Markus P. Benk

415 total citations
45 papers, 282 citations indexed

About

Markus P. Benk is a scholar working on Electrical and Electronic Engineering, Surfaces, Coatings and Films and Radiation. According to data from OpenAlex, Markus P. Benk has authored 45 papers receiving a total of 282 indexed citations (citations by other indexed papers that have themselves been cited), including 38 papers in Electrical and Electronic Engineering, 29 papers in Surfaces, Coatings and Films and 28 papers in Radiation. Recurrent topics in Markus P. Benk's work include Advancements in Photolithography Techniques (37 papers), Electron and X-Ray Spectroscopy Techniques (29 papers) and Advanced X-ray Imaging Techniques (26 papers). Markus P. Benk is often cited by papers focused on Advancements in Photolithography Techniques (37 papers), Electron and X-Ray Spectroscopy Techniques (29 papers) and Advanced X-ray Imaging Techniques (26 papers). Markus P. Benk collaborates with scholars based in United States, Germany and Belgium. Markus P. Benk's co-authors include K. Bergmann, Kenneth A. Goldberg, Antoine Wojdyla, Patrick Naulleau, David Schäfer, Thomas Wilhein, Obert R. Wood, Pawitter J. S. Mangat, Weilun Chao and David Johnson and has published in prestigious journals such as Journal of Applied Physics, Scientific Reports and Optics Letters.

In The Last Decade

Markus P. Benk

41 papers receiving 262 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Markus P. Benk United States 9 194 177 116 56 38 45 282
Antoine Wojdyla United States 9 215 1.1× 127 0.7× 86 0.7× 23 0.4× 59 1.6× 42 273
W. Qian United States 10 75 0.4× 64 0.4× 110 0.9× 164 2.9× 101 2.7× 15 266
Jorge Giner Navarro United States 8 108 0.6× 49 0.3× 37 0.3× 38 0.7× 98 2.6× 23 221
Jinchuan Guo China 11 85 0.4× 190 1.1× 12 0.1× 24 0.4× 42 1.1× 48 319
Takehiro Kume Japan 10 83 0.4× 171 1.0× 5 0.0× 62 1.1× 46 1.2× 27 228
Thomas Schietinger Switzerland 9 174 0.9× 120 0.7× 12 0.1× 26 0.5× 78 2.1× 39 241
K. Smolenski United States 9 159 0.8× 55 0.3× 27 0.2× 8 0.1× 71 1.9× 32 209
Sven van Haver Netherlands 8 70 0.4× 37 0.2× 54 0.5× 4 0.1× 126 3.3× 17 216
N. Hower United States 6 94 0.5× 79 0.4× 26 0.2× 5 0.1× 42 1.1× 22 152
David Ren United States 6 20 0.1× 71 0.4× 29 0.3× 43 0.8× 95 2.5× 11 215

Countries citing papers authored by Markus P. Benk

Since Specialization
Citations

This map shows the geographic impact of Markus P. Benk's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Markus P. Benk with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Markus P. Benk more than expected).

Fields of papers citing papers by Markus P. Benk

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Markus P. Benk. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Markus P. Benk. The network helps show where Markus P. Benk may publish in the future.

