Jin Choi

483 total citations
65 papers, 378 citations indexed

About

Jin Choi is a scholar working on Electrical and Electronic Engineering, Biomedical Engineering and Surfaces, Coatings and Films. According to data from OpenAlex, Jin Choi has authored 65 papers receiving a total of 378 indexed citations (citations by other indexed papers that have themselves been cited), including 64 papers in Electrical and Electronic Engineering, 41 papers in Biomedical Engineering and 18 papers in Surfaces, Coatings and Films. Recurrent topics in Jin Choi's work include Advancements in Photolithography Techniques (63 papers), Nanofabrication and Lithography Techniques (29 papers) and Electron and X-Ray Spectroscopy Techniques (18 papers). Jin Choi is often cited by papers focused on Advancements in Photolithography Techniques (63 papers), Nanofabrication and Lithography Techniques (29 papers) and Electron and X-Ray Spectroscopy Techniques (18 papers). Jin Choi collaborates with scholars based in South Korea, United States and Japan. Jin Choi's co-authors include S. V. Sreenivasan, Douglas J. Resnick, N. E. Schumaker, Sang Hee Lee, Soo-Young Lee, Van‐Quynh Nguyen, Sukho Lee, Han-Ku Cho, Atsushi Kimura and William J. Dauksher and has published in prestigious journals such as Advanced Functional Materials, Microelectronic Engineering and Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena.

In The Last Decade

Jin Choi

59 papers receiving 311 citations

Peers

Jin Choi

EEE

AMPO

SCF

IME

Mireille Maenhoudt Belgium

Joo-Tae Moon South Korea

Yuansheng Ma United States

Jan Mulkens Netherlands

Han-Ku Cho South Korea

Jan Hermans Belgium

Monique Ercken Belgium

Stewart A. Robertson United States

Mark D. Smith United States

Alok Vaid United States

Mireille Maenhoudt Belgium

Jin Choi

419 ×1.3

EEE

211 ×0.8

32 ×0.5

AMPO

105 ×1.5

SCF

18 ×0.8

IME

Citations per year, relative to Jin Choi Jin Choi (= 1×) peers Mireille Maenhoudt

Countries citing papers authored by Jin Choi

Since Specialization

Citations

This map shows the geographic impact of Jin Choi's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Jin Choi with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Jin Choi more than expected).

Fields of papers citing papers by Jin Choi

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Jin Choi. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Jin Choi. The network helps show where Jin Choi may publish in the future.

Co-authorship network of co-authors of Jin Choi

This figure shows the co-authorship network connecting the top 25 collaborators of Jin Choi. A scholar is included among the top collaborators of Jin Choi based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Jin Choi. Jin Choi is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

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20 of 20 papers shown

Kim, Gayoung, et al.. (2025). Tin‐Oxo Nanocluster Composite Films as Positive‐Tone Photoresist for Extreme UV Lithography. Advanced Functional Materials. 35(24). 4 indexed citations

Lee, Boram, et al.. (2023). PEC-aware MPC for CD quality improvement. 2010. 50–50.

Lee, Soo-Young, et al.. (2022). Reduction of exposing time in massively-parallel E-beam systems. Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena. 40(3). 1 indexed citations

Choi, Jin, et al.. (2021). Curvilinear data format working group for MBMW era. 23–23. 12 indexed citations

Choi, Jin & Douglas J. Resnick. (2019). The Status of Nanoimprint Lithography for High Volume Semiconductor Manufacturing. Journal of Photopolymer Science and Technology. 32(5). 753–757. 1 indexed citations

Lee, Soo-Young, et al.. (2019). Effects of abnormal beams on writing qualities in massively-parallel e-beam systems. Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena. 37(6). 4 indexed citations

Im, Se Hyuk, Mario Meissl, Ahmed Hussein, et al.. (2019). Topography and flatness induced overlay distortion correction using resist drop pattern compensation in nanoimprint lithography systems. 67. 11–11. 1 indexed citations

Nakayama, Takahiro, et al.. (2017). Improved particle control for high volume semiconductor manufacturing for nanoimprint lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 10454. 104540R–104540R. 2 indexed citations

Resnick, Douglas J. & Jin Choi. (2017). A review of nanoimprint lithography for high-volume semiconductor device manufacturing. Advanced Optical Technologies. 6(3-4). 229–241. 13 indexed citations

10.

Seki, Junichi, et al.. (2016). Nanoimprint wafer and mask tool progress and status for high volume semiconductor manufacturing. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9985. 99851G–99851G. 3 indexed citations

11.

Choi, Jin, et al.. (2015). Challenges and requirements of mask data processing for multi-beam mask writer. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9658. 96580C–96580C. 3 indexed citations

12.

Lee, Soo-Young, et al.. (2014). Minimization of line edge roughness and critical dimension error in electron-beam lithography. Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena. 32(6). 7 indexed citations

13.

Choi, Jin, et al.. (2012). Impact of mask line edge roughness and statistical noise on next generation mask making. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 8441. 84410Y–84410Y. 2 indexed citations

14.

Kim, Byung Gon, et al.. (2012). Improving CD uniformity using MB-MDP for 14nm node and beyond. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 8522. 852205–852205. 11 indexed citations

15.

Choi, Jin, et al.. (2012). Deflector contamination in E-beam mask writer and its effect on pattern placement error of photomask for sub 20nm device node. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 8441. 84410C–84410C.

16.

Choi, Jin, et al.. (2009). Evaluation of an e-beam correction strategy for compensation of EUVL mask non-flatness. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7379. 73790Q–73790Q. 5 indexed citations

17.

Choi, Jin, et al.. (2008). Resist charging effect in photomask: Its impact on pattern placement error and critical dimension. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 26(6). 2345–2350. 1 indexed citations

18.

Choi, Jin, et al.. (2007). Requirements of photomask registration for the 45nm node and beyond: Is it possible?. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6730. 67301O–67301O. 1 indexed citations

19.

Choi, Jin, et al.. (2004). Step and Repeat UV nanoimprint lithography tools and processes. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5374. 222–222. 48 indexed citations

20.

Truskett, Van N., et al.. (2004). Development of imprint materials for the Step and Flash Imprint Lithography process. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5374. 232–232. 24 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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