Anthony E. Novembre

806 total citations
86 papers, 525 citations indexed

About

Anthony E. Novembre is a scholar working on Electrical and Electronic Engineering, Surfaces, Coatings and Films and Biomedical Engineering. According to data from OpenAlex, Anthony E. Novembre has authored 86 papers receiving a total of 525 indexed citations (citations by other indexed papers that have themselves been cited), including 79 papers in Electrical and Electronic Engineering, 43 papers in Surfaces, Coatings and Films and 27 papers in Biomedical Engineering. Recurrent topics in Anthony E. Novembre's work include Advancements in Photolithography Techniques (72 papers), Electron and X-Ray Spectroscopy Techniques (42 papers) and Integrated Circuits and Semiconductor Failure Analysis (23 papers). Anthony E. Novembre is often cited by papers focused on Advancements in Photolithography Techniques (72 papers), Electron and X-Ray Spectroscopy Techniques (42 papers) and Integrated Circuits and Semiconductor Failure Analysis (23 papers). Anthony E. Novembre collaborates with scholars based in United States, Germany and Japan. Anthony E. Novembre's co-authors include Elsa Reichmanis, Leonidas E. Ocola, Roxann L. Engelstad, Mark A. Hartney, W. K. Waskiewicz, Edward G. Lovell, Omkaram Nalamasu, J. Alexander Liddle, William Semke and Francis M. Houlihan and has published in prestigious journals such as Applied Physics Letters, Chemistry of Materials and Polymer Engineering and Science.

In The Last Decade

Anthony E. Novembre

81 papers receiving 460 citations

Peers

Countries citing papers authored by Anthony E. Novembre

Since Specialization

Citations

This map shows the geographic impact of Anthony E. Novembre's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Anthony E. Novembre with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Anthony E. Novembre more than expected).

Fields of papers citing papers by Anthony E. Novembre

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Anthony E. Novembre. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Anthony E. Novembre. The network helps show where Anthony E. Novembre may publish in the future.

Co-authorship network of co-authors of Anthony E. Novembre

This figure shows the co-authorship network connecting the top 25 collaborators of Anthony E. Novembre. A scholar is included among the top collaborators of Anthony E. Novembre based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Anthony E. Novembre. Anthony E. Novembre is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

