S. Kudelka

527 total citations
27 papers, 353 citations indexed

About

S. Kudelka is a scholar working on Electrical and Electronic Engineering, Electronic, Optical and Magnetic Materials and Atomic and Molecular Physics, and Optics. According to data from OpenAlex, S. Kudelka has authored 27 papers receiving a total of 353 indexed citations (citations by other indexed papers that have themselves been cited), including 18 papers in Electrical and Electronic Engineering, 8 papers in Electronic, Optical and Magnetic Materials and 7 papers in Atomic and Molecular Physics, and Optics. Recurrent topics in S. Kudelka's work include Semiconductor materials and devices (18 papers), Ferroelectric and Negative Capacitance Devices (12 papers) and Copper Interconnects and Reliability (6 papers). S. Kudelka is often cited by papers focused on Semiconductor materials and devices (18 papers), Ferroelectric and Negative Capacitance Devices (12 papers) and Copper Interconnects and Reliability (6 papers). S. Kudelka collaborates with scholars based in Germany, Belgium and United States. S. Kudelka's co-authors include J.W. Schultze, A. Michaelis, S. Jakschik, Uwe Schroeder, M. Kerber, R. Duschl, Antony Orth, Wolfgang H. Krautschneider, Wolfgang Mueller and Amit Sanger and has published in prestigious journals such as Electrochimica Acta, IEEE Electron Device Letters and Advanced Engineering Materials.

In The Last Decade

S. Kudelka

27 papers receiving 338 citations

Peers

Countries citing papers authored by S. Kudelka

Since Specialization

Citations

This map shows the geographic impact of S. Kudelka's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by S. Kudelka with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites S. Kudelka more than expected).

Fields of papers citing papers by S. Kudelka

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by S. Kudelka. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by S. Kudelka. The network helps show where S. Kudelka may publish in the future.

Co-authorship network of co-authors of S. Kudelka

This figure shows the co-authorship network connecting the top 25 collaborators of S. Kudelka. A scholar is included among the top collaborators of S. Kudelka based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with S. Kudelka. S. Kudelka is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

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20 of 20 papers shown

#	Work	Indexed citations
1	Post Hard Breakdown Conduction in MOS Capacitors With Silicon and Aluminum Oxide as Dielectric 2008 ·IEEE Electron Device Letters ·(unknown), S. Jakschik, (unknown), S. Kudelka, Wolfgang H. Krautschneider	2
2	Tuning the dielectric properties of hafnium silicate films 2007 ·Microelectronic Engineering ·(unknown), L. Frey, S. Kudelka, (unknown), (unknown), Elke Erben, Theodor Doll	10
3	Influence of Stress-Induced Leakage Current on Reliability of $\hbox{HfSiO}_{x}$ 2007 ·IEEE Transactions on Device and Materials Reliability ·S. Jakschik, T. Kauerauf, R. Degraeve, Y.N. Hwang, R. Duschl, M. Kerber, (unknown), S. Kudelka	6
4	Reliability aspects of Hf-based capacitors: Breakdown and trapping effects 2007 ·Microelectronics Reliability ·R. Duschl, M. Kerber, (unknown), S. Jakschik, Uwe Schroeder, S. Kudelka	10
5	Carbon / high-k Trench Capacitor for the 40nm DRAM Generation 2007 ·G. Aichmayr, (unknown), Georg S. Duesberg, Franz Kreupl, S. Kudelka, M. Liebau, Antony Orth, Amit Sanger, J. Schümann, (unknown)	17
6	HfAlOx and HfSiOx based dielectrics for future dram application 2006 ·Johannes Heitmann, (unknown), (unknown), Elke Erben, (unknown), S. Jakschik, S. Kudelka, Uwe Schroeder	1
7	Investigation of the high temperature stability of TiN-Al2O3-TiN capacitors for sub 50nm deep trench DRAM 2006 ·T. S. Böscke, S. Kudelka, Amit Sanger, Johannes Müller, Wolfgang H. Krautschneider	7
8	Influence of Process Parameters on Leakage Current of Metal-Organic based HfSiOx Dielectrics 2006 ·ECS Transactions ·(unknown), Matthias Patz, Elke Erben, А. Н. Иванов, S. Kudelka	1
9	Influence of Stress-Induced-Leakage-Current on Reliability of HfSiOx with EOT>1.5nm and TiN Gate 2006 ·S. Jakschik, (unknown), (unknown), Young‐Ha Hwang, R. Duschl, M. Kerber, (unknown), S. Kudelka	1
10	Tetragonal Phase Stabilization by Doping as an Enabler of Thermally Stable HfO2 based MIM and MIS Capacitors for sub 50nm Deep Trench DRAM 2006 ·T. S. Böscke, S. Govindarajan, (unknown), J. Heitmann, (unknown), U. Schröder, S. Kudelka, P. D. Kirsch, C. Krug, (unknown), (unknown), Bin Ju, J. Price, G. Pant, Bruce E. Gnade, Wolfgang H. Krautschneider, (unknown), R. Jammy	18
11	Trench DRAM Technologies for the 50nm Node and Beyond 2006 ·Wolfgang Mueller, G. Aichmayr, W. Bergner, (unknown), T. Hecht, S. Kudelka, F. Lau, (unknown), Antony Orth, (unknown), Alexander Scholz, A. Sieck, A. Spitzer, M. Strasser, (unknown), (unknown), (unknown)	4
12	Influence of gate material and stress voltage on post breakdown leakage current of high K dielectrics 2005 ·R. Duschl, M. Kerber, Uwe Schroeder, T. Hecht, S. Jakschik, (unknown), S. Kudelka	1
13	Influence of charge trapping on AC reliability of high-k dielectrics 2004 ·M. Kerber, R. Duschl, H. Reisinger, S. Jakschik, U. Schröder, T. Hecht, S. Kudelka	6
14	A fully integrated Al/sub 2/O/sub 3/ trench capacitor DRAM for sub-100 nm technology 2003 ·(unknown), M. Gutsche, Uwe Schroeder, A. Birner, T. Hecht, S. Jakschik, (unknown), M. Kerber, S. Kudelka, Thomas Popp, Antony Orth, H. Reisinger, (unknown), (unknown), B. Sell	10
15	Corrosion of Ti and Ti0.2PD Under High-Level Waste Disposal Conditions With Microscopic Investigation of Passivity 2000 ·Corrosion Reviews ·A. Michaelis, S. Kudelka, J.W. Schultze	5
16	Effect of γ-radiation on the passive layers of Ti and Ti0.2Pd container-materials for high-level waste disposal 1998 ·Electrochimica Acta ·A. Michaelis, S. Kudelka, J.W. Schultze	18
17	Investigations of Passivity (Microtechniques open doorways to new understandings of electrochemical systems.) 1997 ·The Electrochemical Society Interface ·J.W. Schultze, S. Kudelka	7
18	Photoelectrochemical imaging and microscopic reactivity of oxidised Ti 1997 ·Electrochimica Acta ·S. Kudelka, J.W. Schultze	49
19	Effect of texture and formation rate on ionic and electronic properties of passive layers on Ti single crystals 1996 ·Electrochimica Acta ·S. Kudelka, A. Michaelis, J.W. Schultze	71
20	Electrochemical Characterisation of Oxide Layers on Single Grains of a Polycrystalline Ti‐Sample 1995 ·Berichte der Bunsengesellschaft für physikalische Chemie ·S. Kudelka, A. Michaelis, J.W. Schultze	45

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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