T. Takahashi

660 total citations
38 papers, 486 citations indexed

About

T. Takahashi is a scholar working on Electrical and Electronic Engineering, Surfaces, Coatings and Films and Materials Chemistry. According to data from OpenAlex, T. Takahashi has authored 38 papers receiving a total of 486 indexed citations (citations by other indexed papers that have themselves been cited), including 31 papers in Electrical and Electronic Engineering, 12 papers in Surfaces, Coatings and Films and 5 papers in Materials Chemistry. Recurrent topics in T. Takahashi's work include Integrated Circuits and Semiconductor Failure Analysis (16 papers), Advancements in Photolithography Techniques (15 papers) and Electron and X-Ray Spectroscopy Techniques (11 papers). T. Takahashi is often cited by papers focused on Integrated Circuits and Semiconductor Failure Analysis (16 papers), Advancements in Photolithography Techniques (15 papers) and Electron and X-Ray Spectroscopy Techniques (11 papers). T. Takahashi collaborates with scholars based in Japan, Austria and Belgium. T. Takahashi's co-authors include Kozo Takayama, Yoshiharu Machida, Tsuneji Nagai, Yasubumi Furuya, Teiko Okazaki, Yukiko Kikuchi, Hirohisa Tanaka, Soichi Inoue, Hiroo Kinoshita and Takeo Watanabe and has published in prestigious journals such as Applied Physics Letters, International Journal of Pharmaceutics and Scripta Materialia.

In The Last Decade

T. Takahashi

38 papers receiving 457 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
T. Takahashi Japan 11 210 120 113 80 73 38 486
Valentin Pohoaţǎ Romania 15 457 2.2× 125 1.0× 5 0.0× 56 0.7× 37 0.5× 45 773
K. Kočevar Slovenia 15 79 0.4× 14 0.1× 36 0.3× 148 1.9× 255 3.5× 23 502
Béatrice Guerrier France 13 225 1.1× 45 0.4× 17 0.2× 31 0.4× 25 0.3× 26 476
Hien V. Nguyen United States 17 628 3.0× 94 0.8× 71 0.6× 184 2.3× 68 0.9× 44 925
Andreas Lenk Germany 7 56 0.3× 72 0.6× 86 0.8× 66 0.8× 17 0.2× 13 305
Christopher S. A. Musgrave Japan 6 22 0.1× 22 0.2× 52 0.5× 37 0.5× 8 0.1× 12 329
J.J.M. Slot Netherlands 14 38 0.2× 24 0.2× 24 0.2× 25 0.3× 31 0.4× 43 463
V. Granata Italy 15 89 0.4× 12 0.1× 10 0.1× 115 1.4× 257 3.5× 62 622
Max Kolb France 11 35 0.2× 24 0.2× 41 0.4× 28 0.3× 7 0.1× 18 375
В. А. Бондаренко Germany 11 150 0.7× 7 0.1× 7 0.1× 36 0.5× 38 0.5× 48 451

Countries citing papers authored by T. Takahashi

Since Specialization
Citations

This map shows the geographic impact of T. Takahashi's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by T. Takahashi with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites T. Takahashi more than expected).

Fields of papers citing papers by T. Takahashi

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by T. Takahashi. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by T. Takahashi. The network helps show where T. Takahashi may publish in the future.