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20 of 20 papers shown

#	Work	Indexed citations
1	Space-charge effects in projection electron-beam lithography: Results from the SCALPEL proof-of-lithography system 2001 ·Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ·J. Alexander Liddle, Myrtle I. Blakey, (unknown), R. C. Farrow, Gregg M. Gallatin, Richard Kasica, (unknown), (unknown), (unknown), (unknown), Anthony E. Novembre, Leonidas E. Ocola, (unknown), Milton L. Peabody, (unknown), (unknown), W. K. Waskiewicz, Eric Munro	8
2	Monte Carlo study of high performance resists for SCALPEL nanolithography 2000 ·Microelectronic Engineering ·Leonidas E. Ocola, (unknown), Richard Kasica, Myrtle I. Blakey, (unknown), W. K. Waskiewicz, Anthony E. Novembre, Masaru Sato	10
3	SCALPEL mask-membrane charging 1999 ·Microelectronic Engineering ·(unknown), A. Gasparyan, K. Andre Mkhoyan, A. Liddle, Anthony E. Novembre, David A. Muller	5
4	CMOS compatible alignment marks for the SCALPEL proof of lithography tool 1999 ·Microelectronic Engineering ·R. C. Farrow, W. K. Waskiewicz, I.C. Kizilyalli, Leonidas E. Ocola, (unknown), (unknown), Gregg M. Gallatin, (unknown), Myrtle I. Blakey, J. S. Kraus, Anthony E. Novembre, (unknown), Milton L. Peabody, Richard Kasica, A. Kornblit, F. Klemens	2
5	Thin film stress mapping using an integrated sensor 1999 ·Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ·(unknown), (unknown), Roxann L. Engelstad, Edward G. Lovell, J. Alexander Liddle, Anthony E. Novembre	5
6	Finite element modeling of SCALPEL masks 1999 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Roxann L. Engelstad, Edward G. Lovell, (unknown), Carl J. Martin, (unknown), William Semke, James A. Liddle, Anthony E. Novembre	80
7	Electron scattering and transmission through SCALPEL masks 1998 ·Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ·(unknown), J. Alexander Liddle, Anthony E. Novembre, W. K. Waskiewicz, G. P. Watson, L. R. Harriott, David A. Muller	21
8	Positive-tone processing of plasma-polymerized methylsilane (PPMS) 1998 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Gary Dabbagh, Richard S. Hutton, Raymond A. Cirelli, Elsa Reichmanis, Anthony E. Novembre, Omkaram Nalamasu	1
9	New Developments in Resist Materials for the SCALPEL Technology 1998 ·Journal of Photopolymer Science and Technology ·Anthony E. Novembre, Leonidas E. Ocola, F. M. Houlihan, (unknown), Myrtle I. Blakey	5
10	Photon tunneling microscopy of latent resist images 1997 ·Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ·Joyce Liddle, (unknown), R. Cirelli, (unknown), Anthony E. Novembre, Milton L. Peabody, G. P. Watson	2
11	Yield, metrology, and inspection characteristics of SCALPEL masks 1997 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Milton L. Peabody, Myrtle I. Blakey, R. C. Farrow, Richard Kasica, J. Alexander Liddle, Anthony E. Novembre, (unknown), D. M. Tennant, David L. Windt	1
12	<title>Patterning of membrane masks for projection e-beam lithography</title> 1996 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Linus A. Fetter, (unknown), Myrtle I. Blakey, J. Alexander Liddle, Milton L. Peabody, Anthony E. Novembre, D. M. Tennant	1
13	Resist Design Considerations for Direct Write and Projection Electron-Beam Lithography Technologies. 1996 ·Journal of Photopolymer Science and Technology ·Anthony E. Novembre, (unknown), (unknown), (unknown), Myrtle I. Blakey, (unknown), Linus A. Fetter, L. R. Harriott, H. A. Huggins, (unknown), J. Alexander Liddle, (unknown), Milton L. Peabody	1
14	The electron-beam and x-ray lithographic performance of the high resolution CAMP and ARCH family of chemically amplified resists 1996 ·Microelectronic Engineering ·Anthony E. Novembre, (unknown)	3
15	Electron-beam and x-ray lithographic characteristics of the optical resist ARCH 1995 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Anthony E. Novembre, (unknown), Omkaram Nalamasu, Linus A. Fetter, (unknown), (unknown), (unknown), (unknown)	0
16	Identification of sensitive positive and negative working resist materials for proximity X-ray lithography 1995 ·Microelectronic Engineering ·Anthony E. Novembre, J. M. Kometani, (unknown), (unknown), Thomas X. Neenan, (unknown), Omkaram Nalamasu, (unknown)	1
17	Lithographic performance of a negative resist under scattering with angular limitation for projection electron lithography exposure at 100 keV 1994 ·Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ·(unknown), (unknown), Myrtle I. Blakey, (unknown), R. C. Farrow, Linus A. Fetter, H. A. Huggins, J. S. Kraus, Joyce Liddle, (unknown), Anthony E. Novembre, G. P. Watson, S. D. Berger	1
18	Evaluation of a laser-based proximity x-ray stepper 1992 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·G. K. Celler, J. Frackoviak, R. R. Freeman, C. W. Jurgensen, R. R. Kola, Anthony E. Novembre, (unknown), (unknown), (unknown)	1
19	Lithographic properties of chemically amplified resists based on copolymers of 4-tert-butoxycarbonyloxystyrene (TBS) and sulfur dioxide (SO2) 1992 ·Microelectronic Engineering ·Anthony E. Novembre, James E. Hanson, J. M. Kometani, (unknown), Omkaram Nalamasu, Gary N. Taylor, Elsa Reichmanis, L. F. Thompson, (unknown)	1
20	Preparation And Lithographic Properties Of Poly(Trimethylsilylmethyl Methacrylate-Co-Chloromethyl Styrene) 1986 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Anthony E. Novembre, Elsa Reichmanis, (unknown)	5

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