Udo Schwalke

1.7k total citations
124 papers, 1.4k citations indexed

About

Udo Schwalke is a scholar working on Electrical and Electronic Engineering, Materials Chemistry and Biomedical Engineering. According to data from OpenAlex, Udo Schwalke has authored 124 papers receiving a total of 1.4k indexed citations (citations by other indexed papers that have themselves been cited), including 98 papers in Electrical and Electronic Engineering, 53 papers in Materials Chemistry and 35 papers in Biomedical Engineering. Recurrent topics in Udo Schwalke's work include Semiconductor materials and devices (75 papers), Advancements in Semiconductor Devices and Circuit Design (60 papers) and Integrated Circuits and Semiconductor Failure Analysis (30 papers). Udo Schwalke is often cited by papers focused on Semiconductor materials and devices (75 papers), Advancements in Semiconductor Devices and Circuit Design (60 papers) and Integrated Circuits and Semiconductor Failure Analysis (30 papers). Udo Schwalke collaborates with scholars based in Germany, United States and Belgium. Udo Schwalke's co-authors include G. Groeseneken, E. Cartier, A. Kerber, L. Pantisano, R. Degraeve, H.E. Maes, J. E. Parmeter, T. Kauerauf, M. Kerber and Tuo‐Hung Hou and has published in prestigious journals such as Journal of the American Chemical Society, The Journal of Chemical Physics and Applied Physics Letters.

In The Last Decade

Udo Schwalke

116 papers receiving 1.3k citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Udo Schwalke Germany 18 1.2k 467 198 189 67 124 1.4k
A. Keffous Algeria 17 681 0.6× 554 1.2× 195 1.0× 207 1.1× 16 0.2× 88 906
Antoine Tiberj France 17 396 0.3× 597 1.3× 249 1.3× 190 1.0× 110 1.6× 40 915
Marvin Hartwig Zoellner Germany 15 368 0.3× 390 0.8× 217 1.1× 145 0.8× 97 1.4× 52 709
Sandrine Rivillon United States 14 443 0.4× 411 0.9× 215 1.1× 162 0.9× 37 0.6× 24 724
Jong Duk Lee South Korea 16 836 0.7× 500 1.1× 115 0.6× 111 0.6× 23 0.3× 91 1.0k
Fernando Salazar Mexico 14 321 0.3× 582 1.2× 103 0.5× 57 0.3× 85 1.3× 49 697
Janakiraman Balachandran United States 13 419 0.4× 353 0.8× 150 0.8× 55 0.3× 25 0.4× 17 604
Chun Zhou China 15 700 0.6× 562 1.2× 141 0.7× 69 0.4× 16 0.2× 48 964
Jiaxin Liu China 14 442 0.4× 541 1.2× 269 1.4× 208 1.1× 14 0.2× 40 953
H. Menari Algeria 15 511 0.4× 380 0.8× 174 0.9× 134 0.7× 9 0.1× 71 672

Countries citing papers authored by Udo Schwalke

Since Specialization
Citations

This map shows the geographic impact of Udo Schwalke's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Udo Schwalke with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Udo Schwalke more than expected).

Fields of papers citing papers by Udo Schwalke

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Udo Schwalke. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Udo Schwalke. The network helps show where Udo Schwalke may publish in the future.

Co-authorship network of co-authors of Udo Schwalke

This figure shows the co-authorship network connecting the top 25 collaborators of Udo Schwalke. A scholar is included among the top collaborators of Udo Schwalke based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Udo Schwalke. Udo Schwalke is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
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Schwalke, Udo, et al.. (2015). Silicon CMOS compatible in situ CCVD growth of graphene on silicon nitride. TUbilio (Technical University of Darmstadt). 324. 1–3.
4.
Schwalke, Udo, et al.. (2014). An electrostatically doped planar device concept. 1–4. 1 indexed citations
5.
Schwalke, Udo, et al.. (2012). Dopant-free CMOS: A new device concept. 1–3. 3 indexed citations
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Schwalke, Udo, et al.. (2007). Evaluation of MOSFETs with crystalline high-k gate-dielectrics: device simulation and experimental data. Journal of Telecommunications and Information Technology. 78–85. 3 indexed citations
8.
Schwalke, Udo, et al.. (2007). Self-Aligned Fabrication Process Based on Sacrificial Catalyst for Pd-Contacted Carbon Nanotube Field-Effect Transistors. ECS Transactions. 11(8). 53–61. 2 indexed citations
9.
Schwalke, Udo, et al.. (2007). Electrical characterization of crystalline Gd2O3 gate dielectric MOSFETs fabricated by damascene metal gate technology. Microelectronics Reliability. 47(4-5). 528–531. 10 indexed citations
10.
Schwalke, Udo. (2005). Gate dielectrics: process integration issues and electrical properties. Journal of Telecommunications and Information Technology. 7–10. 1 indexed citations
11.
Kerber, A., E. Cartier, R. Degraeve, et al.. (2003). Charge Trapping and Dielectric Reliability of SiO2/Al2O3 Gate Stacks with TiN Electrodes. Microelectronic Engineering. 50(5). 1261–1269. 46 indexed citations
12.
Schwalke, Udo, et al.. (2002). A dielectric isolated high-voltage IC-technology for off-line applications. 33. 325–329. 14 indexed citations
13.
Burenkov, A., et al.. (1999). Investigation of the Suppression of the Narrow Channel Effect in Deep Sub-Micron EXTIGATE Transistors. Publikationsdatenbank der Fraunhofer-Gesellschaft (Fraunhofer-Gesellschaft). 1. 684–687. 2 indexed citations
14.
Schwalke, Udo, et al.. (1999). Gate-Prior-To-Isolation Cmos-Technology with Through-The-Gate-Implanted Ultra-Thin Gate Oxides. MRS Proceedings. 567. 1 indexed citations
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Schwalke, Udo, et al.. (1999). Corner-parasitics-free low-cost trench isolation. IEEE Electron Device Letters. 20(11). 563–565. 3 indexed citations
16.
Schwalke, Udo, et al.. (1998). Optimization of Critical Ion Implantation Steps in 0.18 um CMOS Technology. European Solid-State Device Research Conference. 92–95. 2 indexed citations
17.
Kerber, M., Udo Schwalke, & Robert Heinrich. (1997). Low-Cost CMOS Process with Complete Post-Gate Implantation Scheme. European Solid-State Device Research Conference. 400–403. 1 indexed citations
18.
Schwalke, Udo & M. Kerber. (1991). Effect of oxidation processing on the energy distribution and charging time of radiation-induced interface traps. Applied Physics Letters. 58(16). 1774–1776. 3 indexed citations
19.
Schwalke, Udo, et al.. (1990). Hot Carrier Relief of Metal Oxide Semiconductor Field Effect Transistor by Using Work-Function Engineering. Japanese Journal of Applied Physics. 29(12A). L2286–L2286. 4 indexed citations
20.
Mazuré, C., et al.. (1988). INFLUENCE OF THE FABRICATION CONDITIONS ON THE p+-TaSi2/POLY-Si GATE QUALITY. Le Journal de Physique Colloques. 49(C4). C4–405. 1 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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