Co-authorship network of co-authors of T. Takahashi

This figure shows the co-authorship network connecting the top 25 collaborators of T. Takahashi. A scholar is included among the top collaborators of T. Takahashi based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with T. Takahashi. T. Takahashi is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Hudek, P., Masahiro Hashimoto, Kazunori Ono, et al.. (2021). MBMW exposure optimization for EUV mask stacks. 24–24. 2 indexed citations
2.
Hudek, P., Masahiro Hashimoto, Kazunori Ono, et al.. (2021). Multi-beam mask writer exposure optimization for EUV mask stacks. Journal of Micro/Nanopatterning Materials and Metrology. 20(4). 5 indexed citations
3.
Kikuchi, Yukiko, T. Takahashi, Hirohisa Tanaka, et al.. (2014). Correlation study on resist outgassing between EUV and e-beam irradiation. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9048. 90482W–90482W. 2 indexed citations
4.
Takahashi, T., Yukiko Kikuchi, Hirohisa Tanaka, et al.. (2014). Contribution of EUV resist components to the non-cleanable contaminations. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9048. 904819–904819. 5 indexed citations
5.
Takahashi, T., et al.. (2013). Process development of the EUVL negative-tone imaging at EIDEC. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 8682. 86820M–86820M. 5 indexed citations
6.
Takahashi, T., et al.. (2013). Resist outgassing characterization based on the resist compositions and process. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 8679. 86792E–86792E. 7 indexed citations
7.
Takahashi, T., Yukiko Kikuchi, Hirohisa Tanaka, et al.. (2013). Comparison of Resist Family Outgassing Characterization between EUV and EB. Journal of Photopolymer Science and Technology. 26(5). 673–678. 8 indexed citations
8.
Takahashi, T., Yukiko Kikuchi, Hirohisa Tanaka, et al.. (2012). Resist outgassing characterization for qualification in high power EUV lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 8322. 83221E–83221E. 11 indexed citations
9.
Takahashi, T., Yukiko Kikuchi, Hirohisa Tanaka, et al.. (2012). Comparison of Resist Outgassing Characterization between High Power EUV and EB. Journal of Photopolymer Science and Technology. 25(5). 617–624. 12 indexed citations
10.
Tarutani, Shinji, et al.. (2011). Characterizing polymer bound PAG-type EUV resist. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7972. 79720A–79720A. 4 indexed citations
11.
Suzuki, T., Yukio Kawano, T. Takahashi, et al.. (2004). 13.2 Under 0.5W 50Gb/s Full-Rate 4:1MUX and 1:4 DEMUX in 0.13µm InP HEMT Technology. 104(175). 1–6. 4 indexed citations
12.
Mori, Tohru, et al.. (2003). Hydrodechlorination of 1,1,1-Trichloroethane over Silica-Supported Pd and Pt Catalysts Prepared by an Ion-Exchange Method. Journal of Ion Exchange. 14(Supplement). 401–404. 3 indexed citations
13.
Shima, Kunihiro, Satoshi Ishii, T. Takahashi, & I. Sugai. (2001). Optimum thickness of carbon stripper foils in tandem accelerator in view of transmission and lifetime. Nuclear Instruments and Methods in Physics Research Section A Accelerators Spectrometers Detectors and Associated Equipment. 460(2-3). 233–238. 5 indexed citations
14.
Kiwamoto, Y., Y. Tatematsu, T. Saito, et al.. (1997). Thermographic temperature determination of gray materials with an infrared camera in different environments. Review of Scientific Instruments. 68(6). 2422–2427. 4 indexed citations
15.
Ishii, K., Y Katsuki, Akira ABE, et al.. (1996). A new method of radial potential profile measurement utilizing magnetic field gradient near a mirror throat. Review of Scientific Instruments. 67(5). 1822–1828. 7 indexed citations
16.
Yoshimura, Y., T. Saito, Y. Kiwamoto, et al.. (1996). Axial and Radial Potential Distributions in the GAMMA10 Tandem Mirror. Journal of the Physical Society of Japan. 65(4). 902–904. 6 indexed citations
17.
Ueda, Satoshi, Rinta Ibuki, Sumihisa Kimura, et al.. (1994). Development of a Novel Drug Release System, Time-Controlled Explosion System(TES). III. Relation between Lag Time and Membrane Thickness.. Chemical and Pharmaceutical Bulletin. 42(2). 364–367. 36 indexed citations
18.
Nakayama, Yoshikazu, T. Takahashi, Keiji Watanabe, & Takao Kawamura. (1989). Structure of interfaces in a-Si:H/a-Si3N4:H multilayers produced by plasma CVD. Journal of Non-Crystalline Solids. 114. 747–749. 1 indexed citations
19.
Fujiyama, Hiroshi, et al.. (1987). Profile control of SiH radicals by cross magnetic field in plasma processing. Applied Physics Letters. 50(19). 1322–1324. 18 indexed citations
20.
Yamamoto, Y., H. Kobayashi, T. Takahashi, & T. Inada. (1985). Influence of implantation induced damage in sapphire upon improvement of crystalline quality of silicon on sapphire. Applied Physics Letters. 47(12). 1315–1317. 1 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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