S. Riedel

2.3k total citations · 1 hit paper
38 papers, 1.5k citations indexed

About

S. Riedel is a scholar working on Electrical and Electronic Engineering, Materials Chemistry and Electronic, Optical and Magnetic Materials. According to data from OpenAlex, S. Riedel has authored 38 papers receiving a total of 1.5k indexed citations (citations by other indexed papers that have themselves been cited), including 36 papers in Electrical and Electronic Engineering, 12 papers in Materials Chemistry and 8 papers in Electronic, Optical and Magnetic Materials. Recurrent topics in S. Riedel's work include Semiconductor materials and devices (26 papers), Ferroelectric and Negative Capacitance Devices (15 papers) and Advancements in Semiconductor Devices and Circuit Design (8 papers). S. Riedel is often cited by papers focused on Semiconductor materials and devices (26 papers), Ferroelectric and Negative Capacitance Devices (15 papers) and Advancements in Semiconductor Devices and Circuit Design (8 papers). S. Riedel collaborates with scholars based in Germany, Russia and Portugal. S. Riedel's co-authors include Jonas Sundqvist, Thomas Mikolajick, Stefan Mueller, Johannes Mueller, Uwe Schroeder, Aarti Singh, P. Polakowski, Johannes Müller, Konrad Seidel and M. Czernohorsky and has published in prestigious journals such as Applied Physics Letters, Journal of Applied Physics and Advanced Functional Materials.

In The Last Decade

S. Riedel

37 papers receiving 1.5k citations

Hit Papers

align trajectories

What are hit papers?

Hit papers significantly outperform the citation benchmark for their cohort. A paper qualifies if it has ≥500 total citations, achieves ≥1.5× the top-1% citation threshold for papers in the same subfield and year (this is the minimum needed to enter the top 1%, not the average within it), or reaches the top citation threshold in at least one of its specific research topics.

Incipient Ferroelectricity in Al‐Doped HfO₂ Thin Films

2012 722 citations Stefan Mueller, Johannes Mueller et al. Advanced Functional Materials profile →

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name	h						Papers	Cites
S. Riedel Germany	13	1.5k	1.1k	60	50	46	38	1.5k
Ekaterina Yurchuk Germany	15	1.9k 1.3×	1.4k 1.3×	96 1.6×	88 1.8×	29 0.6×	21	2.0k
Terence Mittmann Germany	20	1.5k 1.0×	1.2k 1.2×	83 1.4×	65 1.3×	29 0.6×	26	1.6k
P. Kücher Germany	9	1.4k 1.0×	1.1k 1.1×	120 2.0×	63 1.3×	47 1.0×	17	1.5k
Raik Hoffmann Germany	20	1.9k 1.3×	1.0k 1.0×	86 1.4×	35 0.7×	29 0.6×	72	1.9k
David Lehninger Germany	19	1.2k 0.8×	771 0.7×	62 1.0×	28 0.6×	36 0.8×	85	1.2k
Franz P. G. Fengler Germany	13	2.3k 1.5×	1.8k 1.7×	107 1.8×	89 1.8×	19 0.4×	19	2.4k
Korok Chatterjee United States	18	1.8k 1.2×	1.1k 1.1×	113 1.9×	90 1.8×	38 0.8×	23	1.9k
Benjamin Max Germany	13	763 0.5×	522 0.5×	62 1.0×	56 1.1×	14 0.3×	18	852
Milan Pešić Germany	26	3.4k 2.3×	2.6k 2.4×	156 2.6×	117 2.3×	32 0.7×	57	3.6k
Patrick D. Lomenzo Germany	30	2.3k 1.6×	2.0k 1.9×	260 4.3×	78 1.6×	42 0.9×	55	2.5k

Countries citing papers authored by S. Riedel

Since Specialization

Citations

This map shows the geographic impact of S. Riedel's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by S. Riedel with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites S. Riedel more than expected).

Fields of papers citing papers by S. Riedel

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by S. Riedel. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by S. Riedel. The network helps show where S. Riedel may publish in the future.

