Johann W. Bartha

3.3k total citations
163 papers, 2.7k citations indexed

About

Johann W. Bartha is a scholar working on Electrical and Electronic Engineering, Materials Chemistry and Electronic, Optical and Magnetic Materials. According to data from OpenAlex, Johann W. Bartha has authored 163 papers receiving a total of 2.7k indexed citations (citations by other indexed papers that have themselves been cited), including 132 papers in Electrical and Electronic Engineering, 59 papers in Materials Chemistry and 40 papers in Electronic, Optical and Magnetic Materials. Recurrent topics in Johann W. Bartha's work include Semiconductor materials and devices (80 papers), Copper Interconnects and Reliability (38 papers) and Thin-Film Transistor Technologies (22 papers). Johann W. Bartha is often cited by papers focused on Semiconductor materials and devices (80 papers), Copper Interconnects and Reliability (38 papers) and Thin-Film Transistor Technologies (22 papers). Johann W. Bartha collaborates with scholars based in Germany, United States and Russia. Johann W. Bartha's co-authors include Matthias Albert, Uwe Schroeder, S. Jakschik, Peter Hahn, Martin Knaut, T. Hecht, Christoph Hoßbach, B. D. Silverman, Paul S. Ho and Martin G. Rose and has published in prestigious journals such as Nature Communications, Applied Physics Letters and Journal of Applied Physics.

In The Last Decade

Johann W. Bartha

159 papers receiving 2.6k citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Johann W. Bartha Germany 28 2.0k 1.2k 493 430 371 163 2.7k
Yasushiro Nishioka Japan 28 2.3k 1.2× 806 0.7× 358 0.7× 456 1.1× 243 0.7× 197 2.7k
S. B. Newcomb Ireland 25 1.2k 0.6× 1.0k 0.9× 329 0.7× 308 0.7× 262 0.7× 110 2.2k
Geun Young Yeom South Korea 27 2.1k 1.1× 1.6k 1.3× 424 0.9× 583 1.4× 170 0.5× 235 3.0k
C. M. Aldao Argentina 28 1.7k 0.9× 1.4k 1.2× 295 0.6× 704 1.6× 340 0.9× 209 3.0k
P. Hinze Germany 32 2.3k 1.2× 1.5k 1.3× 484 1.0× 930 2.2× 312 0.8× 91 3.7k
Claudia Wiemer Italy 32 2.3k 1.1× 2.1k 1.8× 420 0.9× 267 0.6× 211 0.6× 156 3.0k
G.Y. Yeom South Korea 29 2.2k 1.1× 1.4k 1.2× 405 0.8× 500 1.2× 142 0.4× 223 3.0k
Toshihide Nabatame Japan 31 3.1k 1.6× 1.7k 1.5× 1.0k 2.0× 562 1.3× 314 0.8× 261 4.2k
Christophe Cardinaud France 28 1.9k 1.0× 1.2k 1.0× 368 0.7× 646 1.5× 121 0.3× 126 2.9k
Nicolas Martin France 32 1.7k 0.9× 2.1k 1.8× 535 1.1× 578 1.3× 663 1.8× 167 3.7k

Countries citing papers authored by Johann W. Bartha

Since Specialization
Citations

This map shows the geographic impact of Johann W. Bartha's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Johann W. Bartha with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Johann W. Bartha more than expected).

Fields of papers citing papers by Johann W. Bartha

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Johann W. Bartha. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Johann W. Bartha. The network helps show where Johann W. Bartha may publish in the future.

