Nicholas J. Clecak

680 total citations
30 papers, 498 citations indexed

About

Nicholas J. Clecak is a scholar working on Electrical and Electronic Engineering, Electronic, Optical and Magnetic Materials and Organic Chemistry. According to data from OpenAlex, Nicholas J. Clecak has authored 30 papers receiving a total of 498 indexed citations (citations by other indexed papers that have themselves been cited), including 18 papers in Electrical and Electronic Engineering, 10 papers in Electronic, Optical and Magnetic Materials and 9 papers in Organic Chemistry. Recurrent topics in Nicholas J. Clecak's work include Advancements in Photolithography Techniques (16 papers), Nanofabrication and Lithography Techniques (9 papers) and Liquid Crystal Research Advancements (5 papers). Nicholas J. Clecak is often cited by papers focused on Advancements in Photolithography Techniques (16 papers), Nanofabrication and Lithography Techniques (9 papers) and Liquid Crystal Research Advancements (5 papers). Nicholas J. Clecak collaborates with scholars based in United States, Bulgaria and Canada. Nicholas J. Clecak's co-authors include Barbara Grant, C. Grant Willson, Robert J. Cox, Clinton D. Snyder, Scott Macdonald, William D. Hinsberg, Scott A. MacDonald, Hiroshi Itô, Steven J. Holmes and James R. Morrow and has published in prestigious journals such as Chemistry of Materials, Journal of The Electrochemical Society and The Journal of Organic Chemistry.

In The Last Decade

Nicholas J. Clecak

30 papers receiving 453 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Nicholas J. Clecak United States 12 246 151 135 127 115 30 498
Sebastián Richter Germany 14 153 0.6× 156 1.0× 226 1.7× 148 1.2× 62 0.5× 31 489
Thomas Sauer Germany 12 100 0.4× 59 0.4× 258 1.9× 96 0.8× 105 0.9× 15 453
Yulia Fogel Germany 8 173 0.7× 83 0.5× 210 1.6× 185 1.5× 81 0.7× 8 414
Zhenzhong Yan China 11 237 1.0× 73 0.5× 272 2.0× 67 0.5× 98 0.9× 24 513
Hiroshi Awano Japan 13 119 0.5× 78 0.5× 193 1.4× 103 0.8× 85 0.7× 45 461
Il Cheol Jeon South Korea 11 196 0.8× 51 0.3× 170 1.3× 81 0.6× 56 0.5× 34 378
Tapio Ollonqvist Finland 9 115 0.5× 235 1.6× 211 1.6× 60 0.5× 43 0.4× 17 506
Pushkara R. Varanasi United States 10 185 0.8× 183 1.2× 161 1.2× 137 1.1× 215 1.9× 39 467
Xiu-Neng Song China 12 213 0.9× 63 0.4× 219 1.6× 105 0.8× 31 0.3× 47 409
А. В. Кухто Belarus 13 276 1.1× 80 0.5× 324 2.4× 59 0.5× 101 0.9× 87 624

Countries citing papers authored by Nicholas J. Clecak

Since Specialization
Citations

This map shows the geographic impact of Nicholas J. Clecak's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Nicholas J. Clecak with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Nicholas J. Clecak more than expected).

Fields of papers citing papers by Nicholas J. Clecak

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Nicholas J. Clecak. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Nicholas J. Clecak. The network helps show where Nicholas J. Clecak may publish in the future.

