Benjamin L. Clark

528 total citations
20 papers, 453 citations indexed

About

Benjamin L. Clark is a scholar working on Electrical and Electronic Engineering, Materials Chemistry and Surfaces, Coatings and Films. According to data from OpenAlex, Benjamin L. Clark has authored 20 papers receiving a total of 453 indexed citations (citations by other indexed papers that have themselves been cited), including 14 papers in Electrical and Electronic Engineering, 9 papers in Materials Chemistry and 6 papers in Surfaces, Coatings and Films. Recurrent topics in Benjamin L. Clark's work include Advancements in Photolithography Techniques (9 papers), Integrated Circuits and Semiconductor Failure Analysis (6 papers) and Electron and X-Ray Spectroscopy Techniques (6 papers). Benjamin L. Clark is often cited by papers focused on Advancements in Photolithography Techniques (9 papers), Integrated Circuits and Semiconductor Failure Analysis (6 papers) and Electron and X-Ray Spectroscopy Techniques (6 papers). Benjamin L. Clark collaborates with scholars based in United States, Belgium and Japan. Benjamin L. Clark's co-authors include Douglas A. Keszler, John F. Wager, Jason K. Stowers, Andrew Grenville, Gregory S. Herman, Sangmoon Park, Danilo De Simone, Geert Vandenberghe, Stephen T. Meyers and Peter De Schepper and has published in prestigious journals such as Science, Applied Physics Letters and Journal of Applied Physics.

In The Last Decade

Benjamin L. Clark

18 papers receiving 430 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Benjamin L. Clark United States 11 337 255 119 68 46 20 453
Anuja De Silva United States 12 395 1.2× 108 0.4× 130 1.1× 213 3.1× 45 1.0× 47 501
Curran Kalha United Kingdom 8 86 0.3× 147 0.6× 32 0.3× 39 0.6× 33 0.7× 21 236
Christian Sprau Germany 12 366 1.1× 121 0.5× 21 0.2× 40 0.6× 11 0.2× 24 447
Jingyu Shang China 11 246 0.7× 348 1.4× 12 0.1× 62 0.9× 48 1.0× 26 419
Hidekazu Sugimori Japan 10 77 0.2× 338 1.3× 103 0.9× 60 0.9× 20 0.4× 24 428
Ravish K. Jain India 11 217 0.6× 213 0.8× 31 0.3× 72 1.1× 54 1.2× 27 371
F. Chaffar Akkari Tunisia 13 242 0.7× 319 1.3× 66 0.6× 50 0.7× 65 1.4× 29 411
Luke M. Davis United States 13 288 0.9× 188 0.7× 22 0.2× 69 1.0× 37 0.8× 31 414
Takehiro Seshimo Japan 6 141 0.4× 406 1.6× 103 0.9× 88 1.3× 52 1.1× 21 484

Countries citing papers authored by Benjamin L. Clark

Since Specialization
Citations

This map shows the geographic impact of Benjamin L. Clark's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Benjamin L. Clark with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Benjamin L. Clark more than expected).

Fields of papers citing papers by Benjamin L. Clark

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Benjamin L. Clark. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Benjamin L. Clark. The network helps show where Benjamin L. Clark may publish in the future.

Co-authorship network of co-authors of Benjamin L. Clark

This figure shows the co-authorship network connecting the top 25 collaborators of Benjamin L. Clark. A scholar is included among the top collaborators of Benjamin L. Clark based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Benjamin L. Clark. Benjamin L. Clark is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Clark, Benjamin L., Phong Nguyen, Alexander Lushnikov, et al.. (2025). Design and Characterization of DNA-Driven Condensates: Regulating Topology, Mechanical Properties, and Immunorecognition. ACS Applied Materials & Interfaces. 17(15). 22322–22336.
2.
Meyers, Stephen T., Benjamin L. Clark, Peter De Schepper, et al.. (2021). Advances in defect performance in metal oxide photoresists for EUV lithography. 19–19. 2 indexed citations
3.
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5.
Stowers, Jason K., Jeremy T. Anderson, Brian Cardineau, et al.. (2016). Metal oxide EUV photoresist performance for N7 relevant patterns and processes. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9779. 977904–977904. 34 indexed citations
6.
Simone, Danilo De, Ming Mao, Peter De Schepper, et al.. (2016). Demonstration of an N7 integrated fab process for metal oxide EUV photoresist. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9776. 97760B–97760B. 16 indexed citations
7.
Grenville, Andrew, Jeremy T. Anderson, Benjamin L. Clark, et al.. (2015). Integrated fab process for metal oxide EUV photoresist. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9425. 94250S–94250S. 67 indexed citations
8.
Clark, Benjamin L., Andrew Grenville, Takashi Saitō, et al.. (2015). Coater/developer process integration of metal-oxide based photoresist. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9425. 94251A–94251A. 5 indexed citations
9.
Kim, Daeho, Benjamin L. Clark, Líney Árnadóttir, et al.. (2013). In‐situ characterization of aqueous‐based hafnium oxide hydroxide sulfate thin films. Surface and Interface Analysis. 46(4). 210–215. 10 indexed citations
10.
Clark, Benjamin L., et al.. (2012). Coat-develop track process for inorganic EUV resist. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 8322. 83222C–83222C. 4 indexed citations
11.
Stowers, Jason K., Benjamin L. Clark, Douglas A. Keszler, et al.. (2011). Directly patterned inorganic hardmask for EUV lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7969. 796915–796915. 53 indexed citations
12.
Wager, John F., et al.. (2002). Zn2GeO4:Mn alternating-current thin-film electroluminescent devices. Journal of Luminescence. 99(4). 311–324. 53 indexed citations
13.
Park, Sangmoon, et al.. (2002). Low-Temperature Thin-Film Deposition and Crystallization. Science. 297(5578). 65–65. 92 indexed citations
14.
Clark, Benjamin L. & Douglas A. Keszler. (2001). Hydrothermal Dehydration of Precipitates:  Convenient Synthesis Method for Solids. Inorganic Chemistry. 40(8). 1724–1725. 9 indexed citations
15.
Sardar, Dhiraj K., et al.. (2001). Spectroscopic and laser properties of Nd3+ in LaSc3(BO3)4 host. Journal of Applied Physics. 90(10). 4997–5001. 21 indexed citations
16.
Dimitrova, V., A. D. Draeseke, Janet Tate, et al.. (1999). Red electroluminescence from ZnGaS:Mn thin films. Applied Physics Letters. 75(16). 2353–2355. 4 indexed citations
17.
Wager, John F., et al.. (1999). Alkali metal coactivators in SrS: Cu,F thin-film electroluminescent devices. Applied Physics Letters. 75(10). 1398–1400. 25 indexed citations
18.
Wager, John F., et al.. (1999). Lanthanide doping in ZnS and SrS thin-film electroluminescent devices. Journal of Applied Physics. 86(12). 6810–6815. 22 indexed citations
19.
Li, Dong, et al.. (1999). Color Control in Sulfide Phosphors:  Turning up the Light for Electroluminescent Displays. Chemistry of Materials. 12(2). 268–270. 33 indexed citations
20.
Clark, Benjamin L., et al.. (1964). Brief for Petitioner. EngagedScholarship @ Cleveland State University (Cleveland State University). 2 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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Rankless by CCL
2026