Uwe Schroeder

22.2k citations

252 papers · 17.4k indexed · 9 hit papers · h-index 71

Impact in

Electrical and Electronic Engineering top 0.05%
- Ferroelectric and Negative Capacitance Devices
- Semiconductor materials and devices
- Advanced Memory and Neural Computing
- Advancements in Semiconductor Devices and Circuit Design
Materials Chemistry top 0.1%
- MXene and MAX Phase Materials
- Ferroelectric and Piezoelectric Materials
- Electronic and Structural Properties of Oxides

Papers in

Electrical and Electronic Engineering 245
- Ferroelectric and Negative Capacitance Devices 208
- Semiconductor materials and devices 165
- Advanced Memory and Neural Computing 70
- Advancements in Photolithography Techniques 18
- Advancements in Semiconductor Devices and Circuit Design 13
Materials Chemistry 161
- MXene and MAX Phase Materials 82
- Ferroelectric and Piezoelectric Materials 72
- Electronic and Structural Properties of Oxides 19

Co-authors: Thomas Mikolajick Tony Schenk Min Hyuk Park Stefan Slesazeck Michael Hoffmann Milan Pešić Cheol Seong Hwang Everett D. Grimley
Journals: Applied Physics Letters (21 papers)Journal of Applied Physics (13 papers)ACS Applied Materials & Interfaces (13 papers)Advanced Electronic Materials (11 papers)Advanced Functional Materials (10 papers)
Partner nations: Germany United States South Korea

In The Last Decade

Uwe Schroeder

245 papers receiving 17.1k citations

Hit Papers

9 papers align trajectories log scale

The fundamentals and applications of ferroelectric HfO2 2022 · 399 citations

What are hit papers?

Hit papers significantly outperform the citation benchmark for their cohort. A paper qualifies if any of the following hold:

it has ≥500 total citations;
it reaches ≥1.5× the top-1% citation threshold for papers in the same subfield and year (the threshold is the minimum needed to enter the top 1%, not the average within it);
it reaches the top citation threshold in at least one of its specific research topics.

2022 Nature Reviews Materials
2021 Journal of Applied Physics
2020 IEEE Transactions on Electron Devices
2018 MRS Communications
2016 Advanced Functional Materials
2015 Applied Physics Letters
2015 Advanced Materials
2015 Journal of Applied Physics
2012 Advanced Functional Materials

Peers

Countries citing papers authored by Uwe Schroeder

Since Specialization

Citations

This map shows the geographic impact of Uwe Schroeder's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Uwe Schroeder with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Uwe Schroeder more than expected).

Fields of papers citing papers by Uwe Schroeder

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Uwe Schroeder. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Uwe Schroeder. The network helps show where Uwe Schroeder may publish in the future.

Co-authorship network

The 25 scholars most cited alongside Uwe Schroeder, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with Uwe Schroeder Line = papers co-authored together Uwe Schroeder links everyone, so they are left out of the graph.

