P. Kücher

1.8k citations

17 papers · 1.5k indexed · 2 hit papers · h-index 9

Impact in

Electrical and Electronic Engineering top 5%
- Ferroelectric and Negative Capacitance Devices
- Semiconductor materials and devices
- Advanced Memory and Neural Computing
- Advancements in Semiconductor Devices and Circuit Design
Materials Chemistry top 5%
- MXene and MAX Phase Materials
- Ferroelectric and Piezoelectric Materials
- Electronic and Structural Properties of Oxides

Papers in

Metals and Alloys 1
Electronic, Optical and Magnetic Materials 6
- Copper Interconnects and Reliability 6

Co-authors: U. Schröder Johannes Müller Jonas Sundqvist Thomas Mikolajick T. S. Böscke L. Frey U. Böttger M. Lemberger
Journals: Microelectronic Engineering (3 papers)Journal of Applied Physics (3 papers)Applied Surface Science (1 paper)Ultramicroscopy (1 paper)Applied Physics Letters (1 paper)
Partner nations: Germany United States South Korea

In The Last Decade

P. Kücher

15 papers receiving 1.5k citations

Hit Papers

align trajectories log scale

Ferroelectricity in yttrium-doped hafnium oxide 2011 · 580 citations

What are hit papers?

Hit papers significantly outperform the citation benchmark for their cohort. A paper qualifies if any of the following hold:

it has ≥500 total citations;
it reaches ≥1.5× the top-1% citation threshold for papers in the same subfield and year (the threshold is the minimum needed to enter the top 1%, not the average within it);
it reaches the top citation threshold in at least one of its specific research topics.

2011 Journal of Applied Physics
2011 Applied Physics Letters

Peers

Countries citing papers authored by P. Kücher

Since Specialization

Citations

This map shows the geographic impact of P. Kücher's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by P. Kücher with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites P. Kücher more than expected).

Fields of papers citing papers by P. Kücher

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by P. Kücher. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by P. Kücher. The network helps show where P. Kücher may publish in the future.

Co-authorship network

The 25 scholars most cited alongside P. Kücher, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with P. Kücher Line = papers co-authored together P. Kücher links everyone, so they are left out of the graph.

