Alok Vaid

577 total citations
61 papers, 448 citations indexed

About

Alok Vaid is a scholar working on Electrical and Electronic Engineering, Surfaces, Coatings and Films and Biomedical Engineering. According to data from OpenAlex, Alok Vaid has authored 61 papers receiving a total of 448 indexed citations (citations by other indexed papers that have themselves been cited), including 41 papers in Electrical and Electronic Engineering, 36 papers in Surfaces, Coatings and Films and 18 papers in Biomedical Engineering. Recurrent topics in Alok Vaid's work include Advancements in Photolithography Techniques (33 papers), Optical Coatings and Gratings (26 papers) and Integrated Circuits and Semiconductor Failure Analysis (22 papers). Alok Vaid is often cited by papers focused on Advancements in Photolithography Techniques (33 papers), Optical Coatings and Gratings (26 papers) and Integrated Circuits and Semiconductor Failure Analysis (22 papers). Alok Vaid collaborates with scholars based in United States, Germany and Israel. Alok Vaid's co-authors include Benjamin Bunday, Matthew Sendelbach, Cornel Bozdog, John A. Allgair, Narender Rana, Paul K. Isbester, Erin Mclellan, Igor Turovets, Byung-Cheol Kang and Jody Fronheiser and has published in prestigious journals such as Journal of Micro/Nanolithography MEMS and MOEMS, Women's studies quarterly and SPIE eBooks.

In The Last Decade

Alok Vaid

54 papers receiving 396 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Alok Vaid United States 11 292 237 184 105 55 61 448
Matthew Sendelbach United States 12 248 0.8× 210 0.9× 142 0.8× 92 0.9× 51 0.9× 45 394
John A. Allgair United States 15 424 1.5× 274 1.2× 187 1.0× 96 0.9× 100 1.8× 64 566
Osamu Suga Japan 12 443 1.5× 266 1.1× 88 0.5× 39 0.4× 20 0.4× 70 463
Jan Mulkens Netherlands 13 401 1.4× 127 0.5× 218 1.2× 45 0.4× 40 0.7× 47 467
Soichi Inoue Japan 11 344 1.2× 144 0.6× 125 0.7× 31 0.3× 16 0.3× 96 412
G. Owen United States 9 228 0.8× 106 0.4× 127 0.7× 35 0.3× 50 0.9× 32 329
Tsutomu Shoki Japan 13 366 1.3× 232 1.0× 71 0.4× 27 0.3× 10 0.2× 54 414
Katsuya Okumura Japan 12 374 1.3× 86 0.4× 98 0.5× 26 0.2× 47 0.9× 56 430
Samuel N. Jones United States 6 129 0.4× 63 0.3× 108 0.6× 27 0.3× 171 3.1× 15 341
П. А. Тодуа Russia 14 272 0.9× 378 1.6× 62 0.3× 46 0.4× 137 2.5× 67 455

Countries citing papers authored by Alok Vaid

Since Specialization
Citations

This map shows the geographic impact of Alok Vaid's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Alok Vaid with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Alok Vaid more than expected).

Fields of papers citing papers by Alok Vaid

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Alok Vaid. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Alok Vaid. The network helps show where Alok Vaid may publish in the future.

Co-authorship network of co-authors of Alok Vaid

This figure shows the co-authorship network connecting the top 25 collaborators of Alok Vaid. A scholar is included among the top collaborators of Alok Vaid based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Alok Vaid. Alok Vaid is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
2.
Jakab, Árpád, et al.. (2019). Integration of Reflectometry into a FOUP for Improved Cycle Time. 1–5. 1 indexed citations
3.
Fronheiser, Jody, et al.. (2018). Nonconventional applications of Mueller matrix-based scatterometry for advanced technology nodes. Journal of Micro/Nanolithography MEMS and MOEMS. 17(3). 1–1. 19 indexed citations
4.
5.
Vaid, Alok, et al.. (2017). Complex metrology on 3D structures using multi-channel OCD. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 10145. 101451C–101451C. 2 indexed citations
6.
Urbanowicz, Adam, et al.. (2017). Practical aspects of TMU based analysis for scatterometry model referencing AM: Advanced metrology. 5375. 34–39. 2 indexed citations
7.
Bunday, Benjamin, et al.. (2017). In-line E-beam metrology and defect inspection: industry reflections, hybrid E-beam opportunities, recommendations and predictions. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 10145. 101450R–101450R. 9 indexed citations
8.
Vaid, Alok, et al.. (2017). Optical metrology strategies for inline 7nm CMOS logic product control. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 10145. 101451D–101451D. 2 indexed citations
9.
Vaid, Alok, et al.. (2016). Optical metrology solutions for 10nm films process control challenges. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9778. 97780Z–97780Z. 3 indexed citations
10.
Vaid, Alok, et al.. (2015). Hybrid metrology implementation: server approach. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9424. 94241H–94241H. 2 indexed citations
11.
12.
Silver, Richard M., Brian M. Barnes, Hui Zhou, et al.. (2014). Optimizing hybrid metrology through a consistent multi-tool parameter set and uncertainty model. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9050. 905004–905004. 10 indexed citations
13.
Vaid, Alok, et al.. (2014). Hybrid metrology: from the lab into the fab. Journal of Micro/Nanolithography MEMS and MOEMS. 13(4). 41410–41410. 14 indexed citations
14.
Vaid, Alok, John A. Allgair, Erin Mclellan, et al.. (2012). Hybrid metrology solution for 1X node technology. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 8324. 832404–832404. 17 indexed citations
15.
Bozdog, Cornel, et al.. (2011). A holistic metrology approach: multi-channel scatterometry for complex applications. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7971. 797113–797113. 3 indexed citations
16.
Bunday, Benjamin, et al.. (2011). Tool-to-tool matching issues due to photoresist shrinkage effects. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7971. 79710B–79710B. 7 indexed citations
17.
Vaid, Alok, John A. Allgair, Matthew Sendelbach, et al.. (2011). A holistic metrology approach: hybrid metrology utilizing scatterometry, CD-AFM, and CD-SEM. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7971. 797103–797103. 51 indexed citations
18.
Sendelbach, Matthew, et al.. (2010). Use of multiple azimuthal angles to enable advanced scatterometry applications. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7638. 76381G–76381G. 18 indexed citations
19.
Vaid, Alok, et al.. (2008). Scatterometry as technology enabler for embedded SiGe process. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6922. 69220U–69220U. 8 indexed citations
20.
Zangooie, S., et al.. (2008). Characterization of 32nm node BEOL grating structures using scatterometry. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6922. 69220S–69220S. 6 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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