M. Lemberger

1.5k citations

43 papers · 1.3k indexed · 1 hit paper · h-index 16

Electrical and Electronic Engineering top 5%
- Semiconductor materials and devices 36
- Ferroelectric and Negative Capacitance Devices 13
- Advancements in Semiconductor Devices and Circuit Design 12
- Integrated Circuits and Semiconductor Failure Analysis 6
- Advanced Memory and Neural Computing 3
Materials Chemistry top 5%
- Electronic and Structural Properties of Oxides 11
Electronic, Optical and Magnetic Materials
Atomic and Molecular Physics, and Optics
- Semiconductor materials and interfaces 6
- Force Microscopy Techniques and Applications 5
Mechanics of Materials

Co-authors: Anton J. Bauer L. Frey Jonas Sundqvist U. Schröder Johannes Müller L. Wilde A. Paskaleva T. S. Böscke
Cited by: Electrical and Electronic Engineering Materials Chemistry Electronic, Optical and Magnetic Materials
Journals: Journal of Applied Physics (7 papers)Microelectronics Reliability (5 papers)Microelectronic Engineering (4 papers)
Partner nations: Germany Bulgaria Switzerland

In The Last Decade

M. Lemberger

42 papers receiving 1.2k citations

Hit Papers

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Peers

Countries citing papers authored by M. Lemberger

Since Specialization

Citations

This map shows the geographic impact of M. Lemberger's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by M. Lemberger with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites M. Lemberger more than expected).

Fields of papers citing papers by M. Lemberger

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by M. Lemberger. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by M. Lemberger. The network helps show where M. Lemberger may publish in the future.

Co-authorship network

The 25 scholars most cited alongside M. Lemberger, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with M. Lemberger Line = papers co-authored together M. Lemberger links everyone, so they are left out of the graph.

