Peter L. G. Ventzek

2.4k total citations
102 papers, 1.9k citations indexed

About

Peter L. G. Ventzek is a scholar working on Electrical and Electronic Engineering, Mechanics of Materials and Materials Chemistry. According to data from OpenAlex, Peter L. G. Ventzek has authored 102 papers receiving a total of 1.9k indexed citations (citations by other indexed papers that have themselves been cited), including 93 papers in Electrical and Electronic Engineering, 41 papers in Mechanics of Materials and 23 papers in Materials Chemistry. Recurrent topics in Peter L. G. Ventzek's work include Plasma Diagnostics and Applications (60 papers), Semiconductor materials and devices (43 papers) and Metal and Thin Film Mechanics (31 papers). Peter L. G. Ventzek is often cited by papers focused on Plasma Diagnostics and Applications (60 papers), Semiconductor materials and devices (43 papers) and Metal and Thin Film Mechanics (31 papers). Peter L. G. Ventzek collaborates with scholars based in United States, Japan and Russia. Peter L. G. Ventzek's co-authors include Mark J. Kushner, Robert J. Hoekstra, R. M. Gilgenbach, Shahid Rauf, Alok Ranjan, Jeffrey A. Sell, Michael Grapperhaus, Timothy J. Sommerer, Laxminarayan L. Raja and Kazuki Denpoh and has published in prestigious journals such as Applied Physics Letters, Journal of Applied Physics and Journal of The Electrochemical Society.

In The Last Decade

Peter L. G. Ventzek

98 papers receiving 1.7k citations

Peers

Peter L. G. Ventzek
T.A. Grotjohn United States
Shahid Rauf United States
D. Vender Ireland
R. F. Fernsler United States
R. Pantel France
M. Favre Chile
H. R. Kaufman United States
M. Haverlag Netherlands
Arthur H. Guenther United States
T.A. Grotjohn United States
Peter L. G. Ventzek
Citations per year, relative to Peter L. G. Ventzek Peter L. G. Ventzek (= 1×) peers T.A. Grotjohn

Countries citing papers authored by Peter L. G. Ventzek

Since Specialization
Citations

This map shows the geographic impact of Peter L. G. Ventzek's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Peter L. G. Ventzek with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Peter L. G. Ventzek more than expected).

Fields of papers citing papers by Peter L. G. Ventzek

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Peter L. G. Ventzek. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Peter L. G. Ventzek. The network helps show where Peter L. G. Ventzek may publish in the future.

