H. Löschner

438 total citations
44 papers, 255 citations indexed

About

H. Löschner is a scholar working on Electrical and Electronic Engineering, Biomedical Engineering and Computational Mechanics. According to data from OpenAlex, H. Löschner has authored 44 papers receiving a total of 255 indexed citations (citations by other indexed papers that have themselves been cited), including 42 papers in Electrical and Electronic Engineering, 20 papers in Biomedical Engineering and 12 papers in Computational Mechanics. Recurrent topics in H. Löschner's work include Advancements in Photolithography Techniques (32 papers), Ion-surface interactions and analysis (11 papers) and Advanced Surface Polishing Techniques (10 papers). H. Löschner is often cited by papers focused on Advancements in Photolithography Techniques (32 papers), Ion-surface interactions and analysis (11 papers) and Advanced Surface Polishing Techniques (10 papers). H. Löschner collaborates with scholars based in Austria, United States and Germany. H. Löschner's co-authors include G. Stengl, Peter Wolf, A. Chalupka, Wilhelm Maurer, J. C. Wolfe, Ivo W. Rangelow, Peter Wolf, G. Stangl, Robert E. Sacher and Ladislav Malek and has published in prestigious journals such as Applied Physics Letters, Journal of Applied Physics and Journal of Microelectromechanical Systems.

In The Last Decade

H. Löschner

42 papers receiving 236 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
H. Löschner Austria 9 209 119 78 59 40 44 255
Chengkun Wu China 9 187 0.9× 144 1.2× 158 2.0× 43 0.7× 22 0.6× 16 349
Mototaka Kamoshida Japan 10 232 1.1× 23 0.2× 69 0.9× 62 1.1× 21 0.5× 34 281
Janusz Bogdanowicz Belgium 12 197 0.9× 191 1.6× 51 0.7× 144 2.4× 17 0.4× 42 360
A. Grouillet France 11 257 1.2× 33 0.3× 58 0.7× 68 1.2× 13 0.3× 35 290
B. Mizuno Japan 11 305 1.5× 33 0.3× 54 0.7× 71 1.2× 19 0.5× 41 353
Jiří Mužík Czechia 10 152 0.7× 48 0.4× 80 1.0× 110 1.9× 57 1.4× 28 272
L. M. Ephrath United States 11 356 1.7× 54 0.5× 74 0.9× 78 1.3× 29 0.7× 16 400
James Natoli France 8 90 0.4× 56 0.5× 89 1.1× 84 1.4× 7 0.2× 10 197
R. Beneyton France 9 224 1.1× 58 0.5× 20 0.3× 94 1.6× 10 0.3× 34 274
Christophe Maleville France 11 463 2.2× 102 0.9× 49 0.6× 78 1.3× 8 0.2× 53 503

Countries citing papers authored by H. Löschner

Since Specialization
Citations

This map shows the geographic impact of H. Löschner's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by H. Löschner with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites H. Löschner more than expected).

Fields of papers citing papers by H. Löschner

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by H. Löschner. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by H. Löschner. The network helps show where H. Löschner may publish in the future.

Co-authorship network of co-authors of H. Löschner

This figure shows the co-authorship network connecting the top 25 collaborators of H. Löschner. A scholar is included among the top collaborators of H. Löschner based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with H. Löschner. H. Löschner is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Kümmel, M., et al.. (2002). Ion projection lithography below 70 nm: tool performance and resist process. Microelectronic Engineering. 61-62. 301–307. 10 indexed citations
2.
Löschner, H., et al.. (2001). Resist process development for sub-100-nm ion projection lithography. Microelectronic Engineering. 57-58. 517–524. 7 indexed citations
3.
Hudek, P., Milan Držík, I. Kostič, et al.. (1999). Directly sputtered stress-compensated carbon protective layer for silicon stencil masks. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 17(6). 3127–3131. 8 indexed citations
4.
Vonach, H., H. Löschner, G. Stengl, et al.. (1999). Experimental results of the stochastic Coulomb interaction in ion projection lithography. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 17(6). 3098–3106. 10 indexed citations
5.
Engelstad, Roxann L., et al.. (1999). Finite element simulation of ion-beam lithography mask fabrication. Microelectronic Engineering. 46(1-4). 485–488. 5 indexed citations
6.
Lovell, Edward G., et al.. (1998). Optimization of the temperature distribution across stencil mask membranes under ion beam exposure. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 16(6). 3602–3605. 3 indexed citations
7.
Rangelow, Ivo W., F.G. Shi, P. Hudek, et al.. (1996). Silicon stencil masks for masked ion beam lithography proximity printing. Microelectronic Engineering. 30(1-4). 257–260. 6 indexed citations
8.
Löschner, H., et al.. (1996). Masked ion beam lithography for proximity printing. Microelectronic Engineering. 30(1-4). 241–244. 3 indexed citations
9.
Wolfe, J. C., et al.. (1995). Distortion analysis of stencil masks with stress-relief structures. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 13(6). 2613–2617. 2 indexed citations
10.
Löschner, H., et al.. (1993). Ion projection lithography for vacuum microelectronics. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 11(2). 487–492. 8 indexed citations
11.
Löschner, H., G. Stengl, A. Chalupka, et al.. (1993). Projection ion beam lithography. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 11(6). 2409–2415. 11 indexed citations
12.
Stengl, G., G. Van den bosch, A. Chalupka, et al.. (1992). In situ distortion measurement of an ion projector with 5× ion-optical reduction. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 10(6). 2838–2841. 7 indexed citations
13.
Chalupka, A., et al.. (1992). Progress in ion projection lithography. Microelectronic Engineering. 17(1-4). 229–240. 8 indexed citations
14.
Schnakenberg, Uwe, et al.. (1992). Lithography with high depth of focus by an ion projection system. Journal of Microelectromechanical Systems. 1(3). 116–120. 3 indexed citations
15.
Wolfe, J. C., et al.. (1989). Fabrication of low-stress silicon stencil masks for ion beam lithography. Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena. 7(6). 1802–1805. 2 indexed citations
16.
Stengl, G., H. Löschner, Wilhelm Maurer, & Peter Wolf. (1986). Ion projection lithography machine IPLM-01: A new tool for sub-0.5-micron modification of materials. Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena. 4(1). 194–200. 16 indexed citations
17.
Stangl, G., F. Rüdenauer, G. Stengl, et al.. (1985). Fabrication of submicron deep ultraviolet masks by ion microprojection. Applied Physics Letters. 47(12). 1358–1360. 8 indexed citations
18.
Stengl, G., H. Löschner, Wilhelm Maurer, & Peter Wolf. (1985). Current Status Of Ion Projection Lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 537. 138–138. 2 indexed citations
19.
Stengl, G., et al.. (1979). Ion projection system for IC production. Journal of Vacuum Science and Technology. 16(6). 1883–1885. 14 indexed citations
20.
Löschner, H.. (1972). Anisotropic hot-electron microwave conductivity of n-InSb at 84 K and 134 GHz. Journal of Applied Physics. 43(8). 3585–3586. 8 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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