T. Iwabuchi

558 total citations
31 papers, 422 citations indexed

About

T. Iwabuchi is a scholar working on Electrical and Electronic Engineering, Materials Chemistry and Condensed Matter Physics. According to data from OpenAlex, T. Iwabuchi has authored 31 papers receiving a total of 422 indexed citations (citations by other indexed papers that have themselves been cited), including 28 papers in Electrical and Electronic Engineering, 11 papers in Materials Chemistry and 4 papers in Condensed Matter Physics. Recurrent topics in T. Iwabuchi's work include Semiconductor materials and devices (20 papers), Advancements in Semiconductor Devices and Circuit Design (9 papers) and Integrated Circuits and Semiconductor Failure Analysis (7 papers). T. Iwabuchi is often cited by papers focused on Semiconductor materials and devices (20 papers), Advancements in Semiconductor Devices and Circuit Design (9 papers) and Integrated Circuits and Semiconductor Failure Analysis (7 papers). T. Iwabuchi collaborates with scholars based in Japan and United States. T. Iwabuchi's co-authors include Hisashi Fukuda, Makoto Yasuda, Seigo Ohno, Ichiro Koiwa, Tetsuya Ōsaka, Sachiko Ono, Akira Uchiyama, Masakatsu Maeda, Tomo Ueno and Iwao Ohdomari and has published in prestigious journals such as Applied Physics Letters, Journal of Applied Physics and Journal of The Electrochemical Society.

In The Last Decade

T. Iwabuchi

28 papers receiving 406 citations

Peers

T. Iwabuchi

EEE

EOMM

AMPO

Tomo Ueno Japan

P. Y. Hung United States

B. Roberds United States

I. Kawanabe Japan

C. Huffman United States

D.N. Kouvatsos Greece

Chih Hang Tung Singapore

N. Buffet France

Yoshihiro Todokoro Japan

Pyung Moon South Korea

Tomo Ueno Japan

T. Iwabuchi

288 ×0.8

EEE

217 ×1.1

54 ×0.7

61 ×1.0

EOMM

61 ×1.4

AMPO

Citations per year, relative to T. Iwabuchi T. Iwabuchi (= 1×) peers Tomo Ueno

Countries citing papers authored by T. Iwabuchi

Since Specialization

Citations

This map shows the geographic impact of T. Iwabuchi's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by T. Iwabuchi with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites T. Iwabuchi more than expected).

Fields of papers citing papers by T. Iwabuchi

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by T. Iwabuchi. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by T. Iwabuchi. The network helps show where T. Iwabuchi may publish in the future.

Co-authorship network of co-authors of T. Iwabuchi

This figure shows the co-authorship network connecting the top 25 collaborators of T. Iwabuchi. A scholar is included among the top collaborators of T. Iwabuchi based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with T. Iwabuchi. T. Iwabuchi is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

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20 of 20 papers shown

Kimura, Ken, et al.. (2003). Assessment of remaining insulation life of high voltage induction motors. 2 183. 295–299. 3 indexed citations

Tanaka, Akira, et al.. (2003). Optimization of amorphous layer thickness and junction depth on the pre-amorphization method for forming shallow-junction in silicon. a45. 785–788.

Uchiyama, Akira, Hisashi Fukuda, T. Hayashi, T. Iwabuchi, & Seigo Ohno. (2002). High performance dual-gate sub-halfmicron CMOSFETs with 6 nm-thick nitride SiO/sub 2/ films in an N/sub 2/O ambient. 425–428. 9 indexed citations

Koiwa, Ichiro, et al.. (1997). Orientation Control of Sr_0.7Bi_2.3Ta₂O_9+α Thin Films by Chemical Liquid Deposition. Japanese Journal of Applied Physics. 36(3S). 1597–1597. 20 indexed citations

Ono, Sachiko, Akira Sakakibara, Tetsuya Ōsaka, et al.. (1997). Correlation Between Composition, Microstructure, and Ferroelectric Properties of SrBi2Ta2 O 9 Thin Films. Journal of The Electrochemical Society. 144(7). L185–L187. 13 indexed citations