All Works

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20 of 20 papers shown

#	Work
1	Influence of Biaxial Strain and Interfacial Layer Growth on Ferroelectric Wake-Up and Phase Transition Fields in ZrO₂ ACS Applied Materials & Interfaces ·Mariane Eliasquevici, Namyoung Oh, 宏永並, Xuetao Wang, Maryse Brulotte, Thomas Mikolajick, Uwe Schroeder, Alfred Kersch, Patrick D. Lomenzo	2024	7
2	Impact of Hafnium Doping on Phase Transition, Interface, and Reliability Properties of Zr_xHf_1–xO₂-Based Capacitors ACS Applied Electronic Materials ·Maryse Brulotte, Mariane Eliasquevici, F.C.P. Law, Claudia Richter, Oliver Rehm, Lutz Baumgarten, Martina Müller, Thomas Mikolajick, Alfred Kersch, Uwe Schroeder	2024	1
3	Smart Design of Fermi Level Pinning in HfO₂‐Based Ferroelectric Memories Advanced Functional Materials ·Lutz Baumgarten, Thomas Szyjka, Terence Mittmann, A. Gloskovskii, Christoph Schlueter, Thomas Mikolajick, Uwe Schroeder, Martina Müller	2023	14
4	Wake-up free ferroelectric hafnia-zirconia capacitors fabricated via vacuum-maintaining atomic layer deposition Journal of Applied Physics ·H. Alex Hsain, Young H. Lee, Patrick D. Lomenzo, Ruben Alcala, Mariane Eliasquevici, Thomas Mikolajick, Uwe Schroeder, Gregory N. Parsons, Jacob L. Jones	2023	5
5	Discovery of Nanoscale Electric Field‐Induced Phase Transitions in ZrO₂ Advanced Functional Materials ·Patrick D. Lomenzo, Liam Collins, Namyoung Oh, Mariane Eliasquevici, Qiang Zhang, Alexei Gruverman, Alfred Kersch, Thomas Mikolajick, Uwe Schroeder	2023	27
6	Role of Defects in the Breakdown Phenomenon of Al_1–xSc_xN: From Ferroelectric to Filamentary Resistive Switching Nano Letters ·Qiang Zhang, Thomas Mikolajick, Uwe Schroeder, Patrick D. Lomenzo	2023	25
7	Influence of Si-Doping on 45 nm Thick Ferroelectric ZrO₂ Films ACS Applied Electronic Materials ·Mariane Eliasquevici, Patrick D. Lomenzo, Alfred Kersch, Thomas Mikolajick, Uwe Schroeder	2022	22
8	Temperature‐Dependent Phase Transitions in Hf_xZr_1‐xO₂ Mixed Oxides: Indications of a Proper Ferroelectric Material Advanced Electronic Materials ·Uwe Schroeder, Terence Mittmann, Monica Materano, Patrick D. Lomenzo, Hongtao Yan, Young H. Lee, Tiehui Li, Anthony R. West, Thomas Mikolajick, Alfred Kersch, Jacob L. Jones	2022	35
9	Harnessing Phase Transitions in Antiferroelectric ZrO₂ Using the Size Effect Advanced Electronic Materials ·Patrick D. Lomenzo, Monica Materano, Terence Mittmann, Pratyush Buragohain, Alexei Gruverman, Takanori Kiguchi, Thomas Mikolajick, Uwe Schroeder	2021	35
10	An unexplored antipolar phase in HfO2 from first principles and implication for wake-up mechanism Applied Physics Letters ·Э В Черкасов, Namyoung Oh, Ruben Alcala, Thomas Mikolajick, Uwe Schroeder, Alfred Kersch	2021	19
11	Interface chemistry of pristine TiN/La:Hf0.5Zr0.5O2 capacitors Applied Physics Letters ·برادران برادران, C. Lubin, Shigenori Ueda, Yoshiyuki Yamashita, O. Renault, 壮兵沢田, Thomas Mikolajick, Uwe Schroeder, Raluca Negrea, N. Barrett	2020	36
12	Wake‐Up Mechanisms in Ferroelectric Lanthanum‐Doped Hf_0.5Zr_0.5O₂ Thin Films physica status solidi (a) ·壮兵沢田, Thomas Mikolajick, Uwe Schroeder	2020	26
13	Influence of Oxygen Content on the Structure and Reliability of Ferroelectric Hf_xZr_1–xO₂ Layers ACS Applied Electronic Materials ·Monica Materano, Terence Mittmann, Patrick D. Lomenzo, Chuanzhen Zhou, Jacob L. Jones, Max Falkowski, Alfred Kersch, Thomas Mikolajick, Uwe Schroeder	2020	99
14	Lanthanum doping induced structural changes and their implications on ferroelectric properties of Hf1−xZrxO2 thin film Applied Physics Letters ·壮兵沢田, Thomas Mikolajick, Uwe Schroeder	2020	19
15	Recent progress for obtaining the ferroelectric phase in hafnium oxide based films: impact of oxygen and zirconium Japanese Journal of Applied Physics ·Uwe Schroeder, Monica Materano, Terence Mittmann, Patrick D. Lomenzo, Thomas Mikolajick, Akira Toriumi	2019	68
16	Origin of Ferroelectric Phase in Undoped HfO₂ Films Deposited by Sputtering Advanced Materials Interfaces ·Terence Mittmann, Monica Materano, Patrick D. Lomenzo, Min Hyuk Park, Igor Stolichnov, Matteo Cavalieri, Chuanzhen Zhou, Ching‐Chang Chung, Jacob L. Jones, Thomas Szyjka, Martina Müller, Alfred Kersch, Thomas Mikolajick, Uwe Schroeder	2019	151
17	Bulk Depolarization Fields as a Major Contributor to the Ferroelectric Reliability Performance in Lanthanum Doped Hf_0.5Zr_0.5O₂ Capacitors Advanced Materials Interfaces ·壮兵沢田, Michael Hoffmann, Patrick D. Lomenzo, Claudia Richter, Monica Materano, Thomas Mikolajick, Uwe Schroeder	2019	79
18	Ferroelectric hafnium oxide for ferroelectric random-access memories and ferroelectric field-effect transistors MRS Bulletin ·Thomas Mikolajick, Stefan Slesazeck, Min Hyuk Park, Uwe Schroeder	2018	258
19	Genuinely Ferroelectric Sub-1-Volt-Switchable Nanodomains in Hf_xZr_(1–x)O₂ Ultrathin Capacitors ACS Applied Materials & Interfaces ·Igor Stolichnov, Matteo Cavalieri, Enrico Colla, Tony Schenk, Terence Mittmann, Thomas Mikolajick, Uwe Schroeder, Adrian M. Ionescu	2018	46
20	Downscaling ferroelectric field effect transistors by using ferroelectric Si-doped HfO₂ Fraunhofer-Publica (Fraunhofer-Gesellschaft) ·Dominik Martin, Ekaterina Yurchuk, Stefan Müller, Johannes Müller, Jan Paul, Hough, Stefan Slesazeck, V. Vinciguerra, Ralf van Bentum, Martin Trentzsch, Uwe Schroeder, Kholisotul Mujayanah	2012	3