Co-authorship network of co-authors of Johann W. Bartha

This figure shows the co-authorship network connecting the top 25 collaborators of Johann W. Bartha. A scholar is included among the top collaborators of Johann W. Bartha based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Johann W. Bartha. Johann W. Bartha is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Chavarin, Carlos Alvarado, Julia Kitzmann, Antonio Di Bartolomeo, et al.. (2018). Current Modulation of a Heterojunction Structure by an Ultra-Thin Graphene Base Electrode. Materials. 11(3). 345–345. 11 indexed citations
2.
Neumann, Volker, et al.. (2018). 3D system integration on 300 mm wafer level: High-aspect-ratio TSVs with ruthenium seed layer by thermal ALD and subsequent copper electroplating. Microelectronic Engineering. 205. 20–25. 20 indexed citations
3.
Neumann, Niels, et al.. (2017). Modeling and characterization of optical TSVs. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 10325. 103250O–103250O. 5 indexed citations
4.
Bartha, Johann W., et al.. (2017). 3D Optical Coupling Techniques on Polymer Waveguides for Wafer and Board Level Integration. 1612–1618. 6 indexed citations
5.
Liu, Shiyi, Chang‐Min Keum, Daniel Kasemann, et al.. (2016). Minority Currents in n-Doped Organic Transistors. ACS Applied Materials & Interfaces. 8(47). 32432–32439. 13 indexed citations
6.
Nehm, Frederik, Felix Dollinger, Hannes Klumbies, et al.. (2016). Atomic layer deposited TiO /AlO nanolaminates as moisture barriers for organic devices. Organic Electronics. 38. 84–88. 14 indexed citations
7.
Henke, Thomas, Johann W. Bartha, L. Rebohle, et al.. (2014). Formation of regularly arranged large grain silicon islands by using embedded micro mirrors in the flash crystallization of amorphous silicon. Journal of Applied Physics. 115(3). 3 indexed citations
8.
Bartha, Johann W., et al.. (2013). Water uptake of a low-κ dielectric film: Combining capacitance and gravimetric measurements. Microelectronic Engineering. 106. 177–181. 1 indexed citations
9.
Knaut, Martin, et al.. (2013). Improvement of Al2O3 Passivation by Ti-Doping. EU PVSEC. 1156–1161. 2 indexed citations
11.
Menzel, S., et al.. (2012). Chemical-Mechanical Planarization of Aluminium Damascene Structures. 1–6. 3 indexed citations
12.
Schumacher, Henrik, et al.. (2011). Fourier Transform Infrared Spectroscopy of Moisturized Low-$\kappa$ Dielectric Materials. IEEE Transactions on Electron Devices. 58(9). 2888–2894. 12 indexed citations
13.
Rzehak, Roland, et al.. (2011). A CMP Model Including Global Distribution of Pressure. IEEE Transactions on Semiconductor Manufacturing. 24(2). 304–314. 13 indexed citations
14.
Knaut, Martin, et al.. (2011). In situ ellipsometric investigations during the ALD growth of Ru. 1 indexed citations
15.
Schumacher, Henrik, et al.. (2010). Applications of Microstructured Silicon Wafers as Internal Reflection Elements in Attenuated Total Reflection Fourier Transform Infrared Spectroscopy. Applied Spectroscopy. 64(9). 1022–1027. 35 indexed citations
16.
Choi, Kang‐Hoon, et al.. (2009). Fast backscattering parameter determination in e-beam lithography with a modified doughnut test. Microelectronic Engineering. 86(12). 2408–2411. 5 indexed citations
17.
Albert, Matthias, et al.. (2005). Hafnium oxide for optical applications deposited by different CMOS compatible methods. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5870. 58700M–58700M. 2 indexed citations
18.
Voit, Brigitte, et al.. (2002). Labile hyperbranched polymers used as nanopore-forming agents in polymeric dielectrica. Macromolecular Symposia. 177(1). 147–154. 13 indexed citations
20.
Novodvorsky, O. A., О. Д. Храмова, Е. О. Филиппова, Christian Wenzel, & Johann W. Bartha. (1999). Energy distribution of ions in plasma formed by laser ablation of metallic Nb and Ta targets. Optics and Lasers in Engineering. 32(5). 449–457. 8 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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