Co-authorship network of co-authors of S. Riedel

This figure shows the co-authorship network connecting the top 25 collaborators of S. Riedel. A scholar is included among the top collaborators of S. Riedel based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with S. Riedel. S. Riedel is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

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20 of 20 papers shown

Calvo, Jesús, et al.. (2020). Doping Effects in CMOS‐compatible CoSi Thin Films for Thermoelectric and Sensor Applications. Zeitschrift für anorganische und allgemeine Chemie. 646(14). 1231–1237. 3 indexed citations

Lv, Hua, Ana V. Silva, Diana C. Leitão, et al.. (2019). Assessment of conduction mechanisms through MgO ultrathin barriers in CoFeB/MgO/CoFeB perpendicular magnetic tunnel junctions. Applied Physics Letters. 114(10). 12 indexed citations

Lv, Hua, Diana C. Leitão, Ana V. Silva, et al.. (2019). The annealing effect on memory state stability and interlayer coupling in perpendicular magnetic tunnel junctions with ultrathin MgO barrier. Journal of Magnetism and Magnetic Materials. 477. 142–146. 6 indexed citations

Ali, Tarek, P. Polakowski, S. Riedel, et al.. (2018). Silicon doped hafnium oxide (HSO) and hafnium zirconium oxide (HZO) based FeFET: A material relation to device physics. Applied Physics Letters. 112(22). 120 indexed citations

Lerch, Wilfried, et al.. (2016). (Invited) Low-Temperature Microwave-Based Plasma Oxidation of Ge and Oxidation of Silicon Followed by Plasma Nitridation. ECS Transactions. 72(4). 101–114. 2 indexed citations

Riedel, S., et al.. (2015). Low temperature deposition of silicon nitride using Si3Cl8. Thin Solid Films. 577. 114–118. 32 indexed citations

Müller, Johannes, P. Polakowski, & S. Riedel. (2015). (Invited) Scaling and Optimization of Ferroelectric Hafnium Oxide for Memory Applications and Beyond. 1 indexed citations

Polakowski, P., S. Riedel, Wenke Weinreich, et al.. (2014). Ferroelectric deep trench capacitors based on Al:HfO₂ for 3D nonvolatile memory applications. Fraunhofer-Publica (Fraunhofer-Gesellschaft). 1–4. 96 indexed citations

Weinreich, Wenke, Konrad Seidel, P. Polakowski, et al.. (2014). ALD ZrO₂ processes for BEoL device applications. Fraunhofer-Publica (Fraunhofer-Gesellschaft). 1–4. 1 indexed citations

10.

Jarman, Paul, et al.. (2013). Evaluation of an advanced dual hard mask stack for high resolution pattern transfer. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 8685. 86850V–86850V. 7 indexed citations

11.

Weinreich, Wenke, Konrad Seidel, Matthias Rudolph, et al.. (2013). Scaling and optimization of high-density integrated Si-capacitors. Fraunhofer-Publica (Fraunhofer-Gesellschaft). 1–4. 3 indexed citations

12.

Seidel, Konrad, et al.. (2013). Optimized electrode and interface for enhanced reliability of high-k based metal–insulator–metal capacitors. Microelectronic Engineering. 109. 148–151. 6 indexed citations

13.

Mueller, Stefan, Johannes Mueller, Aarti Singh, et al.. (2012). Incipient Ferroelectricity in Al‐Doped HfO₂ Thin Films. Advanced Functional Materials. 22(11). 2412–2417. 722 indexed citations breakdown →

14.

Weinreich, Wenke, P. Polakowski, Maximilian Drescher, et al.. (2012). TEMAZ/O3 atomic layer deposition process with doubled growth rate and optimized interface properties in metal–insulator–metal capacitors. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 31(1). 27 indexed citations

15.

Paul, Jan, S. Riedel, Matthias Rudolph, et al.. (2011). Introduction of zirconium oxide in a hardmask concept for highly selective patterning of scaled high aspect ratio trenches in silicon. Thin Solid Films. 520(14). 4527–4531. 9 indexed citations

16.

Mikolajick, Thomas, Michael Specht, N. Nagel, et al.. (2007). The Future of Charge Trapping Memories. 21. 1–4. 8 indexed citations

17.

Mikolajick, Thomas, et al.. (2007). Scaling of nonvolatile memories to nanoscale feature sizes. 2 indexed citations

18.

Tempel, G., R. Hagenbeck, Thomas Mikolajick, et al.. (2006). Programming Transients of Trapping Nitride Storage Flash Memory Cells and Evidence of Lateral Charge Redistributions during or after Programming. 81–83. 1 indexed citations

19.

Nagel, N., D. Olligs, S. Parascandola, et al.. (2005). Highly scalable 90nm STI bounded twin flash cell with local interconnect. 120–121. 2 indexed citations

20.

Shor, Joseph, et al.. (2003). A 512 Mb NROM flash data storage memory with 8 MB/s data rate. 2002 IEEE International Solid-State Circuits Conference. Digest of Technical Papers (Cat. No.02CH37315). 1. 100–101. 14 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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