All Works

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20 of 20 papers shown

#	Work
1	Improved electrical behavior of ZrO2-based MIM structures by optimizing the O3 oxidation pulse time Materials Science in Semiconductor Processing ·A. Paskaleva,Wenke Weinreich,Anton J. Bauer,M. Lemberger,L. Frey	2014	9
2	Structural properties of as deposited and annealed ZrO2 influenced by atomic layer deposition, substrate, and doping Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ·Wenke Weinreich,L. Wilde,Johannes Müller,Jonas Sundqvist,Elke Erben,Johannes Heitmann,M. Lemberger,Anton J. Bauer	2012	47
3	Detailed leakage current analysis of metal–insulator–metal capacitors with ZrO2, ZrO2/SiO2/ZrO2, and ZrO2/Al2O3/ZrO2 as dielectric and TiN electrodes Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena ·Wenke Weinreich,Shariq Ahmed,Konrad Seidel,Jonas Sundqvist,A. Paskaleva,M. Lemberger,Anton J. Bauer	2012	64
4	Atomic Layer Deposited Al[sub 2]O[sub 3] as Characterized Reference Samples for Nanolayer Metrology AIP conference proceedings ·جعفر بی آزار,M. Lemberger,P. Petrík,David G. Seiler,Alain C. Diebold,Robert McDonald,Amal Chabli,Erik M. Secula	2011	1
5	Conduction Mechanisms and Environmental Sensitivity of Solution‐Processed Silicon Nanoparticle Layers for Thin‐Film Transistors Small ·Sebastian Weis,Inge Linder-Gaillard,Michael P. M. Jank,M. Lemberger,Michael Otto,H. Ryssel,Wolfgang Peukert,L. Frey	2011	22
6	(Invited) Electrical Scanning Probe Microscopy Techniques for the Detailed Characterization of High-k Dielectric Layers ECS Transactions ·Mathias Rommel,村上和雅,A. Paskaleva,Tobias Erlbacher,M. Lemberger,Anton J. Bauer,L. Frey	2010	4
7	Impact of interface variations on J–V and C–V polarity asymmetry of MIM capacitors with amorphous and crystalline Zr(1−)Al O2 films Microelectronic Engineering ·Wenke Weinreich,R. Reiche,M. Lemberger,Gunther Jegert,Johannes Müller,L. Wilde,S. Teichert,J. Heitmann,Elke Erben,L. Oberbeck,U. Schröder,Anton J. Bauer,H. Ryssel	2009	58
8	High-K: Latest Developments and Perspectives Materials science forum ·Anton J. Bauer,M. Lemberger,Tobias Erlbacher,Wenke Weinreich	2008	5
9	Tunneling atomic-force microscopy as a highly sensitive mapping tool for the characterization of film morphology in thin high-k dielectrics Applied Physics Letters ·村上和雅,Mathias Rommel,M. Lemberger,M. B. Emeneau,zelin,Tobias Erlbacher,Anton J. Bauer,H. Ryssel,A. Paskaleva,Wenke Weinreich,Marilyn Wilcher,Johannes Heitmann,Uwe Schroeder	2008	72
10	Improved insight in charge trapping of high-k ZrO2/SiO2 stacks by use of tunneling atomic force microscopy Journal of Applied Physics ·A. Paskaleva,村上和雅,Mathias Rommel,M. Lemberger,Anton J. Bauer	2008	21
11	HfSiO/SiO2- and SiO2/HfSiO/SiO2-gate stacks for non-volatile memories Thin Solid Films ·Tobias Erlbacher,Michael P. M. Jank,M. Lemberger,Anton J. Bauer,H. Ryssel	2008	5
12	Evaluation of MOCVD Grown Niobium Nitride Films as Gate Electrode for Advanced CMOS Technology ECS Transactions ·Tobias Thiede,Harish Parala,Knud Reuter,G. Passing,Stephan Kirchmeyer,D Shiva,M. Lemberger,Anton J. Bauer,Roland A. Fischer	2008	4
13	MOCVD of tantalum nitride thin films from TBTEMT single source precursor as metal electrodes in CMOS applications Surface and Coatings Technology ·M. Lemberger,Stefan Thiemann,A. Baunemann,Harish Parala,Roland A. Fischer,D Shiva,Anton J. Bauer,H. Ryssel	2007	14
14	Stress induced leakage current mechanism in thin Hf-silicate layers Applied Physics Letters ·A. Paskaleva,M. Lemberger,Anton J. Bauer	2007	11
15	MOCVD of TaN Using the All‐Nitrogen‐Coordinated Precursors [Ta(NEtMe)₃(N‐^tBu)], [Ta(NEtMe)(N‐^tBu){C(N‐ⁱPr)₂(NEtMe)}₂], and [Ta(NMeEt)₂(N‐^tBu){Me₂N‐N(SiMe₃)}] Chemical Vapor Deposition ·A. Baunemann,M. Lemberger,Anton J. Bauer,Harish Parala,Roland A. Fischer	2007	15
16	Conduction mechanisms and an evidence for phonon-assisted conduction process in thin high-k HfxTiySizO films Microelectronics Reliability ·A. Paskaleva,Anton J. Bauer,M. Lemberger	2005	2
17	Different current conduction mechanisms through thin high-k HfxTiySizO films due to the varying Hf to Ti ratio Journal of Applied Physics ·A. Paskaleva,Anton J. Bauer,M. Lemberger,Stefan Zürcher	2004	64
18	New Single‐Source Precursors for the MOCVD of High‐ϰ Dielectric Zirconium Silicates to Replace SiO₂ in Semiconducting Devices. ChemInform ·Mathieu Tanguy,M. Morstein,Nicholas D. Spencer,M. Lemberger,Anton J. Bauer	2002	4
19	New Single-Source Precursors for the MOCVD of High-κ Dielectric Zirconium Silicates to Replace SiO2 in Semiconducting Devices Chemical Vapor Deposition ·Stefan Zürcher,M. Morstein,Nicholas D. Spencer,M. Lemberger,Anton J. Bauer	2002	19
20	Electrical reliability aspects of through the gate implanted MOS structures with thin oxides Microelectronics Reliability ·Michael P. M. Jank,M. Lemberger,Handreanta Agustio,L. Frey,H. Ryssel	2001	4

About M. Lemberger

M. Lemberger is a scholar working on Electrical and Electronic Engineering, Materials Chemistry, Atomic and Molecular Physics, and Optics, Surfaces, Coatings and Films and Electronic, Optical and Magnetic Materials, having authored 43 papers that have together received 1.3k indexed citations. Recurring topics across this work include Semiconductor materials and devices (36 papers), Ferroelectric and Negative Capacitance Devices (13 papers), Advancements in Semiconductor Devices and Circuit Design (12 papers), Electronic and Structural Properties of Oxides (11 papers), Semiconductor materials and interfaces (6 papers), Integrated Circuits and Semiconductor Failure Analysis (6 papers), Force Microscopy Techniques and Applications (5 papers) and Advanced Memory and Neural Computing (3 papers). The work is most often cited by research in Electrical and Electronic Engineering (1.2k citations), Materials Chemistry (785 citations), Electronic, Optical and Magnetic Materials (92 citations), Atomic and Molecular Physics, and Optics (110 citations) and Mechanics of Materials (51 citations). M. Lemberger has collaborated with scholars based in Germany, Bulgaria and Switzerland. Frequent co-authors include Anton J. Bauer, L. Frey, Jonas Sundqvist, U. Schröder, Johannes Müller, L. Wilde, A. Paskaleva, T. S. Böscke, P. Kücher and U. Böttger. Their work appears in journals such as Journal of Applied Physics, Microelectronics Reliability, Microelectronic Engineering, Chemical Vapor Deposition and Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena.

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