× 51 397

Countries citing papers authored by Stephen T. Meyers

Since Specialization
Citations

This map shows the geographic impact of Stephen T. Meyers's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Stephen T. Meyers with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Stephen T. Meyers more than expected).

Fields of papers citing papers by Stephen T. Meyers

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Stephen T. Meyers. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Stephen T. Meyers. The network helps show where Stephen T. Meyers may publish in the future.

Co-authorship network of co-authors of Stephen T. Meyers

This figure shows the co-authorship network connecting the top 25 collaborators of Stephen T. Meyers. A scholar is included among the top collaborators of Stephen T. Meyers based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Stephen T. Meyers. Stephen T. Meyers is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Castellanos, Sonia, Peter De Schepper, M. Bhattacharya, et al.. (2024). EUV metal oxide resists: impact of the environment composition on CD during post-exposure delay. 6–6. 1 indexed citations
2.
Schepper, Peter De, et al.. (2024). Advanced simulations using an improved metal oxide photoresist model. 45–45. 1 indexed citations
3.
Melvin, Lawrence S., et al.. (2020). Calibration of a MOx-specific EUV photoresist lithography model. 12–12. 6 indexed citations
4.
Stokes, H. W., Shu Hao Chang, Brian Cardineau, et al.. (2020). Defect improvement for an EUV process. 69–69. 1 indexed citations
5.
Anderson, Christopher N., Weilun Chao, C. Cork, et al.. (2019). Overview and status of the 0.5NA EUV microfield exposure tool at Berkeley Lab. eScholarship (California Digital Library). 4–4. 3 indexed citations
6.
Hinsberg, William D. & Stephen T. Meyers. (2017). A numeric model for the imaging mechanism of metal oxide EUV resists. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 10146. 1014604–1014604. 51 indexed citations
7.
Stowers, Jason K., Jeremy T. Anderson, Brian Cardineau, et al.. (2016). Metal oxide EUV photoresist performance for N7 relevant patterns and processes. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9779. 977904–977904. 34 indexed citations
8.
Simone, Danilo De, Ming Mao, Peter De Schepper, et al.. (2016). Demonstration of an N7 integrated fab process for metal oxide EUV photoresist. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9776. 97760B–97760B. 16 indexed citations
9.
Grenville, Andrew, Jeremy T. Anderson, Benjamin L. Clark, et al.. (2015). Integrated fab process for metal oxide EUV photoresist. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9425. 94250S–94250S. 67 indexed citations
10.
Ma, Andy, S. V. Babu, Paul Dumas, et al.. (2012). Alternative smoothing techniques to mitigate EUV substrate defectivity. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 8322. 83220B–83220B. 6 indexed citations
11.
Jiang, Kai, Stephen T. Meyers, Michael Anderson, David C. Johnson, & Douglas A. Keszler. (2012). Functional Ultrathin Films and Nanolaminates from Aqueous Solutions. Chemistry of Materials. 25(2). 210–214. 27 indexed citations
12.
Kim, Kyung Min, Jaeseok Heo, Jung Eun Lee, et al.. (2011). Competitive device performance of low-temperature and all-solution-processed metal-oxide thin-film transistors. Applied Physics Letters. 99(24). 64 indexed citations
13.
Heo, Jaeseok, Jung‐Han Kim, Kwon‐Shik Park, et al.. (2010). 17.4L: LateNews Paper : Contact Resistance and Process Integration Effects on HighPerformance Oxide TFTs with SolutionDeposited Semiconductor and Gate Dielectric Layers. SID Symposium Digest of Technical Papers. 41(1). 241–244. 5 indexed citations
14.
Yuan, Hao‐Chih, Benjamin G. Lee, Howard M. Branz, et al.. (2010). Nanoimprinting for diffractive light trapping in solar cells. Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena. 28(6). C6M98–C6M103. 15 indexed citations
15.
Weiss, Dirk N., Stephen T. Meyers, & Douglas A. Keszler. (2010). All-inorganic thermal nanoimprint process. Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena. 28(4). 823–828. 17 indexed citations
16.
Mensinger, Zachary L., et al.. (2008). Synthesis of Heterometallic Group 13 Nanoclusters and Inks for Oxide Thin‐Film Transistors. Angewandte Chemie International Edition. 47(49). 9484–9486. 64 indexed citations
17.
Mensinger, Zachary L., et al.. (2008). Synthesis of Heterometallic Group 13 Nanoclusters and Inks for Oxide Thin‐Film Transistors. Angewandte Chemie. 120(49). 9626–9628. 13 indexed citations
18.
Meyers, Stephen T., et al.. (2008). Aqueous Inorganic Inks for Low-Temperature Fabrication of ZnO TFTs. Journal of the American Chemical Society. 130(51). 17603–17609. 301 indexed citations
19.
Meyers, Stephen T., et al.. (2007). Solution-Processed Aluminum Oxide Phosphate Thin-Film Dielectrics. Chemistry of Materials. 19(16). 4023–4029. 98 indexed citations
20.
Anderson, Jeremy T., Douglas A. Keszler, Stephen T. Meyers, et al.. (2006). Solution-Processed Oxide Films, Devices, and Integrated Circuits. MRS Proceedings. 988. 1 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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