J. Lorenz

933 total citations
86 papers, 655 citations indexed

About

J. Lorenz is a scholar working on Electrical and Electronic Engineering, Computational Mechanics and Mechanics of Materials. According to data from OpenAlex, J. Lorenz has authored 86 papers receiving a total of 655 indexed citations (citations by other indexed papers that have themselves been cited), including 72 papers in Electrical and Electronic Engineering, 14 papers in Computational Mechanics and 12 papers in Mechanics of Materials. Recurrent topics in J. Lorenz's work include Semiconductor materials and devices (45 papers), Advancements in Semiconductor Devices and Circuit Design (36 papers) and Silicon and Solar Cell Technologies (23 papers). J. Lorenz is often cited by papers focused on Semiconductor materials and devices (45 papers), Advancements in Semiconductor Devices and Circuit Design (36 papers) and Silicon and Solar Cell Technologies (23 papers). J. Lorenz collaborates with scholars based in Germany, Austria and France. J. Lorenz's co-authors include H. Ryssel, David Cahen, Rami Cohen, Y. Rosenwaks, Abraham Shanzer, Arthur B. Ellis, Leeor Kronik, S. Selberherr, Peter Evanschitzky and A. Burenkov and has published in prestigious journals such as Journal of the American Chemical Society, Applied Surface Science and IEEE Transactions on Industry Applications.

In The Last Decade

J. Lorenz

82 papers receiving 635 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
J. Lorenz Germany 13 513 137 90 87 85 86 655
Jonathan Roberts United Kingdom 9 249 0.5× 228 1.7× 27 0.3× 87 1.0× 154 1.8× 16 498
M. Toledano-Luque Belgium 26 1.9k 3.6× 384 2.8× 52 0.6× 204 2.3× 70 0.8× 101 2.0k
B.P. Linder United States 22 1.8k 3.4× 251 1.8× 40 0.4× 150 1.7× 68 0.8× 85 1.8k
N. Konofaos Greece 18 739 1.4× 418 3.1× 23 0.3× 278 3.2× 92 1.1× 85 938
Joo Tae Moon South Korea 15 683 1.3× 371 2.7× 17 0.2× 71 0.8× 82 1.0× 61 806
T. Sugii Japan 21 1.3k 2.5× 139 1.0× 56 0.6× 221 2.5× 102 1.2× 116 1.3k
P. Packan United States 18 1.0k 2.0× 184 1.3× 43 0.5× 163 1.9× 101 1.2× 32 1.1k
F. White United States 12 810 1.6× 528 3.9× 27 0.3× 291 3.3× 52 0.6× 20 922
Khaled Ahmed United States 20 1.5k 2.9× 435 3.2× 35 0.4× 218 2.5× 177 2.1× 69 1.7k
Hui Zhu China 15 509 1.0× 226 1.6× 12 0.1× 131 1.5× 60 0.7× 84 672

Countries citing papers authored by J. Lorenz

Since Specialization
Citations

This map shows the geographic impact of J. Lorenz's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by J. Lorenz with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites J. Lorenz more than expected).

Fields of papers citing papers by J. Lorenz

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by J. Lorenz. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by J. Lorenz. The network helps show where J. Lorenz may publish in the future.