Co-authorship network of co-authors of Markus P. Benk

This figure shows the co-authorship network connecting the top 25 collaborators of Markus P. Benk. A scholar is included among the top collaborators of Markus P. Benk based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Markus P. Benk. Markus P. Benk is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Benk, Markus P., et al.. (2025). Enhanced EUV mask imaging using Fourier ptychographic microscopy. 40–40. 1 indexed citations
2.
Benk, Markus P., et al.. (2024). Towards Full Field-of-View Fourier Ptychography for Extreme Ultraviolet Microscope. eScholarship (California Digital Library). 1–5. 1 indexed citations
3.
Wojdyla, Antoine, et al.. (2020). Extreme ultraviolet microscope characterization using photomask surface roughness. Scientific Reports. 10(1). 11673–11673. 7 indexed citations
4.
Benk, Markus P., et al.. (2019). Upgrade to the SHARP EUV mask microscope. eScholarship (California Digital Library). 5 indexed citations
5.
Wojdyla, Antoine, Markus P. Benk, Patrick Naulleau, & Kenneth A. Goldberg. (2018). EUV photolithography mask inspection using Fourier ptychography. OSTI OAI (U.S. Department of Energy Office of Scientific and Technical Information). 30–30. 12 indexed citations
6.
Wood, Obert R., et al.. (2017). Image-based pupil plane characterization via a space-domain basis. Journal of Micro/Nanolithography MEMS and MOEMS. 16(2). 23509–23509.
7.
Naulleau, Patrick, Markus P. Benk, Kenneth A. Goldberg, et al.. (2017). Amplitude versus phase effects in extreme ultraviolet lithography mask scattering and imaging. Applied Optics. 56(12). 3325–3325. 1 indexed citations
8.
Benk, Markus P., Antoine Wojdyla, Weilun Chao, et al.. (2016). Emulation of anamorphic imaging on the SHARP extreme ultraviolet mask microscope. Journal of Micro/Nanolithography MEMS and MOEMS. 15(3). 33501–33501. 8 indexed citations
9.
Wojdyla, Antoine, et al.. (2016). Aerial imaging study of the mask-induced line-width roughness of EUV lithography masks. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9776. 97760H–97760H. 8 indexed citations
10.
Wojdyla, Antoine, Markus P. Benk, Kenneth A. Goldberg, et al.. (2015). Aberration estimation using EUV mask roughness. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9422. 942214–942214. 1 indexed citations
11.
Wojdyla, Antoine, Markus P. Benk, Kenneth A. Goldberg, et al.. (2015). Phase measurements of EUV mask defects. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9422. 942217–942217. 6 indexed citations
12.
Goldberg, Kenneth A., et al.. (2015). EUV actinic brightfield mask microscopy for predicting printed defect images. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9635. 963514–963514. 6 indexed citations
13.
Goldberg, Kenneth A., Markus P. Benk, Antoine Wojdyla, et al.. (2014). Actinic mask imaging: recent results and future directions from the SHARP EUV microscope. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9048. 90480Y–90480Y. 21 indexed citations
14.
Sun, Lei, Eric M. Gullikson, Pawitter J. S. Mangat, et al.. (2013). Application of phase shift focus monitor in EUVL process control. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 8679. 86790T–86790T. 3 indexed citations
15.
Goldberg, Kenneth A., Iacopo Mochi, Markus P. Benk, et al.. (2012). Creating an EUV mask microscope for lithography generations reaching 8 NM. eScholarship (California Digital Library). 1 indexed citations
16.
Benk, Markus P. & K. Bergmann. (2012). Brilliance scaling of discharge sources for extreme-ultraviolet and soft x-ray radiation for metrology applications. Journal of Micro/Nanolithography MEMS and MOEMS. 11(2). 21106–1. 17 indexed citations
17.
Benk, Markus P., K. Bergmann, Ana Querejeta‐Fernández, et al.. (2011). Soft X-Ray Microscopic Investigation on Self Assembling Nanocrystals. AIP conference proceedings. 433–436. 1 indexed citations
18.
Benk, Markus P., David Schäfer, Thomas Wilhein, & K. Bergmann. (2009). High power soft x-ray source based on a discharge plasma. Journal of Physics Conference Series. 186. 12024–12024. 5 indexed citations
19.
Benk, Markus P., K. Bergmann, David Schäfer, & Thomas Wilhein. (2008). Compact soft x-ray microscope using a gas-discharge light source. Optics Letters. 33(20). 2359–2359. 51 indexed citations
20.
Bergmann, K., et al.. (2008). Soft x-ray emission from a pulsed gas discharge in a pseudosparklike electrode geometry. Journal of Applied Physics. 103(12). 16 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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