Evi Vrancken

525 total citations
10 papers, 183 citations indexed

About

Evi Vrancken is a scholar working on Electrical and Electronic Engineering, Atomic and Molecular Physics, and Optics and Biomedical Engineering. According to data from OpenAlex, Evi Vrancken has authored 10 papers receiving a total of 183 indexed citations (citations by other indexed papers that have themselves been cited), including 9 papers in Electrical and Electronic Engineering, 3 papers in Atomic and Molecular Physics, and Optics and 3 papers in Biomedical Engineering. Recurrent topics in Evi Vrancken's work include Semiconductor materials and devices (7 papers), Advancements in Semiconductor Devices and Circuit Design (4 papers) and Advanced Surface Polishing Techniques (3 papers). Evi Vrancken is often cited by papers focused on Semiconductor materials and devices (7 papers), Advancements in Semiconductor Devices and Circuit Design (4 papers) and Advanced Surface Polishing Techniques (3 papers). Evi Vrancken collaborates with scholars based in Belgium, Taiwan and United Kingdom. Evi Vrancken's co-authors include Marc Heyns, Marc Meuris, D.P. Brunco, Matty Caymax, Brice De Jaeger, Jan Van Steenbergen, Michel Houssa, Sonja Sioncke, K. De Meyer and Jason Lin and has published in prestigious journals such as IEEE Electron Device Letters, ECS Transactions and Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena.

In The Last Decade

Evi Vrancken

10 papers receiving 179 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Evi Vrancken Belgium 6 173 61 41 38 7 10 183
R. Schreutelkamp Belgium 10 257 1.5× 51 0.8× 41 1.0× 39 1.0× 10 1.4× 31 276
A. Opdebeeck Belgium 4 119 0.7× 26 0.4× 33 0.8× 21 0.6× 8 1.1× 4 130
M. Paoli France 8 404 2.3× 80 1.3× 23 0.6× 28 0.7× 5 0.7× 17 416
L. Pain France 8 143 0.8× 74 1.2× 34 0.8× 15 0.4× 6 0.9× 31 178
D. Lacey United States 8 278 1.6× 37 0.6× 21 0.5× 30 0.8× 4 0.6× 14 282
P. Gouraud France 5 115 0.7× 63 1.0× 29 0.7× 25 0.7× 14 2.0× 25 148
C. Bowen United States 6 168 1.0× 44 0.7× 60 1.5× 42 1.1× 11 1.6× 14 211
J.P. Colinge Belgium 14 479 2.8× 98 1.6× 52 1.3× 84 2.2× 4 0.6× 38 498
C. Surisetty United States 8 86 0.5× 84 1.4× 57 1.4× 32 0.8× 5 0.7× 11 132
N. Loubet United States 8 230 1.3× 65 1.1× 40 1.0× 28 0.7× 3 0.4× 15 249

Countries citing papers authored by Evi Vrancken

Since Specialization
Citations

This map shows the geographic impact of Evi Vrancken's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Evi Vrancken with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Evi Vrancken more than expected).

Fields of papers citing papers by Evi Vrancken

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Evi Vrancken. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Evi Vrancken. The network helps show where Evi Vrancken may publish in the future.

Co-authorship network of co-authors of Evi Vrancken

This figure shows the co-authorship network connecting the top 25 collaborators of Evi Vrancken. A scholar is included among the top collaborators of Evi Vrancken based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Evi Vrancken. Evi Vrancken is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

10 of 10 papers shown
1.
Sioncke, Sonja, Claudia Fleischmann, Dennis Lin, et al.. (2012). S-Passivation of the Ge Gate Stack Using (NH<sub>4</sub>)<sub>2</sub>S. Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena. 187. 23–26. 1 indexed citations
2.
Mitard, Jérôme, Florence Bellenger, Brice De Jaeger, et al.. (2011). Investigation of the Electrical Properties of Ge/High-k Gate Stack: GeO<sub>2</sub> VS Si-cap. 2 indexed citations
3.
Bellenger, Florence, Brice De Jaeger, Clément Merckling, et al.. (2010). High FET Performance for a Future CMOS $\hbox{GeO}_{2}$ -Based Technology. IEEE Electron Device Letters. 31(5). 402–404. 49 indexed citations
4.
Sioncke, Sonja, D.P. Brunco, Marc Meuris, et al.. (2009). Etch Rate Study of Germanium, GaAs and InGaAs: A Challenge in Semiconductor Processing. Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena. 145-146. 203–206. 14 indexed citations
5.
Sioncke, Sonja, D.P. Brunco, Marc Meuris, et al.. (2008). Etch Rates of Ge, GaAs and InGaAs in Acids, Bases and Peroxide Based Mixtures. ECS Transactions. 16(10). 451–460. 28 indexed citations
6.
Mitard, Jérôme, Brice De Jaeger, Frederik Leys, et al.. (2008). Record I<inf>ON</inf>/I<inf>OFF</inf> performance for 65nm Ge pMOSFET and novel Si passivation scheme for improved EOT scalability. 1–4. 43 indexed citations
7.
Mitard, Jérôme, Michel Houssa, Geert Eneman, et al.. (2006). Impact of EOT scaling down to 0.85nm on 70nm Ge-pFETs technology with STI. Symposium on VLSI Technology. 82–83. 35 indexed citations
8.
Fyen, Wim, Rita Vos, Ivo Teerlinck, et al.. (2000). Cleaning, rinsing and drying effects in post-Cu CMP clean. 507. 1 indexed citations
9.
Meuris, Marc, Evi Vrancken, N. Heylen, et al.. (1999). Modelling the influence of pad bending on the planarization performance during CMP. MRS Proceedings. 566. 8 indexed citations
10.
Devriendt, K., Evi Vrancken, N. Heylen, et al.. (1998). Relation between Oxide-CMP Induced Defects and Post-CMP Cleaning Strategies. Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena. 65-66. 173–176. 2 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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