About Uwe Schroeder

Uwe Schroeder is a scholar working on Electrical and Electronic Engineering, Materials Chemistry, Hardware and Architecture, Industrial and Manufacturing Engineering and Electronic, Optical and Magnetic Materials, having authored 252 papers that have together received 17.4k indexed citations. Recurring topics across this work include Ferroelectric and Negative Capacitance Devices (208 papers), Semiconductor materials and devices (165 papers), MXene and MAX Phase Materials (82 papers), Ferroelectric and Piezoelectric Materials (72 papers), Advanced Memory and Neural Computing (70 papers), Electronic and Structural Properties of Oxides (19 papers), Advancements in Photolithography Techniques (18 papers) and Advancements in Semiconductor Devices and Circuit Design (13 papers). The work is most often cited by research in Electrical and Electronic Engineering (16.4k citations), Materials Chemistry (13.1k citations), Electronic, Optical and Magnetic Materials (725 citations), Biomedical Engineering (1.0k citations) and Mechanics of Materials (302 citations). Uwe Schroeder has collaborated with scholars based in Germany, United States and South Korea. Frequent co-authors include Thomas Mikolajick, Tony Schenk, Min Hyuk Park, Stefan Slesazeck, Michael Hoffmann, Milan Pešić, Cheol Seong Hwang, Everett D. Grimley, James M. LeBeau and Johannes Müller. Their work appears in journals such as Applied Physics Letters, Journal of Applied Physics, ACS Applied Materials & Interfaces, Advanced Electronic Materials and Advanced Functional Materials.

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