Co-authorship network of co-authors of Nicholas J. Clecak

This figure shows the co-authorship network connecting the top 25 collaborators of Nicholas J. Clecak. A scholar is included among the top collaborators of Nicholas J. Clecak based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Nicholas J. Clecak. Nicholas J. Clecak is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Hinsberg, William D., Scott A. MacDonald, Nicholas J. Clecak, & Clinton D. Snyder. (1994). Airborne Contamination of a Chemically Amplified Resist. 2. Effect of Polymer Film Properties on Contamination Rate. Chemistry of Materials. 6(4). 481–488. 23 indexed citations
2.
Macdonald, Scott, et al.. (1993). Airborne contamination of a chemically amplified resist. 1. Identification of problem. Chemistry of Materials. 5(3). 348–356. 39 indexed citations
3.
Hinsberg, William D., Scott Macdonald, Nicholas J. Clecak, Clinton D. Snyder, & Hiroshi Itô. (1993). <title>Influence of polymer properties on airborne chemical contamination of chemically amplified resists</title>. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 1925. 43–52. 11 indexed citations
4.
Ito, Hiroshi, Nicholas J. Clecak, Gregory Breyta, et al.. (1993). <title>Molecular design for stabilization of chemical amplification resist toward airborne contamination</title>. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 1925. 65–75. 9 indexed citations
5.
Hinsberg, William D., et al.. (1993). Fundamental Studies of airborne chemical contamination of chemically amplified resists.. Journal of Photopolymer Science and Technology. 6(4). 535–546. 3 indexed citations
6.
Shimizu, Ken D., et al.. (1993). Resist system based on the cationic photocrosslinking of poly(4‐hydroxystyrene) and polyfunctional electrophiles. Journal of Polymer Science Part A Polymer Chemistry. 31(1). 1–11. 10 indexed citations
7.
Hinsberg, William D., Scott Macdonald, Nicholas J. Clecak, & Clinton D. Snyder. (1992). Quantitation of airborne chemical contamination of chemically amplified resists using radiochemical analysis. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 1672. 24–24. 10 indexed citations
8.
Macdonald, Scott, et al.. (1991). Plasma developable photoresist systems based on chemical amplification. Chemistry of Materials. 3(3). 435–442. 21 indexed citations
9.
Wallraff, Gregory M., et al.. (1991). <title>Polysilanes for microlithography</title>. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 1466. 211–217. 9 indexed citations
10.
McKean, Dennis R., et al.. (1990). Highly etch resistant, negative resist for deep-UV and electron beam lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 1262. 110–110. 4 indexed citations
11.
McKean, Dennis R., Scott A. MacDonald, Robert D. Johnson, Nicholas J. Clecak, & C. Grant Willson. (1990). Characterization of a Novolak-based three-component deep-UV resist. Chemistry of Materials. 2(5). 619–624. 10 indexed citations
12.
Holmes, Steven J., James R. Morrow, Mark C. Hakey, et al.. (1990). 1X deep-UV lithography with chemical amplification for 1-micron DRAM production. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 1262. 2–2. 20 indexed citations
13.
McKean, Dennis R., Scott Macdonald, Nicholas J. Clecak, & C. Grant Willson. (1988). Novolac Based Deep-UV Resists. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 920. 60–60. 8 indexed citations
14.
Willson, Grant, Robert D. Miller, Dennis R. McKean, et al.. (1983). Design of a positive resist for projection lithography in the mid‐UV. Polymer Engineering and Science. 23(18). 1004–1011. 10 indexed citations
15.
Grant, Barbara, et al.. (1980). Study of the electrochromism of methoxyfluorene compounds. The Journal of Organic Chemistry. 45(4). 702–705. 10 indexed citations
16.
Grant, Barbara, Nicholas J. Clecak, & Robert J. Cox. (1979). Novel Liquid Crystalline Materials: Synthesis and preliminary characterization of new 4,4′-disubstituted diphenyldiacetylene, tolane and stilbene derivatives. Molecular crystals and liquid crystals. 51(3-4). 209–214. 35 indexed citations
17.
Grant, Barbara, et al.. (1979). An Explanation of the Electrochromism of Lutetium Diphthalocyanine. Journal of The Electrochemical Society. 126(8). 1339–1343. 85 indexed citations
18.
Cox, Robert J., et al.. (1977). Thermal properties of 4-alkyl-4′-cyanostilbenes: a new series of liquid crystal compounds. Thermochimica Acta. 21(3). 369–373. 2 indexed citations
19.
Cox, Robert J. & Nicholas J. Clecak. (1976). The Preparation of 4-Cyano-4′-Alkyltolans: A New Series of Liquid Crystals. Molecular crystals and liquid crystals. 37(1). 241–248. 13 indexed citations
20.
Cox, Robert J. & Nicholas J. Clecak. (1976). The Preparationof 4-Alkyl-4′-Cyanostilbenes :A New Series of Liquid Crystal Compounds. Molecular crystals and liquid crystals. 37(1). 263–267. 10 indexed citations

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