All Works

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17 of 17 papers shown

#	Work
1	Ferroelectricity in HfO₂ enables nonvolatile data storage in 28 nm HKMG Fraunhofer-Publica (Fraunhofer-Gesellschaft) ·Johannes Müller, Ekaterina Yurchuk, T. Schlösser, Paul Jarman, Raik Hoffmann, Stefan Müller, Dominik Martin, Stefan Slesazeck, P. Polakowski, Jonas Sundqvist, M. Czernohorsky, Konrad Seidel, P. Kücher, Roman Boschke, Martin Trentzsch, Elisa Obradovic, U. Schröder, Thomas Mikolajick	2012	239
2	Effect of different PDAs and a PMA on the electrical performance of TiN/ZAZ/TiN MIM capacitors Fraunhofer-Publica (Fraunhofer-Gesellschaft) ·Wenke Weinreich, Konrad Seidel, Jonas Sundqvist, M. Czernohorsky, P. Kücher	2012	2
3	Ferroelectricity in yttrium-doped hafnium oxide Journal of Applied Physics ·Johannes Müller, U. Schröder, T. S. Böscke, Indra Müller, U. Böttger, L. Wilde, Jonas Sundqvist, M. Lemberger, P. Kücher, Thomas Mikolajick, L. Frey Hit paper breakdown →	2011	580
4	Pad roughness effects on the planarization and material removal rate in CMP processes Publikationsdatenbank der Fraunhofer-Gesellschaft (Fraunhofer-Gesellschaft) ·신승배, Steven DiSalvo, Roland Rzehak, P. Kücher, Johann W. Bartha	2011	2
5	Ferroelectric Zr0.5Hf0.5O2 thin films for nonvolatile memory applications Applied Physics Letters ·Johannes Müller, T. S. Böscke, D. Bräuhaus, U. Schröder, U. Böttger, Jonas Sundqvist, P. Kücher, Thomas Mikolajick, L. Frey Hit paper breakdown →	2011	491
6	Ultrathin TaN/Ta barrier modifications to fullfill next technology node requirements Fraunhofer-Publica (Fraunhofer-Gesellschaft) ·Lucas Wood, W. A. Tomazic, Christoph Klein, Akiko Flanders, C. Peta, P. Kücher, Dieter Schmeißer	2011	1
7	Impact of nitrogen post deposition annealing on hafnium zirconate dielectrics for 32nm high-performance SOI CMOS technologies Microelectronic Engineering ·Eduardo Montaño Salazar, Andreas Naumann, Martin Trentzsch, Hong‐Jiao Zhang, L.B. Khuzina, Sarah Osborn, Lalla El Alami, D. Rudolph, S. ABBERGER, Sabine Fahl, Mattias von Corswant, G. P. Serra, P. Kücher, W. Hänsch	2010	1
8	Correlation of microscopic and macroscopic electrical characteristics of high-k ZrSixO2−x thin films using tunneling atomic force microscopy Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ·Wenke Weinreich, L. Wilde, P. Kücher, M. Lemberger, 村上和雅, Mathias Rommel, Anton J. Bauer, Elke Erben, J. Heitmann, U. Schröder, L. Oberbeck	2009	6
9	Improved manufacturability of ZrO2 MIM capacitors by process stabilizing HfO2 addition Microelectronic Engineering ·Johannes Müller, T. S. Böscke, U. Schröder, Saulo de Araújo Lemos, L. Oberbeck, Dayu Zhou, Wenke Weinreich, P. Kücher, M. Lemberger, L. Frey	2009	42
10	Investigations of field-evaporated end forms in voltage- and laser-pulsed atom probe tomography Ultramicroscopy ·Shariq Ahmed, M. Laušic, Tia Ariska Putri, Christoph Klein, Đinh Thị Kim Vân, S. Teichert, P. Kücher, Stephan Gerstl	2008	56
11	Investigation of the relaxation behavior of Si1−xCx alloys during epitaxial UHV-CVD growth Materials Science and Engineering B ·О.О. Сокол, T. Kammler, Andreas Naumann, Johann W. Bartha, P. Kücher	2008	2
12	An Energy-Scalable Margin Propagation-Based Analog VLSI Support Vector Machine P. Kücher, Shantanu Chakrabartty	2007	8
13	Slip-free processing of 300 mm silicon batch wafers Journal of Applied Physics ·A. Fischer, Hans Richter, P.J. Gregory, P. Kücher	2000	22
14	Advanced metallization technology for 256M DRAM Applied Surface Science ·P. Kücher, H. Aochi, Jeff Gambino, Suwaryo Suwaryo, Dicky Wahyu Pratama, S. Nguyen, Siti Zuraidah Ismail, Olga Khmelevskaya, Maria Ronay	1995	5
15	Diffusion barrier properties of Ti/TiN investigated by transmission electron microscopy Journal of Applied Physics ·Lang Maria Liu, H. Hoffmann, P. Kücher	1990	71
16	Three-dimensional simulation of stupper processes for sub-μm technologies Microelectronic Engineering ·Nguyen Nam Khanh, Ivo W. Rangelow, Rainer Kassing, P. Kücher	1989	0
17	Electrical properties of multilayered Al/Ni and Al/Mo films Thin Solid Films ·H. Hoffmann, P. Kücher	1987	12

About P. Kücher

P. Kücher is a scholar working on Metals and Alloys, Electronic, Optical and Magnetic Materials, Electrical and Electronic Engineering, Materials Chemistry and Atomic and Molecular Physics, and Optics, having authored 17 papers that have together received 1.5k indexed citations. Recurring topics across this work include Semiconductor materials and devices (11 papers), Copper Interconnects and Reliability (6 papers), Ferroelectric and Negative Capacitance Devices (6 papers), Advanced Surface Polishing Techniques (3 papers), Semiconductor materials and interfaces (3 papers), Electronic and Structural Properties of Oxides (3 papers), Metal and Thin Film Mechanics (3 papers) and Integrated Circuits and Semiconductor Failure Analysis (2 papers). The work is most often cited by research in Electrical and Electronic Engineering (1.4k citations), Materials Chemistry (1.1k citations), Metals and Alloys (32 citations), Electronic, Optical and Magnetic Materials (63 citations) and Mechanics of Materials (69 citations). P. Kücher has collaborated with scholars based in Germany, United States and South Korea. Frequent co-authors include U. Schröder, Johannes Müller, Jonas Sundqvist, Thomas Mikolajick, T. S. Böscke, L. Frey, U. Böttger, M. Lemberger, D. Bräuhaus and L. Wilde. Their work appears in journals such as Microelectronic Engineering, Journal of Applied Physics, Applied Surface Science, Ultramicroscopy and Applied Physics Letters.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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