Jy Bhardwaj

555 total citations
17 papers, 431 citations indexed

About

Jy Bhardwaj is a scholar working on Electrical and Electronic Engineering, Biomedical Engineering and Condensed Matter Physics. According to data from OpenAlex, Jy Bhardwaj has authored 17 papers receiving a total of 431 indexed citations (citations by other indexed papers that have themselves been cited), including 14 papers in Electrical and Electronic Engineering, 6 papers in Biomedical Engineering and 2 papers in Condensed Matter Physics. Recurrent topics in Jy Bhardwaj's work include Plasma Diagnostics and Applications (7 papers), Semiconductor materials and devices (5 papers) and Advanced Surface Polishing Techniques (4 papers). Jy Bhardwaj is often cited by papers focused on Plasma Diagnostics and Applications (7 papers), Semiconductor materials and devices (5 papers) and Advanced Surface Polishing Techniques (4 papers). Jy Bhardwaj collaborates with scholars based in United Kingdom, United States and Germany. Jy Bhardwaj's co-authors include Huma Ashraf, J. Hopkins, Hamza Ashraf, A. Hynes, Jennifer N. Hanson Shepherd, Ian W. Johnston, Ian Johnston, O.B. Shchekin, Ashish Tandon and Peter J. Schmidt and has published in prestigious journals such as Sensors and Actuators A Physical, Microelectronic Engineering and physica status solidi (a).

In The Last Decade

Jy Bhardwaj

17 papers receiving 377 citations

Peers

Countries citing papers authored by Jy Bhardwaj

Since Specialization

Citations

This map shows the geographic impact of Jy Bhardwaj's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Jy Bhardwaj with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Jy Bhardwaj more than expected).

Fields of papers citing papers by Jy Bhardwaj

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Jy Bhardwaj. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Jy Bhardwaj. The network helps show where Jy Bhardwaj may publish in the future.

Co-authorship network of co-authors of Jy Bhardwaj

This figure shows the co-authorship network connecting the top 25 collaborators of Jy Bhardwaj. A scholar is included among the top collaborators of Jy Bhardwaj based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Jy Bhardwaj. Jy Bhardwaj is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

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17 of 17 papers shown

#	Work	Indexed citations
1	What will mainstream adaptive driving beam look like by 2025? 2019 ·Jy Bhardwaj, (unknown)	4
2	Progress in LED technology for solid-state lighting 2017 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Jy Bhardwaj, (unknown), (unknown), O.B. Shchekin, (unknown), Werner Götz, (unknown), (unknown), (unknown)	2
3	Progress in high-luminance LED technology for solid-state lighting 2017 ·physica status solidi (a) ·Jy Bhardwaj, (unknown), (unknown), (unknown), Ashish Tandon, (unknown), Peter J. Schmidt, (unknown), (unknown), O.B. Shchekin, Werner Götz	40
4	Advances in LEDs for automotive applications 2016 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Jy Bhardwaj, (unknown), (unknown)	6
5	Advanced LED technology for automotive applications 2016 ·SPIE Newsroom ·Jy Bhardwaj, (unknown), (unknown)	2
6	Advances in PLC Technology for DWDM Applications 2006 ·(unknown), Robert L. Brainard, D. J. Dougherty, Jy Bhardwaj	2
7	Modeling and development of a deep silicon etch process for 200 mm election projection lithography mask fabrication 2001 ·Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ·William J. Dauksher, (unknown), Douglas J. Resnick, (unknown), Pawitter J. S. Mangat, Shahid Rauf, Peter L. G. Ventzek, Hamza Ashraf, (unknown), S. Hall, Ingrid Johnston, J. Hopkins, (unknown), Jy Bhardwaj	6
8	Deep silicon etch modeling for fabrication of 200-mm SCALPEL masks 2001 ·Microelectronic Engineering ·William J. Dauksher, (unknown), Douglas J. Resnick, (unknown), Pawitter J. S. Mangat, Shahid Rauf, Peter L. G. Ventzek, (unknown), (unknown), Hamza Ashraf, (unknown), S. Hall, Ingrid Johnston, J. Hopkins, Jy Bhardwaj	8
9	ADVANCES IN DEEP OXIDE ETCH PROCESSING FOR MEMS – MASK SELECTION 2000 ·Jy Bhardwaj, Colin Welch, (unknown), Ross Gunn, (unknown), (unknown)	1
10	ADVANCES IN DEEP ANISOTROPIC SILICON ETCH PROCESSING FOR MEMS 2000 ·Hamza Ashraf, Jy Bhardwaj, S. Hall, J. Hopkins, A. Hynes, Ian Johnston, (unknown), (unknown), (unknown), M. E. Ryan, (unknown)	8
11	<title>Etching 200-mm diameter SCALPEL masks with the ASE process</title> 2000 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·(unknown), Huma Ashraf, Jy Bhardwaj, (unknown), A. Hynes, (unknown), (unknown), S. Hall, (unknown), Gregory R. Bogart, A. Kornblit, Anthony E. Novembre	7
12	Recent advances in silicon etching for MEMS using the ASE™ process 1999 ·Sensors and Actuators A Physical ·A. Hynes, Hamza Ashraf, Jy Bhardwaj, J. Hopkins, Ian W. Johnston, Jennifer N. Hanson Shepherd	137
13	Defining Conditions for the Etching of Silicon in an Inductive Coupled Plasma Reactor 1999 ·MRS Proceedings ·Hamza Ashraf, Jy Bhardwaj, (unknown), S. Hall, J. Hopkins, A. Hynes, Ian Johnston, (unknown), (unknown), (unknown), Paul O’Brien	7
14	High Etch Rate Gallium Nitride Processing Using an Inductively Coupled Plasma Source 1999 ·physica status solidi (a) ·M. E. Ryan, Alessandra Conceição Leite Funchal Camacho, Jy Bhardwaj	4
15	The Benefits of Process Parameter Ramping During The Plasma Etching of High Aspect Ratio Silicon Structures 1998 ·MRS Proceedings ·J. Hopkins, Hamza Ashraf, Jy Bhardwaj, A. Hynes, Ian Johnston, Jennifer N. Hanson Shepherd	21
16	<title>Advanced silicon etching using high-density plasmas</title> 1995 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Jy Bhardwaj, Huma Ashraf	172
17	Photographic studies of the discharge development in a low-trigger-voltage vacuum switch 1988 ·IEEE Transactions on Electrical Insulation ·Jy Bhardwaj, P A Chatterton	4

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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