K. B. Jung

786 total citations
48 papers, 666 citations indexed

About

K. B. Jung is a scholar working on Electrical and Electronic Engineering, Electronic, Optical and Magnetic Materials and Mechanics of Materials. According to data from OpenAlex, K. B. Jung has authored 48 papers receiving a total of 666 indexed citations (citations by other indexed papers that have themselves been cited), including 43 papers in Electrical and Electronic Engineering, 18 papers in Electronic, Optical and Magnetic Materials and 14 papers in Mechanics of Materials. Recurrent topics in K. B. Jung's work include Semiconductor materials and devices (32 papers), Plasma Diagnostics and Applications (22 papers) and Copper Interconnects and Reliability (15 papers). K. B. Jung is often cited by papers focused on Semiconductor materials and devices (32 papers), Plasma Diagnostics and Applications (22 papers) and Copper Interconnects and Reliability (15 papers). K. B. Jung collaborates with scholars based in United States, South Korea and Germany. K. B. Jung's co-authors include S. J. Pearton, J. R. Childress, Yoon‐Bong Hahn, R. J. Shul, C. R. Abernathy, David C. Hays, E. S. Lambers, H. Cho, F. Ren and Jung Han and has published in prestigious journals such as Applied Physics Letters, Journal of Applied Physics and Journal of The Electrochemical Society.

In The Last Decade

K. B. Jung

48 papers receiving 653 citations

Peers

K. B. Jung

EEE

CMP

EOMM

AMPO

E.V. Yakovlev Germany

Benny Van Daele Belgium

A. L. Syrkin United States

Yasuto Yonezawa Japan

X. Weng United States

G. Mannaert Belgium

Hajime Fujikura Japan

Nobuhiko Sawaki Nobuhiko Sawaki Japan

Andrew J. Trunek United States

O. Svensk Finland

E.V. Yakovlev Germany

K. B. Jung

275 ×0.5

EEE

591 ×2.8

CMP

253 ×1.2

235 ×1.2

EOMM

212 ×1.2

AMPO

Citations per year, relative to K. B. Jung K. B. Jung (= 1×) peers E.V. Yakovlev

Countries citing papers authored by K. B. Jung

Since Specialization

Citations

This map shows the geographic impact of K. B. Jung's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by K. B. Jung with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites K. B. Jung more than expected).

Fields of papers citing papers by K. B. Jung

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by K. B. Jung. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by K. B. Jung. The network helps show where K. B. Jung may publish in the future.

Co-authorship network of co-authors of K. B. Jung

This figure shows the co-authorship network connecting the top 25 collaborators of K. B. Jung. A scholar is included among the top collaborators of K. B. Jung based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with K. B. Jung. K. B. Jung is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

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20 of 20 papers shown

Jung, K. B. & O K.K.. (2006). A CMOS single-pole-four-throw switch. IEEE Microwave and Wireless Components Letters. 16(3). 128–130. 4 indexed citations

Jung, K. B., et al.. (2000). Long term stability of dry etched magnetoresistive random access memory elements. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 18(1). 268–272. 8 indexed citations

Pearton, S. J., H. Cho, K. B. Jung, et al.. (2000). Dry Etching of MRAM Structures. MRS Proceedings. 614. 4 indexed citations

Hahn, Yoon‐Bong, David C. Hays, H. Cho, et al.. (2000). Inductively Coupled Plasma Etching in ICl- and IBr-Based Chemistries. Part I: GaAs, GaSb, and AlGaAs. Plasma Chemistry and Plasma Processing. 20(3). 405–415. 3 indexed citations

Jung, K. B., H. Cho, D. Kumar, et al.. (1999). Cl2 ‐ Based Dry Etching of Doped Manganate Perovskites: PrBaCaMnO3 and LaSrMnO3. Journal of The Electrochemical Society. 146(7). 2748–2751. 1 indexed citations

Cho, H., K. B. Jung, David C. Hays, et al.. (1999). Inductively coupled plasma etching of CoFeB, CoZr, CoSm and FeMn thin films in interhalogen mixtures. Materials Science and Engineering B. 60(2). 107–111. 7 indexed citations

Hahn, Yoon‐Bong, David C. Hays, H. Cho, et al.. (1999). Comparison of ICl- and IBr-based plasma chemistries for inductively coupled plasma etching of GaN, InN and AlN. Materials Science and Engineering B. 60(2). 95–100. 11 indexed citations

Hays, David C., C. R. Abernathy, W. S. Hobson, et al.. (1999). Selective Dry Etching of the GaN/InN/AlN, GaAs/AlGaAs and GaAs/InGaP Systems. MRS Proceedings. 573. 2 indexed citations

Hahn, Yoon‐Bong, David C. Hays, S. M. Donovan, et al.. (1999). Effect of additive noble gases in chlorine-based inductively coupled plasma etching of GaN, InN, and AlN. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 17(3). 768–773. 31 indexed citations

10.

Jung, K. B., David C. Hays, Yoon‐Bong Hahn, et al.. (1999). Interhalogen plasma chemistries for dry etch patterning of Ni, Fe, NiFe and NiFeCo thin films. Applied Surface Science. 140(1-2). 215–222. 9 indexed citations

11.

Jung, K. B., H. Cho, Yoon‐Bong Hahn, et al.. (1999). Relative merits of Cl2 and CO/NH3 plasma chemistries for dry etching of magnetic random access memory device elements. Journal of Applied Physics. 85(8). 4788–4790. 35 indexed citations

12.

Shul, R. J., L. F. Lester, H. Cho, et al.. (1999). Plasma chemistries for high density plasma etching of SiC. Journal of Electronic Materials. 28(3). 196–201. 30 indexed citations

13.

Jung, K. B., et al.. (1999). Dry Etching of BaSrTiO3 and LaNiO3 Thin Films in Inductively Coupled Plasmas. Journal of The Electrochemical Society. 146(10). 3778–3782. 6 indexed citations

14.

Hays, David C., K. B. Jung, Yoon‐Bong Hahn, et al.. (1999). Comparison of F 2‐Based Gases for High‐Rate Dry Etching of Si. Journal of The Electrochemical Society. 146(10). 3812–3816. 17 indexed citations

15.

Jung, K. B., et al.. (1999). High density plasma etching of NiFe, NiFeCo and NiMnSb-based multilayers for magnetic storage elements. Applied Surface Science. 138-139. 111–116. 14 indexed citations

16.

Jung, K. B., Yoon‐Bong Hahn, David C. Hays, et al.. (1999). Effect of inert gas additive on Cl2-based inductively coupled plasma etching of NiFe and NiFeCo. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 17(4). 2223–2227. 9 indexed citations

17.

Jung, K. B., et al.. (1998). Cl2‐Based Inductively Coupled Plasma Etching of NiFe and Related Materials. Journal of The Electrochemical Society. 145(11). 4025–4028. 8 indexed citations

18.

Jung, K. B., et al.. (1998). Development of electron cyclotron resonance and inductively coupled plasma high density plasma etching for patterning of NiFe and NiFeCo. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 16(3). 1697–1701. 23 indexed citations

19.

Ren, F., C. R. Abernathy, J. M. Van Hove, et al.. (1998). 300°C GaN/AlGaN Heterojunction Bipolar Transistor. MRS Internet Journal of Nitride Semiconductor Research. 3. 54 indexed citations

20.

Jung, K. B., et al.. (1997). Electron cyclotron resonance plasma etching of materials for magneto-resistive random access memory applications. Journal of Electronic Materials. 26(11). 1310–1313. 5 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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