Koiwa, Ichiro, et al.. (1996). Crystallization of Sr_0.7Bi_2.3Ta₂O_9+α Thin Films by Chemical Liquid Deposition. Japanese Journal of Applied Physics. 35(9S). 4946–4946. 56 indexed citations

Hayashi, T., et al.. (1993). High performance scaled flash-type EEPROMs fabricated by in situ multiple rapid thermal processing. Electronics Letters. 29(25). 2178–2179. 1 indexed citations

Fukuda, Hisashi, T. Hayashi, Akira Uchiyama, & T. Iwabuchi. (1993). Determination of trapped oxide charge in flash-type EEPROMs with heavily oxynitrided tunnel oxide films. Electronics Letters. 29(11). 947–949. 6 indexed citations

Fukuda, Hisashi, et al.. (1993). Characterisation of poly-Si/SiO ₂ /Si(100) structure by variable-angle spectroscopic ellipsometry. Electronics Letters. 29(20). 1758–1759. 2 indexed citations

10.

Fukuda, Hisashi, Makoto Yasuda, & T. Iwabuchi. (1992). Oxide wearout phenomena of ultrathin SiO ₂ film during high-field stress. Electronics Letters. 28(16). 1516–1518. 5 indexed citations

11.

Fukuda, Hisashi, et al.. (1992). Heavy oxynitridation technology for forming highly reliable flash-type EEPROM tunnel oxide films. Electronics Letters. 28(19). 1781–1783. 5 indexed citations

12.

Fukuda, Hisashi, Makoto Yasuda, T. Iwabuchi, et al.. (1992). Process dependence of the SiO2/Si(100) interface trap density of ultrathin SiO2 films. Journal of Applied Physics. 72(5). 1906–1911. 33 indexed citations

13.

Fukuda, Hisashi, Makoto Yasuda, & T. Iwabuchi. (1992). Kinetics of Rapid Thermal Oxidation of Silicon. Japanese Journal of Applied Physics. 31(10R). 3436–3436. 15 indexed citations

14.

Fukuda, Hisashi, Makoto Yasuda, & T. Iwabuchi. (1992). Characterization of SiO2/Si(100) interface structure of ultrathin SiO2 films using spatially resolved electron energy loss spectroscopy. Applied Physics Letters. 61(6). 693–695. 38 indexed citations

15.

Yasuda, Makoto, Hisashi Fukuda, T. Iwabuchi, & Seigo Ohno. (1991). Role of SiN Bond Formed by N₂O-Oxynitridation for Improving Dielectric Properties of Ultrathin SiO₂ Films. Japanese Journal of Applied Physics. 30(12S). 3597–3597. 32 indexed citations

16.

Yasuda, Makoto, Hisashi Fukuda, T. Iwabuchi, & Seigo Ohno. (1991). Role of SiN Bond Formed by N2O-Oxynitridation for Improving Dielectric Properties of Ultrathin SiO2 Films. 2 indexed citations

17.

Hayashi, T., Morifumi Ohno, Akira Uchiyama, et al.. (1991). Effectiveness of N/sub 2/O-nitrided gate oxide for high-performance CMOSFETs. IEEE Transactions on Electron Devices. 38(12). 2711–2711. 1 indexed citations

18.

Tanaka, Akira, et al.. (1990). Optimization of the Amorphous Layer Thickness and the Junction Depth in the Preamorphization Method for Shallow-Junction Formation. Japanese Journal of Applied Physics. 29(2A). L191–L191. 6 indexed citations

19.

Kimura, Ken, et al.. (1990). Fundamentals-a useful index for estimating residual life of motor insulation. IEEE Electrical Insulation Magazine. 6(2). 29–32. 9 indexed citations

20.

Fukuda, Hisashi, T. Iwabuchi, & Seigo Ohno. (1988). The Dielectric Reliability of Very Thin SiO_2 Films Grown by Rapid Thermal Processing : Silicon Devices and Process Technologies( Solid State Devices and Materials 1). Japanese Journal of Applied Physics. 27(11). 2 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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