P. Hudek

1.0k citations

89 papers · 779 indexed · h-index 14

Impact in

Surfaces, Coatings and Films top 5%
Structural Biology top 10%

Papers in

Surfaces, Coatings and Films 17
- Electron and X-Ray Spectroscopy Techniques 11
Electrical and Electronic Engineering 73
- Advancements in Photolithography Techniques 40
- Integrated Circuits and Semiconductor Failure Analysis 16
- Advanced MEMS and NEMS Technologies 14
- Semiconductor materials and devices 11

Co-authors: Ivo W. Rangelow I. Kostič Teodor Gotszalk F.G. Shi Dirk Beyer P. Grabiec B. Volland Frank F. Shi
Journals: Microelectronic Engineering (35 papers)Nuclear Instruments and Methods in Physics Research Section A Accelerators Spectrometers Detectors and Associated Equipment (2 papers)Journal of Physics D Applied Physics (2 papers)Materials Science and Engineering B (2 papers)Journal of Micromechanics and Microengineering (1 paper)
Partner nations: Germany Slovakia Austria

In The Last Decade

P. Hudek

84 papers receiving 725 citations

Peers

Countries citing papers authored by P. Hudek

Since Specialization

Citations

This map shows the geographic impact of P. Hudek's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by P. Hudek with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites P. Hudek more than expected).

Fields of papers citing papers by P. Hudek

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by P. Hudek. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by P. Hudek. The network helps show where P. Hudek may publish in the future.

Co-authorship network

The 25 scholars most cited alongside P. Hudek, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with P. Hudek Line = papers co-authored together P. Hudek links everyone, so they are left out of the graph.

