W.H. Bruenger

419 total citations
29 papers, 321 citations indexed

About

W.H. Bruenger is a scholar working on Electrical and Electronic Engineering, Computational Mechanics and Atomic and Molecular Physics, and Optics. According to data from OpenAlex, W.H. Bruenger has authored 29 papers receiving a total of 321 indexed citations (citations by other indexed papers that have themselves been cited), including 23 papers in Electrical and Electronic Engineering, 12 papers in Computational Mechanics and 9 papers in Atomic and Molecular Physics, and Optics. Recurrent topics in W.H. Bruenger's work include Advancements in Photolithography Techniques (17 papers), Ion-surface interactions and analysis (12 papers) and Integrated Circuits and Semiconductor Failure Analysis (12 papers). W.H. Bruenger is often cited by papers focused on Advancements in Photolithography Techniques (17 papers), Ion-surface interactions and analysis (12 papers) and Integrated Circuits and Semiconductor Failure Analysis (12 papers). W.H. Bruenger collaborates with scholars based in Germany, Austria and United States. W.H. Bruenger's co-authors include Hans Loeschner, Andreas Dietzel, G. Pirio, W. I. Milne, P. Legagneux, G.A.J. Amaratunga, G. Stengl, K. B. K. Teo, Didier Pribat and Florian Letzkus and has published in prestigious journals such as Advanced Materials, Surface and Coatings Technology and IEEE Transactions on Magnetics.

In The Last Decade

W.H. Bruenger

29 papers receiving 305 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
W.H. Bruenger Germany 9 191 110 101 85 81 29 321
A.E. Grigorescu Netherlands 6 329 1.7× 72 0.7× 307 3.0× 93 1.1× 104 1.3× 6 466
Vadim Sidorkin Netherlands 9 225 1.2× 78 0.7× 99 1.0× 36 0.4× 73 0.9× 22 314
L. P. Muray United States 12 316 1.7× 81 0.7× 175 1.7× 93 1.1× 145 1.8× 21 434
Julian Alexander Amani Germany 6 185 1.0× 387 3.5× 81 0.8× 66 0.8× 28 0.3× 9 441
Masatoshi Yasutake Japan 12 179 0.9× 122 1.1× 197 2.0× 365 4.3× 15 0.2× 33 465
Vinzenz Friedli Switzerland 11 210 1.1× 106 1.0× 90 0.9× 63 0.7× 196 2.4× 13 441
Ijaz A. Rauf United Kingdom 10 223 1.2× 254 2.3× 36 0.4× 25 0.3× 33 0.4× 26 348
T. Mollenhauer Germany 14 413 2.2× 126 1.1× 101 1.0× 130 1.5× 36 0.4× 38 465
S. Barnola France 15 467 2.4× 238 2.2× 149 1.5× 27 0.3× 38 0.5× 49 530
Thomas Trenkler Belgium 9 338 1.8× 97 0.9× 183 1.8× 355 4.2× 15 0.2× 23 452

Countries citing papers authored by W.H. Bruenger

Since Specialization
Citations

This map shows the geographic impact of W.H. Bruenger's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by W.H. Bruenger with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites W.H. Bruenger more than expected).

Fields of papers citing papers by W.H. Bruenger

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by W.H. Bruenger. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by W.H. Bruenger. The network helps show where W.H. Bruenger may publish in the future.

