Jy Bhardwaj

555 citations

17 papers · 431 indexed · h-index 8

Electrical and Electronic Engineering top 10%
- Plasma Diagnostics and Applications 7
- Semiconductor materials and devices 5
- Semiconductor Lasers and Optical Devices 4
- Advancements in Photolithography Techniques 3
- Advanced MEMS and NEMS Technologies 2
Surfaces, Coatings and Films
Biomedical Engineering
- Advanced Surface Polishing Techniques 4
- Advanced optical system design 2
Atomic and Molecular Physics, and Optics
Condensed Matter Physics
Civil and Structural Engineering
- Engineering Applied Research 2

Co-authors: Huma Ashraf J. Hopkins Hamza Ashraf A. Hynes Jennifer N. Hanson Shepherd Ian W. Johnston Ian Johnston O.B. Shchekin
Cited by: Electrical and Electronic Engineering Surfaces, Coatings and Films Biomedical Engineering
Journals: Sensors and Actuators A Physical (1 paper)Microelectronic Engineering (1 paper)physica status solidi (a) (1 paper)
Partner nations: United Kingdom United States Germany

In The Last Decade

Jy Bhardwaj

17 papers receiving 377 citations

Peers

Countries citing papers authored by Jy Bhardwaj

Since Specialization

Citations

This map shows the geographic impact of Jy Bhardwaj's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Jy Bhardwaj with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Jy Bhardwaj more than expected).

Fields of papers citing papers by Jy Bhardwaj

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Jy Bhardwaj. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Jy Bhardwaj. The network helps show where Jy Bhardwaj may publish in the future.

Co-authorship network

The 25 scholars most cited alongside Jy Bhardwaj, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with Jy Bhardwaj Line = papers co-authored together Jy Bhardwaj links everyone, so they are left out of the graph.

All Works

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17 of 17 papers shown

#	Work
1	What will mainstream adaptive driving beam look like by 2025? Jy Bhardwaj,Benno Spinger	2019	4
2	Progress in LED technology for solid-state lighting Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Jy Bhardwaj,Greg Guth,John Cesaratto,O.B. Shchekin,Wouter Soer,Werner Götz,Ron Bonné,Zhihua F. Song,Jeroen den Breejen	2017	2
3	Progress in high-luminance LED technology for solid-state lighting physica status solidi (a) ·Jy Bhardwaj,John Cesaratto,Isaac Wildeson,Henry Choy,Ashish Tandon,Wouter Soer,Peter J. Schmidt,Benno Spinger,Parijat Deb,O.B. Shchekin,Werner Götz	2017	40
4	Advances in LEDs for automotive applications Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Jy Bhardwaj,Rao Peddada,Benno Spinger	2016	6
5	Advanced LED technology for automotive applications SPIE Newsroom ·Jy Bhardwaj,Rao Peddada,Benno Spinger	2016	2
6	Advances in PLC Technology for DWDM Applications B. Fondeur,Robert L. Brainard,D. J. Dougherty,Jy Bhardwaj	2006	2
7	Modeling and development of a deep silicon etch process for 200 mm election projection lithography mask fabrication Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ·William J. Dauksher,Stephen Clemens,Douglas J. Resnick,K. H. Smith,Pawitter J. S. Mangat,Shahid Rauf,Peter L. G. Ventzek,Hamza Ashraf,L. Lea,S. Hall,Ingrid Johnston,J. Hopkins,A. Chambers,Jy Bhardwaj	2001	6
8	Deep silicon etch modeling for fabrication of 200-mm SCALPEL masks Microelectronic Engineering ·William J. Dauksher,Stephen Clemens,Douglas J. Resnick,K. H. Smith,Pawitter J. S. Mangat,Shahid Rauf,Peter L. G. Ventzek,V. Arunachalam,B.N. Ramamurthi,Hamza Ashraf,L. Lea,S. Hall,Ingrid Johnston,J. Hopkins,Jy Bhardwaj	2001	8
9	ADVANCES IN DEEP OXIDE ETCH PROCESSING FOR MEMS – MASK SELECTION Jy Bhardwaj,Colin Welch,Anthony Barker,Ross Gunn,L. Lea,S. Watcham	2000	1
10	ADVANCES IN DEEP ANISOTROPIC SILICON ETCH PROCESSING FOR MEMS Hamza Ashraf,Jy Bhardwaj,S. Hall,J. Hopkins,A. Hynes,Ian Johnston,Serrita A. McAuley,Glenn Nicholls,Lilian Atabo,M. E. Ryan,S. Watcham	2000	8
11	<title>Etching 200-mm diameter SCALPEL masks with the ASE process</title> Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Ian Ronald Johnston,Huma Ashraf,Jy Bhardwaj,Janet Hopkins,A. Hynes,Glenn Nicholls,Serrita A. McAuley,S. Hall,Lilian Atabo,Gregory R. Bogart,A. Kornblit,Anthony E. Novembre	2000	7
12	Recent advances in silicon etching for MEMS using the ASE™ process Sensors and Actuators A Physical ·A. Hynes,Hamza Ashraf,Jy Bhardwaj,J. Hopkins,Ian W. Johnston,Jennifer N. Hanson Shepherd	1999	137
13	Defining Conditions for the Etching of Silicon in an Inductive Coupled Plasma Reactor MRS Proceedings ·Hamza Ashraf,Jy Bhardwaj,E. Guibarra,S. Hall,J. Hopkins,A. Hynes,Ian Johnston,L. Lea,Serrita A. McAuley,Glenn Nicholls,Paul O’Brien	1999	7
14	High Etch Rate Gallium Nitride Processing Using an Inductively Coupled Plasma Source physica status solidi (a) ·M. E. Ryan,Alessandra Conceição Leite Funchal Camacho,Jy Bhardwaj	1999	4
15	The Benefits of Process Parameter Ramping During The Plasma Etching of High Aspect Ratio Silicon Structures MRS Proceedings ·J. Hopkins,Hamza Ashraf,Jy Bhardwaj,A. Hynes,Ian Johnston,Jennifer N. Hanson Shepherd	1998	21
16	<title>Advanced silicon etching using high-density plasmas</title> Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Jy Bhardwaj,Huma Ashraf	1995	172
17	Photographic studies of the discharge development in a low-trigger-voltage vacuum switch IEEE Transactions on Electrical Insulation ·Jy Bhardwaj,P A Chatterton	1988	4

About Jy Bhardwaj

Jy Bhardwaj is a scholar working on Electrical and Electronic Engineering, Condensed Matter Physics and Surfaces, Coatings and Films, having authored 17 papers that have together received 431 indexed citations. Recurring topics across this work include Plasma Diagnostics and Applications (7 papers), Semiconductor materials and devices (5 papers), Advanced Surface Polishing Techniques (4 papers), Semiconductor Lasers and Optical Devices (4 papers), Advancements in Photolithography Techniques (3 papers), Engineering Applied Research (2 papers), Advanced MEMS and NEMS Technologies (2 papers) and Advanced optical system design (2 papers). The work is most often cited by research in Electrical and Electronic Engineering (315 citations), Surfaces, Coatings and Films (30 citations) and Biomedical Engineering (181 citations). Jy Bhardwaj has collaborated with scholars based in United Kingdom, United States and Germany. Frequent co-authors include Huma Ashraf, J. Hopkins, Hamza Ashraf, A. Hynes, Jennifer N. Hanson Shepherd, Ian W. Johnston, Ian Johnston, O.B. Shchekin, Ashish Tandon and Peter J. Schmidt. Their work appears in journals such as Sensors and Actuators A Physical, Microelectronic Engineering and physica status solidi (a).

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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