Dan Corliss

1.0k total citations
12 papers, 52 citations indexed

About

Dan Corliss is a scholar working on Electrical and Electronic Engineering, Biomedical Engineering and Surfaces, Coatings and Films. According to data from OpenAlex, Dan Corliss has authored 12 papers receiving a total of 52 indexed citations (citations by other indexed papers that have themselves been cited), including 12 papers in Electrical and Electronic Engineering, 7 papers in Biomedical Engineering and 4 papers in Surfaces, Coatings and Films. Recurrent topics in Dan Corliss's work include Advancements in Photolithography Techniques (10 papers), Integrated Circuits and Semiconductor Failure Analysis (8 papers) and Advanced Surface Polishing Techniques (5 papers). Dan Corliss is often cited by papers focused on Advancements in Photolithography Techniques (10 papers), Integrated Circuits and Semiconductor Failure Analysis (8 papers) and Advanced Surface Polishing Techniques (5 papers). Dan Corliss collaborates with scholars based in United States and Netherlands. Dan Corliss's co-authors include Timothy A. Brunner, Christopher P. Ausschnitt, N. Lustig, Chris Robinson, Nelson Felix, P. Parries, Pushkara R. Varanasi, Matthieu Rutten, Tosihide H. YOSIDA and Subramanian S. Iyer and has published in prestigious journals such as IBM Journal of Research and Development, Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena and Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE.

In The Last Decade

Dan Corliss

11 papers receiving 44 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Dan Corliss United States 4 45 24 10 9 6 12 52
Olivier Bonnaud France 6 96 2.1× 20 0.8× 5 0.5× 3 0.3× 4 0.7× 42 114
Yutaka Ezaki Japan 4 12 0.3× 17 0.7× 3 0.3× 14 1.6× 2 0.3× 12 34
R. B. Galleguillos Silva Chile 2 16 0.4× 11 0.5× 9 0.9× 11 1.2× 5 0.8× 3 38
Terry R. Turner United States 4 43 1.0× 9 0.4× 3 0.3× 7 0.8× 7 1.2× 6 57
P. Askebjer Germany 3 27 0.6× 20 0.8× 4 0.4× 4 0.4× 7 38
Raja Muthinti United States 5 51 1.1× 20 0.8× 7 0.7× 2 0.2× 8 57
Eric Kuah United States 4 89 2.0× 20 0.8× 9 1.0× 11 1.8× 8 93
C Tremola Venezuela 4 36 0.8× 18 0.8× 8 0.9× 4 0.7× 7 58
K. Isobe Japan 5 69 1.5× 17 0.7× 7 0.8× 4 0.7× 13 75
Sze Pei Lim United States 5 94 2.1× 17 0.7× 15 1.7× 8 1.3× 19 98

Countries citing papers authored by Dan Corliss

Since Specialization
Citations

This map shows the geographic impact of Dan Corliss's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Dan Corliss with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Dan Corliss more than expected).

Fields of papers citing papers by Dan Corliss

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Dan Corliss. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Dan Corliss. The network helps show where Dan Corliss may publish in the future.

Co-authorship network of co-authors of Dan Corliss

This figure shows the co-authorship network connecting the top 25 collaborators of Dan Corliss. A scholar is included among the top collaborators of Dan Corliss based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Dan Corliss. Dan Corliss is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

12 of 12 papers shown
1.
2.
Guo, Jing, Anuja De Silva, Yann Mignot, et al.. (2018). Polymer brush as adhesion promoter for EUV patterning. 10143. 17–17. 1 indexed citations
3.
Iyer, Subramanian S., G. Freeman, A. Chou, et al.. (2011). 45-nm silicon-on-insulator CMOS technology integrating embedded DRAM for high-performance server and ASIC applications. IBM Journal of Research and Development. 55(3). 5:1–5:14. 13 indexed citations
4.
Brunner, Timothy A., et al.. (2010). Overlay characterization and matching of immersion photoclusters. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7640. 76400W–76400W. 9 indexed citations
5.
Brunner, Timothy A., et al.. (2009). Focus and dose characterization of immersion photoclusters. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7274. 72740S–72740S. 3 indexed citations
6.
Corliss, Dan, et al.. (2009). Manufacturing implementation of scatterometry and other techniques for 300-mm lithography tool controls. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7272. 72720W–72720W. 3 indexed citations
7.
Robinson, Chris, et al.. (2008). Monitoring defects at wafer's edge for improved immersion lithography performance. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6924. 69244O–69244O. 2 indexed citations
8.
Varanasi, Pushkara R., Linda K. Sundberg, Chris Robinson, et al.. (2007). Building an immersion topcoat from the ground up: materials perspective. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6519. 651907–651907. 4 indexed citations
9.
Hartley, John G., Greg Denbeaux, Harry Levinson, et al.. (2006). A year in the life of an immersion lithography alpha tool at Albany NanoTech. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6151. 615101–615101. 2 indexed citations
10.
Gil, Darı́o, Jaione Tirapu-Azpiroz, Ryan Deschner, et al.. (2006). Characterization of imaging performance for immersion lithography at NA=0.93. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6154. 615405–615405. 3 indexed citations
11.
Gil, Darı́o, T. C. Bailey, Dan Corliss, et al.. (2005). First microprocessors with immersion lithography. 10–10. 10 indexed citations
12.
Grenville, Andrew, et al.. (1996). Calorimetric measurements of optical materials for 193 nm lithography. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 14(6). 4184–4187. 2 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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