J. N. Sasserath

507 total citations
23 papers, 401 citations indexed

About

J. N. Sasserath is a scholar working on Electrical and Electronic Engineering, Mechanics of Materials and Condensed Matter Physics. According to data from OpenAlex, J. N. Sasserath has authored 23 papers receiving a total of 401 indexed citations (citations by other indexed papers that have themselves been cited), including 21 papers in Electrical and Electronic Engineering, 5 papers in Mechanics of Materials and 4 papers in Condensed Matter Physics. Recurrent topics in J. N. Sasserath's work include Semiconductor materials and devices (21 papers), Plasma Diagnostics and Applications (10 papers) and Advancements in Semiconductor Devices and Circuit Design (7 papers). J. N. Sasserath is often cited by papers focused on Semiconductor materials and devices (21 papers), Plasma Diagnostics and Applications (10 papers) and Advancements in Semiconductor Devices and Circuit Design (7 papers). J. N. Sasserath collaborates with scholars based in United States, South Korea and Taiwan. J. N. Sasserath's co-authors include Henri Jansen, Han Gardeniers, Michael Curt Elwenspoek, Meint J. de Boer, G. Roelofs, S. J. Pearton, F. Ren, Kenneth D. Mackenzie, D. J. Johnson and Ebrahim Ghanbari and has published in prestigious journals such as Journal of Applied Physics, Journal of The Electrochemical Society and Applied Surface Science.

In The Last Decade

J. N. Sasserath

21 papers receiving 384 citations

Peers

Countries citing papers authored by J. N. Sasserath

Since Specialization

Citations

This map shows the geographic impact of J. N. Sasserath's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by J. N. Sasserath with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites J. N. Sasserath more than expected).

Fields of papers citing papers by J. N. Sasserath

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by J. N. Sasserath. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by J. N. Sasserath. The network helps show where J. N. Sasserath may publish in the future.

Co-authorship network of co-authors of J. N. Sasserath

This figure shows the co-authorship network connecting the top 25 collaborators of J. N. Sasserath. A scholar is included among the top collaborators of J. N. Sasserath based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with J. N. Sasserath. J. N. Sasserath is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

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20 of 20 papers shown

#	Work	Indexed citations
1	Direct Write Patterning of Microchannels 2003 ·(unknown), David Fries, (unknown), (unknown), Eric Kaltenbacher, J. N. Sasserath	2
2	Development of advanced plasma process with an optical emission spectroscopy-based end-point technique for etching of AlGaAs over GaAs in manufacture of heterojunction bipolar transistors 2002 ·Solid-State Electronics ·(unknown), Minhyon Jeon, (unknown), (unknown), (unknown), (unknown), (unknown), D. Johnson, J. N. Sasserath, S. J. Pearton	5
3	New contact process using soft etch for stable ohmic characteristics and its application to 0.1 micron CMOS devices 2002 ·Hirofumi Sumi, (unknown), Yasushi Sugano, J. N. Sasserath	1
4	Guidelines for etching silicon MEMS structures using fluorine high-density plasmas at cryogenic temperatures 2002 ·Journal of Microelectromechanical Systems ·Meint J. de Boer, Han Gardeniers, Henri Jansen, (unknown), (unknown), G. Roelofs, J. N. Sasserath, Michael Curt Elwenspoek	210
5	Comparison of the effects of H2 and D2 plasma exposure on GaAs MESFETs 2001 ·Solid-State Electronics ·B. Luo, F. Ren, K.P. Lee, S. J. Pearton, (unknown), D. Johnson, J. N. Sasserath	1
6	Understanding of etch mechanism and etch depth distribution in inductively coupled plasma etching of GaAs 2001 ·Solid-State Electronics ·(unknown), Minhyon Jeon, (unknown), Kenneth D. Mackenzie, D. Johnson, J. N. Sasserath, S. J. Pearton, F. Ren, R. J. Shul	8
7	Advanced selective dry etching of GaAs/AlGaAs in high density inductively coupled plasmas 2000 ·Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ·(unknown), (unknown), (unknown), D. Johnson, J. N. Sasserath, (unknown), David C. Hays, S. J. Pearton	43
8	Selective dry etching of InGaP over GaAs in inductively coupled plasmas 2000 ·Journal of Electronic Materials ·(unknown), H. Cho, David C. Hays, (unknown), (unknown), (unknown), D. Johnson, J. N. Sasserath, C. R. Abernathy, S. J. Pearton	6
9	The effect of N2 plasma damage on AlGaAs/InGaAs/GaAs high electron mobility transistors. I. DC characteristics 2000 ·Solid-State Electronics ·Vishal Trivedi, (unknown), B. Luo, X. A. Cao, (unknown), F. Ren, S. J. Pearton, C. R. Abernathy, E. S. Lambers, (unknown), (unknown), J. N. Sasserath, (unknown), Katrin Mackenzie	5
10	High selectivity Inductively Coupled Plasma etching of GaAs over InGaP 2000 ·Applied Surface Science ·David C. Hays, (unknown), (unknown), (unknown), (unknown), D. J. Johnson, J. N. Sasserath, (unknown), Emmanuel F. A. Toussaint, F. Ren, C. R. Abernathy, S. J. Pearton	6
11	Low Temperature Silicon Nitride and Silicon Dioxide Film Processing by Inductively Coupled Plasma Chemical Vapor Deposition 2000 ·Journal of The Electrochemical Society ·(unknown), Kenneth D. Mackenzie, D. J. Johnson, J. N. Sasserath, S. J. Pearton, F. Ren	50
12	Development of Low Temperature Silicon Nitride and Silicon Dioxide Films by Inductively-Coupled Plasma Chemical Vapor Deposition 1999 ·MRS Proceedings ·(unknown), Kenneth D. Mackenzie, D. Johnson, S. J. Pearton, F. Ren, J. N. Sasserath	4
13	New optical sensor for real-time in-situ end point monitoring during dry etching of III-V ternary multistack layers 1999 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·(unknown), (unknown), Jewon Lee, (unknown), D. J. Johnson, John F. Donohue, J. N. Sasserath, S. J. Pearton	1
14	Optimization of Contact Process with Monte Carlo Study for Advanced CMOS Devices 1996 ·Japanese Journal of Applied Physics ·Hirofumi Sumi, (unknown), (unknown), Yuji Ikeda, Satoru Kishida, Heizō Tokutaka, J. N. Sasserath	1
15	<title>Improved PVD TiW manufacturability using advanced chamber shield design</title> 1994 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·J. N. Sasserath, (unknown)	0
16	Magnetron reactive ion etching of GaAs in a BCl3 discharge 1993 ·Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ·G. F. McLane, M. Meyyappan, (unknown), M. W. Cole, D. W. Eckart, R. T. Lareau, (unknown), J. N. Sasserath	3
17	Magnetically enhanced etching of sub-0.5 μm polysilicon gates 1992 ·Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ·(unknown), J. N. Sasserath, Ebrahim Ghanbari	19
18	Magnetron etching of GaAs: Etch characteristics and surface characterization 1992 ·Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ·M. Meyyappan, G. F. McLane, M. W. Cole, (unknown), (unknown), J. N. Sasserath, (unknown)	8
19	Low Damage Magnetron Reactive Ion Etching of GaAs 1991 ·MRS Proceedings ·G. F. McLane, M. Meyyappan, M. W. Cole, (unknown), R. T. Lareau, (unknown), J. N. Sasserath	0
20	Dry etching of niobium using CCl2F2 and CF4: A comparison 1990 ·Journal of Applied Physics ·J. N. Sasserath	3

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