L. Pain

431 total citations
31 papers, 178 citations indexed

About

L. Pain is a scholar working on Electrical and Electronic Engineering, Surfaces, Coatings and Films and Biomedical Engineering. According to data from OpenAlex, L. Pain has authored 31 papers receiving a total of 178 indexed citations (citations by other indexed papers that have themselves been cited), including 29 papers in Electrical and Electronic Engineering, 15 papers in Surfaces, Coatings and Films and 15 papers in Biomedical Engineering. Recurrent topics in L. Pain's work include Advancements in Photolithography Techniques (28 papers), Electron and X-Ray Spectroscopy Techniques (14 papers) and Integrated Circuits and Semiconductor Failure Analysis (11 papers). L. Pain is often cited by papers focused on Advancements in Photolithography Techniques (28 papers), Electron and X-Ray Spectroscopy Techniques (14 papers) and Integrated Circuits and Semiconductor Failure Analysis (11 papers). L. Pain collaborates with scholars based in France, Japan and Switzerland. L. Pain's co-authors include David del Rio, Hervé Fontaine, Christophe Navarro, Xavier Chevalier, Cristina Ribeiro, C. Gourgon, S. Tedesco, M. Elena Martín, Raluca Tiron and Georges Hadziioannou and has published in prestigious journals such as Journal of Materials Science, Japanese Journal of Applied Physics and Microelectronic Engineering.

In The Last Decade

L. Pain

30 papers receiving 161 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
L. Pain France 8 143 74 55 34 15 31 178
P. Gouraud France 5 115 0.8× 63 0.9× 22 0.4× 29 0.9× 25 1.7× 25 148
S. Baudot France 8 134 0.9× 42 0.6× 13 0.2× 30 0.9× 35 2.3× 24 160
Yin-Jung Chang Taiwan 8 172 1.2× 84 1.1× 44 0.8× 20 0.6× 43 2.9× 34 194
Yusuke Oniki Belgium 8 257 1.8× 46 0.6× 14 0.3× 60 1.8× 27 1.8× 32 282
Mitsuhiro Omura Japan 8 169 1.2× 51 0.7× 10 0.2× 90 2.6× 13 0.9× 17 198
E. Ferry United States 8 143 1.0× 104 1.4× 67 1.2× 14 0.4× 54 3.6× 17 207
F.N. Cubaynes Belgium 9 369 2.6× 60 0.8× 10 0.2× 48 1.4× 34 2.3× 26 388
T. Grabolla Germany 10 224 1.6× 47 0.6× 11 0.2× 63 1.9× 42 2.8× 31 263
Chulchae Choi United States 6 342 2.4× 102 1.4× 17 0.3× 10 0.3× 54 3.6× 11 353
E. Dentoni Litta Belgium 12 414 2.9× 50 0.7× 12 0.2× 106 3.1× 53 3.5× 69 469

Countries citing papers authored by L. Pain

Since Specialization
Citations

This map shows the geographic impact of L. Pain's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by L. Pain with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites L. Pain more than expected).

Fields of papers citing papers by L. Pain

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by L. Pain. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by L. Pain. The network helps show where L. Pain may publish in the future.

Co-authorship network of co-authors of L. Pain

This figure shows the co-authorship network connecting the top 25 collaborators of L. Pain. A scholar is included among the top collaborators of L. Pain based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with L. Pain. L. Pain is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Teyssèdre, H., et al.. (2016). Critical dimension uniformity characterization of nanoimprinted trenches for high volume manufacturing qualification. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 10032. 100320M–100320M. 3 indexed citations
2.
Jussot, Julien, et al.. (2014). Line width roughness reduction strategies for patterns exposed via electron beam lithography. HAL (Le Centre pour la Communication Scientifique Directe). 6 indexed citations
3.
Pain, L., Takahiro Nakayama, Akira Miyake, et al.. (2014). Investigation of the resist outgassing and hydrocarbonaceous contamination induced in multi-electron-beam lithography tools. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9049. 90492Q–90492Q. 4 indexed citations
4.
Pain, L., et al.. (2014). Assessment of carbon layer growth induced by resists outgassing in multi e-beams lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9235. 923520–923520. 3 indexed citations
5.
Wieland, Marco, et al.. (2013). Matching of beams on the MAPPER MATRIX tool: a simulation study. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 8680. 86800J–86800J. 6 indexed citations
6.
Tiron, Raluca, et al.. (2013). Resist outgassing assessment for multi electron beams lithography. Microelectronic Engineering. 125. 58–61. 4 indexed citations
7.
Pain, L., et al.. (2011). IMAGINE: an open consortium to boost maskless lithography take off: first assessment results on MAPPER technology. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7970. 79700Y–79700Y. 8 indexed citations
8.
Orobtchouk, R., et al.. (2010). Multiple pass exposure in e-beam lithography: application to the sub-22nm nodes. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7637. 76370E–76370E. 5 indexed citations
9.
Rio, David del, et al.. (2010). 5 kV multielectron beam lithography: MAPPER tool and resist process characterization. Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena. 28(6). C6C14–C6C20. 16 indexed citations
10.
Pain, L., et al.. (2010). Aging study in advanced photomasks: impact of EFM effects on lithographic performance with MoSi binary and 6% attenuated PSM masks. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7823. 78230N–78230N. 4 indexed citations
11.
Orobtchouk, Régis, et al.. (2009). New writing strategy in electron beam direct write lithography to improve critical dense lines patterning for sub-45nm nodes. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7470. 74700R–74700R. 4 indexed citations
12.
Takizawa, Masaya, et al.. (2009). Cell projection use in maskless lithography for 45nm and 32nm logic nodes. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7271. 72710K–72710K. 5 indexed citations
13.
Rio, David del, et al.. (2009). Development of resist process for 5-KV multi-beam technology. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7271. 72710R–72710R. 3 indexed citations
14.
Orobtchouk, R., et al.. (2009). Development of multiple pass exposure in electron beam direct write lithography for sub-32nm nodes. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7488. 74881C–74881C. 2 indexed citations
15.
Pain, L., et al.. (2006). New Electron Beam Proximity Effects Correction Approach for 45 and 32 nm Nodes. Japanese Journal of Applied Physics. 45(8R). 6462–6462. 3 indexed citations
16.
Pain, L., et al.. (2006). Transitioning of direct e-beam write technology from research and development into production flow. Microelectronic Engineering. 83(4-9). 749–753. 7 indexed citations
17.
18.
Mollard, L., S. Tedesco, B. Dal’zotto, et al.. (2001). Hybrid deep UV–e-beam lithography for the fabrication of dual damascene structures. Microelectronic Engineering. 57-58. 269–275.
19.
Pain, L., Craig Higgins, S. Tedesco, et al.. (2000). Resolution limit of negative tone chemically amplified resist used for hybrid lithography: Influence of the molecular weight. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 18(6). 3388–3395. 14 indexed citations
20.
Pain, L., et al.. (1969). MEASUREMENT OF (n,2n) AND (n,3n) CROSS SECTIONS AT 14-MeV INCIDENT ENERGY.. OSTI OAI (U.S. Department of Energy Office of Scientific and Technical Information). 5 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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