Uwe Dietze

530 total citations
27 papers, 409 citations indexed

About

Uwe Dietze is a scholar working on Electrical and Electronic Engineering, Surfaces, Coatings and Films and Biomedical Engineering. According to data from OpenAlex, Uwe Dietze has authored 27 papers receiving a total of 409 indexed citations (citations by other indexed papers that have themselves been cited), including 19 papers in Electrical and Electronic Engineering, 9 papers in Surfaces, Coatings and Films and 4 papers in Biomedical Engineering. Recurrent topics in Uwe Dietze's work include Advancements in Photolithography Techniques (18 papers), Electron and X-Ray Spectroscopy Techniques (8 papers) and Integrated Circuits and Semiconductor Failure Analysis (7 papers). Uwe Dietze is often cited by papers focused on Advancements in Photolithography Techniques (18 papers), Electron and X-Ray Spectroscopy Techniques (8 papers) and Integrated Circuits and Semiconductor Failure Analysis (7 papers). Uwe Dietze collaborates with scholars based in United States, Germany and Japan. Uwe Dietze's co-authors include Gerrit Schüürmann, K.‐D. Wenzel, Michael Manz, Ludovic Kurunczi, Takahiro Suzuki, Simona Funar‐Timofei, Fei Xu, R. Jonckheere, Min Liu and Ted Liang and has published in prestigious journals such as The Science of The Total Environment, Chemosphere and Journal of Aquatic Ecosystem Stress and Recovery.

In The Last Decade

Uwe Dietze

25 papers receiving 374 citations

Peers

Uwe Dietze

HTM

POLLU

EEE

SCF

Lucica Barbeș Romania

Carlos Ojeda Argentina

Ada Cristina Ranieri Italy

Chuang Ma China

Nur Nadhirah Zakaria Malaysia

Balakrishnan Muthukumar India

I.G. Prince Australia

Qilei Zhang China

Joana Figueiredo Portugal

Lucica Barbeș Romania

Uwe Dietze

52 ×0.3

HTM

46 ×0.3

POLLU

28 ×0.3

EEE

12 ×0.2

48 ×0.9

SCF

Citations per year, relative to Uwe Dietze Uwe Dietze (= 1×) peers Lucica Barbeș

Countries citing papers authored by Uwe Dietze

Since Specialization

Citations

This map shows the geographic impact of Uwe Dietze's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Uwe Dietze with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Uwe Dietze more than expected).

Fields of papers citing papers by Uwe Dietze

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Uwe Dietze. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Uwe Dietze. The network helps show where Uwe Dietze may publish in the future.

Co-authorship network of co-authors of Uwe Dietze

This figure shows the co-authorship network connecting the top 25 collaborators of Uwe Dietze. A scholar is included among the top collaborators of Uwe Dietze based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Uwe Dietze. Uwe Dietze is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

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20 of 20 papers shown

Dietze, Uwe, et al.. (2018). Advancements in pellicle glue residue removal. 28–28. 1 indexed citations

Dietze, Uwe, et al.. (2014). Efficient ozone, sulfate, and ammonium free resist stripping process. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9256. 925604–925604. 3 indexed citations

Dietze, Uwe, et al.. (2013). Investigation of EUVL reticle capping layer peeling under wet cleaning. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 8880. 888010–888010. 7 indexed citations

Dietze, Uwe, et al.. (2013). Effect of cleaning chemistry on MegaSonic damage. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 8701. 870104–870104. 1 indexed citations

Ma, Andy, S. V. Babu, Paul Dumas, et al.. (2012). Alternative smoothing techniques to mitigate EUV substrate defectivity. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 8322. 83220B–83220B. 6 indexed citations

Jonckheere, R., et al.. (2012). Integrated cleaning and handling automation of NXE3100 reticles. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 8352. 83520U–83520U. 2 indexed citations

Dietze, Uwe, et al.. (2011). Effective EUVL mask cleaning technology solutions for mask manufacturing and in-fab mask maintenance. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7985. 79850N–79850N. 8 indexed citations

Dietze, Uwe, et al.. (2011). Megasonic cleaning: possible solutions for 22nm node and beyond. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 8166. 816614–816614. 2 indexed citations

Jonckheere, R., et al.. (2010). Techniques for removal of contamination from EUVL mask without surface damage. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7636. 76360Y–76360Y. 12 indexed citations

10.

Dietze, Uwe, et al.. (2010). Advanced cleaning of nano-imprint lithography template in patterned media applications. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7823. 78232T–78232T. 1 indexed citations

11.

Yu, Chia-Mu, et al.. (2010). Fundamental study of droplet spray characteristics in photomask cleaning for advanced lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7823. 782325–782325. 1 indexed citations

12.

Dietze, Uwe, et al.. (2010). Preserving the mask integrity for the lithography process. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7748. 77480E–77480E. 3 indexed citations

13.

Dietze, Uwe, et al.. (2009). Reduction of local CD-linewidth variations in resist develop through acoustic streaming. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7488. 74880K–74880K. 2 indexed citations

14.

Resnick, Douglas J., et al.. (2009). Automated imprint mask cleaning for step-and-flash imprint lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7271. 72712H–72712H. 7 indexed citations

15.

Dietze, Uwe, et al.. (2009). Study on surface integrity in photomask resist strip and final cleaning processes. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7379. 73790D–73790D. 12 indexed citations

16.

Weber, Christoph, et al.. (2008). Geschäftsmodelle für eine effiziente Nutzung von µKWK-Anlagen. uwf UmweltWirtschaftsForum. 16(3). 143–147. 1 indexed citations

17.

Dietze, Uwe, et al.. (2004). Improving photomask surface properties through a combination of dry and wet cleaning steps. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5446. 209–209. 15 indexed citations

18.

Manz, Michael, K.‐D. Wenzel, Uwe Dietze, & Gerrit Schüürmann. (2001). Persistent organic pollutants in agricultural soils of central Germany. The Science of The Total Environment. 277(1-3). 187–198. 207 indexed citations

19.

Suzuki, Takahiro, Simona Funar‐Timofei, Ludovic Kurunczi, Uwe Dietze, & Gerrit Schüürmann. (2001). Correlation of aerobic biodegradability of sulfonated azo dyes with the chemical structure. Chemosphere. 45(1). 1–9. 84 indexed citations

20.

Dietze, Uwe, Thomas Braunbeck, Wolfgang Honnen, et al.. (2001). . Journal of Aquatic Ecosystem Stress and Recovery. 8(3/4). 319–336. 18 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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