Co-authorship network of co-authors of Peter L. G. Ventzek

This figure shows the co-authorship network connecting the top 25 collaborators of Peter L. G. Ventzek. A scholar is included among the top collaborators of Peter L. G. Ventzek based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Peter L. G. Ventzek. Peter L. G. Ventzek is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Longo, Roberto C., H. Ueda, & Peter L. G. Ventzek. (2025). Precursor Adsorption and Surface-Mediated Decomposition Mechanisms in BN Growth on Si(001): Implications for Low-κ Dielectric Materials. ACS Applied Nano Materials. 8(15). 7669–7684. 1 indexed citations
2.
Longo, Roberto C., et al.. (2025). Functionalization of Polymer Surfaces for Organic Photoresist Materials. ACS Applied Materials & Interfaces. 17(4). 6913–6935. 1 indexed citations
3.
Huang, Shuo, et al.. (2023). Process optimization for shallow trench isolation etch using computational models. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 41(5). 4 indexed citations
4.
Zhao, Jianping, et al.. (2023). Ammonium chloride (–NH3+Cl-) salt formation from dichlorosilane decomposition and its potential impact on silicon nitride atomic layer deposition. Applied Surface Science. 629. 157432–157432. 3 indexed citations
5.
Longo, Roberto C., H. Ueda, Kyeongjae Cho, Alok Ranjan, & Peter L. G. Ventzek. (2022). Mechanisms for Graphene Growth on SiO2 Using Plasma-Enhanced Chemical Vapor Deposition: A Density Functional Theory Study. ACS Applied Materials & Interfaces. 14(7). 9492–9503. 9 indexed citations
6.
Chen, Zhiying, et al.. (2022). Time-resolved ion energy distribution in pulsed inductively coupled argon plasma with/without DC bias. Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena. 40(3). 6 indexed citations
7.
Lane, Barton, Roberto C. Longo, Laxminarayan L. Raja, Alok Ranjan, & Peter L. G. Ventzek. (2021). Cyclic Self-Limiting Etching of Organic Polymers. ACS Applied Polymer Materials. 3(7). 3636–3648. 1 indexed citations
8.
Chen, Zhiying, et al.. (2020). Factors influencing ion energy distributions in pulsed inductively coupled argon plasmas. Journal of Physics D Applied Physics. 53(33). 335202–335202. 4 indexed citations
9.
Longo, Roberto C., Peter L. G. Ventzek, Barton Lane, et al.. (2020). Interaction of oxygen with polystyrene and polyethylene polymer films: A mechanistic study. Journal of Applied Physics. 127(2). 22 indexed citations
10.
Longo, Roberto C., Alok Ranjan, & Peter L. G. Ventzek. (2020). Density Functional Theory Study of Oxygen Adsorption on Polymer Surfaces for Atomic-Layer Etching: Implications for Semiconductor Device Fabrication. ACS Applied Nano Materials. 3(6). 5189–5202. 29 indexed citations
11.
Upadhyay, Rochan, Kenta Suzuki, Laxminarayan L. Raja, Peter L. G. Ventzek, & Alok Ranjan. (2020). Experimentally validated computations of simultaneous ion and fast neutral energy and angular distributions in a capacitively coupled plasma reactor. Journal of Physics D Applied Physics. 53(43). 435209–435209. 10 indexed citations
12.
Ranjan, Alok & Peter L. G. Ventzek. (2019). Simulations of hybrid direct current radiofrequency (dc/rf) capacitively coupled plasmas. Japanese Journal of Applied Physics. 58(3). 36001–36001. 6 indexed citations
13.
Wang, Mingmei, Peter L. G. Ventzek, & Alok Ranjan. (2017). Quasiatomic layer etching of silicon oxide selective to silicon nitride in topographic structures using fluorocarbon plasmas. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 35(3). 15 indexed citations
14.
Yoshikawa, Jun & Peter L. G. Ventzek. (2013). Impact of static magnetic fields on the radial line slot antenna plasma source. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 31(3). 2 indexed citations
15.
Смирнов, В. В., et al.. (2005). Molecular-dynamics model of energetic fluorocarbon-ion bombardment on SiO2. II. CFx+ (x=1, 2, 3) ion etch characterization. Journal of Applied Physics. 97(9). 9 indexed citations
16.
Rauf, Shahid & Peter L. G. Ventzek. (2001). Ionized physical vapor deposition of Cu using a mixture of rare gases. Journal of Applied Physics. 89(5). 2535–2538. 3 indexed citations
17.
Yang, Jing, Peter L. G. Ventzek, Yoshio Sakai, et al.. (1997). Step and Pulsed Responses of RF Discharges. 1 indexed citations
18.
Ventzek, Peter L. G., et al.. (1996). A two-dimensional model of laser ablation of frozen Cl2: A possible neutral beam source for etching applications. Journal of Applied Physics. 80(2). 1146–1155. 2 indexed citations
19.
Ventzek, Peter L. G., Robert J. Hoekstra, & Mark J. Kushner. (1994). Two-dimensional modeling of high plasma density inductively coupled sources for materials processing. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 12(1). 461–477. 277 indexed citations
20.
Sell, Jeffrey A., et al.. (1991). Photoacoustic and photothermal beam deflection as a probe of laser ablation of materials. Journal of Applied Physics. 69(3). 1330–1336. 52 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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