Co-authorship network of co-authors of J. Lorenz

This figure shows the co-authorship network connecting the top 25 collaborators of J. Lorenz. A scholar is included among the top collaborators of J. Lorenz based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with J. Lorenz. J. Lorenz is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Lorenz, J., Eberhard Bär, Sylvain Barraud, et al.. (2018). Process Variability—Technological Challenge and Design Issue for Nanoscale Devices. Micromachines. 10(1). 6–6. 13 indexed citations
2.
Evanschitzky, Peter, J. Lorenz, Rainer Minixhofer, et al.. (2014). Coupled simulation to determine the impact of across wafer variations in oxide PECVD on electrical and reliability parameters of through-silicon vias. Microelectronic Engineering. 137. 141–145. 8 indexed citations
3.
Lorenz, J., et al.. (2014). Simulation of AsH3 plasma immersion ion implantation into silicon. Fraunhofer-Publica (Fraunhofer-Gesellschaft). 1496. 1–4. 1 indexed citations
4.
Rommel, Mathias, J. Lorenz, P. Pichler, et al.. (2013). Melt depth and time variations during pulsed laser thermal annealing with one and more pulses. Publikationsdatenbank der Fraunhofer-Gesellschaft (Fraunhofer-Gesellschaft). 16. 214–217.
5.
Koffel, S., P. Pichler, J. Lorenz, et al.. (2013). On the strain induced by arsenic into silicon. Fraunhofer-Publica (Fraunhofer-Gesellschaft). 101. 206–209. 1 indexed citations
6.
Lorenz, J., et al.. (2011). Einführung in die hethitische Sprache und Schrift. 1 indexed citations
7.
Lorenz, J., et al.. (2011). Self-heating effects in nano-scaled MOSFETs and thermal aware compact models. Publikationsdatenbank der Fraunhofer-Gesellschaft (Fraunhofer-Gesellschaft). 1–2. 4 indexed citations
8.
Lorenz, J., et al.. (2010). Coupling of Monte Carlo sputter simulation and feature-scale profile simulation and application to the simulation of back etching of an intermetal dielectric. Fraunhofer-Publica (Fraunhofer-Gesellschaft). 53–56. 1 indexed citations
9.
Lorenz, J., et al.. (2008). <title>Physically based simulation of fully depleted SOI MOS transistors at nanometer gate lengths</title>. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 70251J–70251J. 1 indexed citations
10.
Fühner, Tim, et al.. (2008). On the stability of fully depleted SOI MOSFETs under lithography process variations. Publikationsdatenbank der Fraunhofer-Gesellschaft (Fraunhofer-Gesellschaft). 6520. 194–197. 2 indexed citations
11.
Fritzsche, Bernd, et al.. (2005). On an Extension Problem for Contractive Block Hankel Operator Matrices. Analysis. 25(1). 23–54. 2 indexed citations
12.
Lorenz, J., et al.. (2002). Simulation of the influence of via sidewall tapering on step coverage of sputter-deposited barrier layers. Microelectronic Engineering. 64(1-4). 321–328. 18 indexed citations
13.
Burenkov, A., et al.. (1999). Investigation of the Suppression of the Narrow Channel Effect in Deep Sub-Micron EXTIGATE Transistors. Publikationsdatenbank der Fraunhofer-Gesellschaft (Fraunhofer-Gesellschaft). 1. 684–687. 2 indexed citations
14.
Lorenz, J., et al.. (1999). Eine rechenzeiteffiziente Methode für die dreidimensionale Simulation. Fraunhofer-Publica (Fraunhofer-Gesellschaft). 3 indexed citations
15.
Schwalke, Udo, et al.. (1998). Optimization of Critical Ion Implantation Steps in 0.18 um CMOS Technology. European Solid-State Device Research Conference. 92–95. 2 indexed citations
16.
Lorenz, J., et al.. (1996). Three-dimensional process simulation. Microelectronic Engineering. 34(1). 85–100. 6 indexed citations
17.
Lorenz, J., et al.. (1996). 3-D simulation of LPCVD using segment-based topography discretization. IEEE Transactions on Semiconductor Manufacturing. 9(1). 67–73. 18 indexed citations
18.
Crean, G.M., et al.. (1991). Comparison of models for the calculation of ion implantation moments of implanted boron, phosphorus and arsenic dopants in thin film silicides. Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms. 55(1-4). 763–768.
19.
Ryssel, H., et al.. (1989). Improvements in simulation of 2D implantation profiles. 14. 102–105. 2 indexed citations
20.
Lorenz, J., et al.. (1989). Two-dimensional simulation of ion implantation profiles using a personal computer. Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms. 37-38. 312–316. 4 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

Explore authors with similar magnitude of impact

Rankless by CCL
2026