I. Kawanabe

628 total citations
7 papers, 444 citations indexed

About

I. Kawanabe is a scholar working on Electrical and Electronic Engineering, Surfaces, Coatings and Films and Industrial and Manufacturing Engineering. According to data from OpenAlex, I. Kawanabe has authored 7 papers receiving a total of 444 indexed citations (citations by other indexed papers that have themselves been cited), including 5 papers in Electrical and Electronic Engineering, 2 papers in Surfaces, Coatings and Films and 1 paper in Industrial and Manufacturing Engineering. Recurrent topics in I. Kawanabe's work include Semiconductor materials and devices (4 papers), Advanced MEMS and NEMS Technologies (2 papers) and Advancements in Semiconductor Devices and Circuit Design (2 papers). I. Kawanabe is often cited by papers focused on Semiconductor materials and devices (4 papers), Advanced MEMS and NEMS Technologies (2 papers) and Advancements in Semiconductor Devices and Circuit Design (2 papers). I. Kawanabe collaborates with scholars based in Japan and United States. I. Kawanabe's co-authors include M. Miyashita, T. Ohmi, M. Itano, Takashi Imaoka, Nobuhiko Miki, Junichi Takano and Minoru Waki and has published in prestigious journals such as Journal of The Electrochemical Society, IEEE Transactions on Electron Devices and IEEE Transactions on Semiconductor Manufacturing.

In The Last Decade

I. Kawanabe

7 papers receiving 413 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
I. Kawanabe Japan 7 371 138 124 72 39 7 444
T. Iwabuchi Japan 11 366 1.0× 204 1.5× 76 0.6× 43 0.6× 14 0.4× 31 422
E. Terzini Italy 8 418 1.1× 294 2.1× 64 0.5× 101 1.4× 27 0.7× 26 472
N. Buffet France 12 393 1.1× 213 1.5× 132 1.1× 101 1.4× 14 0.4× 29 452
Chee-Leong Lee Malaysia 9 167 0.5× 184 1.3× 104 0.8× 86 1.2× 32 0.8× 20 319
Martin Steglich Germany 11 235 0.6× 197 1.4× 174 1.4× 51 0.7× 26 0.7× 16 354
Ralph Kurt Switzerland 9 119 0.3× 330 2.4× 108 0.9× 48 0.7× 27 0.7× 12 414
P. Y. Hung United States 10 519 1.4× 228 1.7× 58 0.5× 76 1.1× 15 0.4× 29 576
W. van Gelder United States 6 235 0.6× 74 0.5× 54 0.4× 97 1.3× 25 0.6× 8 280
D.N. Kouvatsos Greece 12 551 1.5× 370 2.7× 153 1.2× 74 1.0× 35 0.9× 69 625
Frédéric Dross Belgium 14 555 1.5× 200 1.4× 227 1.8× 150 2.1× 17 0.4× 48 613

Countries citing papers authored by I. Kawanabe

Since Specialization
Citations

This map shows the geographic impact of I. Kawanabe's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by I. Kawanabe with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites I. Kawanabe more than expected).

Fields of papers citing papers by I. Kawanabe

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by I. Kawanabe. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by I. Kawanabe. The network helps show where I. Kawanabe may publish in the future.

Co-authorship network of co-authors of I. Kawanabe

This figure shows the co-authorship network connecting the top 25 collaborators of I. Kawanabe. A scholar is included among the top collaborators of I. Kawanabe based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with I. Kawanabe. I. Kawanabe is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

7 of 7 papers shown
1.
Waki, Minoru, et al.. (1992). Etching Rate and Mechanism of Doped Oxide in Buffered Hydrogen Fluoride Solution. Journal of The Electrochemical Society. 139(8). 2239–2243. 34 indexed citations
2.
Ohmi, T., M. Miyashita, M. Itano, Takashi Imaoka, & I. Kawanabe. (1992). Dependence of thin-oxide films quality on surface microroughness. IEEE Transactions on Electron Devices. 39(3). 537–545. 213 indexed citations
3.
Itano, M., et al.. (1992). Particle deposition and removal in wet cleaning processes for ULSI manufacturing. IEEE Transactions on Semiconductor Manufacturing. 5(2). 114–120. 24 indexed citations
4.
Miki, Nobuhiko, et al.. (1991). Principles of wet chemical processing in ULSI microfabrication. IEEE Transactions on Semiconductor Manufacturing. 4(1). 26–35. 71 indexed citations
5.
Miyashita, M., M. Itano, Takashi Imaoka, I. Kawanabe, & T. Ohmi. (1991). Dependence of Thin Oxide Films Quality on Surface Micro-Roughness. 45–46. 27 indexed citations
6.
Miki, Nobuhiko, et al.. (1990). Gas-phase selective etching of native oxide. IEEE Transactions on Electron Devices. 37(1). 107–115. 53 indexed citations
7.
Miki, Nobuhiko, et al.. (1990). Surface active buffered hydrogen fluoride having excellent wettability for ULSI processing. IEEE Transactions on Semiconductor Manufacturing. 3(3). 99–108. 22 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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