All Works

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20 of 20 papers shown

#	Work
1	MBMW exposure optimization for EUV mask stacks P. Hudek, Naomi Batarse, R. Pierantoni, Stefan Pytlas, Masahiro Hashimoto, Kazunori Ono, Toru Fukui, T. Takahashi, Kotaro Takahashi	2021	2
2	Bulk micromachining of SiC substrate for MEMS sensor applications Microelectronic Engineering ·G. Vanko, P. Hudek, Johann Zehetner, Zhaohui Ran, R. Pierantoni, Vladimı́r Kutiš, Susan Agustina, Domínguez Domínguez, T. Lalinský	2013	30
3	Shaped beam technology for nano-imprint mask lithography Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·P. Hudek, Dirk Beyer, T. R. Groves, Jichen Qu, William J. Dauksher, David P. Mancini, Kevin J. Nordquist, Douglas J. Resnick	2004	1
4	Micromachined atomic force microscopy sensor with integrated piezoresistive sensor and thermal bimorph actuator for high-speed tapping-mode atomic force microscopy phase-imaging in higher eigenmodes Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ·亮出川, Tzv. Ivanov, K. Ivanova, Teodor Gotszalk, N. Abedinov, Ivo W. Rangelow, Klaus Edinger, A. Czubska, T. Schenkel, P. Hudek	2003	84
5	Investigation of e-beam sensitive negative-tone chemically amplified resists for binary mask making Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Smuckler Rh, Lothar Berger, Dirk Beyer, N Malani, Erika Pero, Thomas Hoffmann, P. Hudek, Ruxandra Valentina Moroti-Constantinescu, Martin Tschinkl, E Wojtaszek	2003	3
6	Evaluation and fabrication of AFM array for ESA-Midas/Rosetta space mission Microelectronic Engineering ·Hyun Seok Yu, José Domingos, N. Abedinov, T. Ivanov, A. Bruschettini, B. Volland, Teodor Gotszalk, Ivo W. Rangelow, K. Torkar, Andrew Tallon, P. Grabiec, Mathieu Thomas, I. Kostič, P. Hudek	2001	8
7	Mechanical, geometrical, and electrical characterization of silicon membranes for open stencil masks Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ·Ady Steg, Varun Dev, Ivo W. Rangelow, (unknown), P. Hudek, Tom Tiwald, John A. Woollam	2001	2
8	Directly sputtered stress-compensated carbon protective layer for silicon stencil masks Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ·P. Hudek, طالب كطافة, Milan Držík, I. Kostič, M. Belov, L. Eikenberg, Konsta Hannula, J. C. Wolfe, Varun Dev, Ivo W. Rangelow, J. Voigt, N Malani, Florian Letzkus, Yongqi LIU, Gladys M. Manalo, 野道彰一, Werner Schaller, Hasan Jamil, MIREILLE BONNEMAIRE, H. Löschner	1999	8
9	Resolution improvement of ion projector with a low energy spread multicusp ion source Microelectronic Engineering ·W.H. Bruenger, L Kadola, K. N. Leung, Obert Mathias, Michael D. Williams, Hans Loeschner, G. Stengl, Georg R. Bluhm, Mary E. Barraclough, G. Stangl, Ivo W. Rangelow, P. Hudek	1999	17
10	Structural characterization of a lamellar W/Si multilayer grating Journal of Applied Physics ·M. Jergel, Petr Mikulı́k, E. Majková, Š. Luby, Jin Xu, Emil Pinčík, M. Brunel, P. Hudek, I. Kostič, Mahseredjian Jean	1999	7
11	SEM and AFM characterisation of high-mesa patterned InP substrates prepared by wet etching Materials Science and Engineering B ·P. Eliáš, V. Cambel, S. Hasenöhrl, P. Hudek, J. Novák	1999	5
12	DUV resist UV II HS applied to high resolution electron beam lithography and to masked ion beam proximity and reduction printing Microelectronic Engineering ·W.H. Bruenger, Diksha Nishane, Naomi Ikuta, Sabrina D. Eder, T. H. Fedynyshyn, Kyudae Shim, P. Hudek, I. Kostič, Hans Loeschner, Ivo W. Rangelow, L Kadola	1998	8
13	Fabrication of multipurpose piezoresistive Wheatstone bridge cantilevers with conductive microtips for electrostatic and scanning capacitance microscopy Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ·Teodor Gotszalk, 良行河村, P. Grabiec, Christopher Cassara, F.G. Shi, P. Hudek, Ivo W. Rangelow	1998	23
14	Air Bridge Based Planar Hybrid Technology for Microwave and Millimeterwave Applications Edward Wasige, G. Kompa, F. van Raay, Ingo Schmale, Ivo W. Rangelow, W. Scholz, F.G. Shi, Rainer Kassing, Richard A. Meyer, M.-C. Amann, P. Hudek	1997	5
15	Quantitative measurement of the resist heating in a variable shaped electron lithography Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ·McKinstry Steven, P. Hudek, I. Kostič	1997	4
16	The influence of polarization effects on an MSGC glass substrate Nuclear Instruments and Methods in Physics Research Section A Accelerators Spectrometers Detectors and Associated Equipment ·W. Bartl, G. Fischer, P. Hudek, A. Jachimowicz, 有洙金	1997	1
17	Silicon stencil masks for masked ion beam lithography proximity printing Microelectronic Engineering ·Ivo W. Rangelow, F.G. Shi, P. Hudek, I. Kostič, H. S. Willis, H. Löschner, G. Stengl, Naomi Ikuta	1996	6
18	Sorption and Diffusion Properties of H- and Modified Forms of ZSM-5 Zeolites Adsorption Science & Technology ·P. Hudek, Xu-JunQin, Watson Kate, Préfecture de Paris	1996	13
19	<title>Fabrication of piezoresistive-sensed AFM cantilever probe with integrated tip</title> Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Ivo W. Rangelow, Paula Aizpiolea, P. Hudek, Teodor Gotszalk, P. Grabiec, Christopher Cassara	1996	26
20	Bulk micromachining of Si by Lithography and Reactive Ion Etching (LIRIE) Vacuum ·Chelsea-Ann A. Patry, P. Hudek, F.G. Shi	1995	6

About P. Hudek

P. Hudek is a scholar working on Surfaces, Coatings and Films, Electrical and Electronic Engineering, Atomic and Molecular Physics, and Optics, Biomedical Engineering and Condensed Matter Physics, having authored 89 papers that have together received 779 indexed citations. Recurring topics across this work include Advancements in Photolithography Techniques (40 papers), Advanced Surface Polishing Techniques (19 papers), Integrated Circuits and Semiconductor Failure Analysis (16 papers), Force Microscopy Techniques and Applications (14 papers), Advanced MEMS and NEMS Technologies (14 papers), Nanofabrication and Lithography Techniques (12 papers), Electron and X-Ray Spectroscopy Techniques (11 papers) and Semiconductor materials and devices (11 papers). The work is most often cited by research in Surfaces, Coatings and Films (108 citations), Structural Biology (18 citations), Atomic and Molecular Physics, and Optics (333 citations), Electrical and Electronic Engineering (548 citations) and Biomedical Engineering (341 citations). P. Hudek has collaborated with scholars based in Germany, Slovakia and Austria. Frequent co-authors include Ivo W. Rangelow, I. Kostič, Teodor Gotszalk, F.G. Shi, Dirk Beyer, P. Grabiec, B. Volland, Frank F. Shi, Klaus Edinger and N. Abedinov. Their work appears in journals such as Microelectronic Engineering, Nuclear Instruments and Methods in Physics Research Section A Accelerators Spectrometers Detectors and Associated Equipment, Journal of Physics D Applied Physics, Materials Science and Engineering B and Journal of Micromechanics and Microengineering.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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