Co-authorship network of co-authors of W.H. Bruenger

This figure shows the co-authorship network connecting the top 25 collaborators of W.H. Bruenger. A scholar is included among the top collaborators of W.H. Bruenger based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with W.H. Bruenger. W.H. Bruenger is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Bellouard, Yves, et al.. (2008). ION BEAM PROJECTION TECHNIQUES FOR LOCALLY INDUCING INTERMIXING IN NI-TI THIN FILMS. Infoscience (Ecole Polytechnique Fédérale de Lausanne). 381–390. 1 indexed citations
2.
Bruenger, W.H., Andreas Dietzel, & Hans Loeschner. (2007). Ion projection surface structuring with noble gas ions at 75 keV. Surface and Coatings Technology. 201(19-20). 8437–8441. 5 indexed citations
3.
Dietzel, Andreas, Hans Loeschner, Elmar Platzgummer, et al.. (2003). Nanopatterning of Magnetic Disks by Single‐Step Ar+ Ion Projection. Advanced Materials. 15(14). 1152–1155. 15 indexed citations
4.
Bruenger, W.H., et al.. (2003). Resistless deposition of metallic nanostructures on ion projection sensitized p-Si. Microelectronic Engineering. 67-68. 175–181. 4 indexed citations
5.
Bruenger, W.H., et al.. (2002). Evaluation of ion projection using heavy ions suitable for resistless patterning of thin magnetic films. Microelectronic Engineering. 61-62. 295–300. 5 indexed citations
6.
Dietzel, Andreas, Rüdiger Berger, W.H. Bruenger, et al.. (2002). Ion projection direct structuring for patterning of magnetic media. IEEE Transactions on Magnetics. 38(5). 1952–1954. 25 indexed citations
7.
Merhari, Lhadi, Kenneth E. Gonsalves, Yue Hu, et al.. (2002). Nanocomposite resist systems for next generation lithography. Microelectronic Engineering. 63(4). 391–403. 27 indexed citations
8.
Milne, W. I., K. B. K. Teo, M. Chhowalla, et al.. (2001). Carbon films for use as the electron source in a parallel e-beam lithography system. Cambridge University Engineering Department Publications Database. 3 indexed citations
9.
Milne, W. I., K. B. K. Teo, Manish Chhowalla, et al.. (2001). Investigating carbon materials for use as the electron emission source in a parallel electron-beam lithography system. Current Applied Physics. 1(4-5). 317–320. 8 indexed citations
10.
Bruenger, W.H., et al.. (2000). Status of Ion Projection Lithography. MRS Proceedings. 636. 1 indexed citations
11.
Bruenger, W.H., B. D. Terris, L. Folks, et al.. (2000). Ion projection lithography for resistless patterning of thin magnetic films. Microelectronic Engineering. 53(1-4). 605–608. 11 indexed citations
12.
Bruenger, W.H., K. N. Leung, Michael D. Williams, et al.. (1999). Resolution improvement of ion projector with a low energy spread multicusp ion source. Microelectronic Engineering. 46(1-4). 477–480. 17 indexed citations
13.
Szmanda, Charles R., Robert L. Brainard, Tsutomu Tanaka, et al.. (1999). Measuring acid generation efficiency in chemically amplified resists with all three beams. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 17(6). 3356–3361. 40 indexed citations
14.
Heuberger, A. & W.H. Bruenger. (1999). Ion Projection Lithography for Nano Patterning. MRS Proceedings. 584. 3 indexed citations
15.
Bruenger, W.H., H. Löschner, K. N. Leung, et al.. (1999). Minimum ion-beam exposure-dose determination for chemically amplified resist from printed dot matrices. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 17(6). 3119–3121. 4 indexed citations
16.
Leung, K. N., et al.. (1999). Multicusp ion source for ion projection lithography. Proceedings of the 1999 Particle Accelerator Conference (Cat. No.99CH36366). 29. 2575–2577 vol.4. 1 indexed citations
17.
Bruenger, W.H., Sabrina D. Eder, T. H. Fedynyshyn, et al.. (1998). DUV resist UV II HS applied to high resolution electron beam lithography and to masked ion beam proximity and reduction printing. Microelectronic Engineering. 41-42. 237–240. 8 indexed citations
18.
Bruenger, W.H., et al.. (1997). Chemically amplified deep ultraviolet resist for positive tone ion exposure. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 15(6). 2355–2357. 8 indexed citations
19.
Bruenger, W.H., et al.. (1996). Electron-beam induced etching of resist with water vapor as the etching medium. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 14(6). 4262–4266. 13 indexed citations
20.
Stengl, G., Ivan L. Berry, John N. Randall, et al.. (1994). Ion projection: the successor to optical lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 2194. 384–384. 3 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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