C.M. Leewis

18 papers receiving 336 citations

Peers

C.M. Leewis
Comparison fields: 5 of 40
  • Surfaces, Coatings and Films 38
  • Materials Chemistry 156
  • Electronic, Optical and Magnetic Materials 62
  • Electrical and Electronic Engineering 175
  • Catalysis 20
Replace Jih‐Shang Hwang with:
Jih‐Shang Hwang Taiwan
Shin‐ichi Iida Japan
Luke M. Davis United States
J. D’Arcy-Gall United States
Nick F. W. Thissen Netherlands
Lu‐Sheng Hong Taiwan
M. Kruft Germany
Oliver Picht Germany
Florian Gstrein United States
Benjamin L. Clark United States
C.M. Leewis relative to Jih‐Shang Hwang Taiwan Jih‐Shang Hwang's profile →
Citations per field
00.5×1.5×
Jih‐Shang Hwang · 1×
Citations per year

Countries citing papers authored by C.M. Leewis

Since Specialization
Citations

This map shows the geographic impact of C.M. Leewis's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by C.M. Leewis with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites C.M. Leewis more than expected).

Fields of papers citing papers by C.M. Leewis

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by C.M. Leewis. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by C.M. Leewis. The network helps show where C.M. Leewis may publish in the future.

Co-authorship network

The 25 scholars most cited alongside C.M. Leewis, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with C.M. Leewis Line = papers co-authored together C.M. Leewis links everyone, so they are left out of the graph.

All Works

19 of 19 papers shown
#Work
1 20200
2 20155
3 20133
4 20134
5 20096
6 20069
7 200630
8 20066
9 200523
10 200420
11 20045
12 200455
13 200421
14 20033
15 200238
16 200114
17 20009
18 199920
19 199972

About C.M. Leewis

C.M. Leewis is a scholar working on Surfaces, Coatings and Films, Catalysis, Electrical and Electronic Engineering, Atomic and Molecular Physics, and Optics and Bioengineering, having authored 19 papers that have together received 343 indexed citations. Recurring topics across this work include Advancements in Photolithography Techniques (5 papers), Thin-Film Transistor Technologies (4 papers), Silicon Nanostructures and Photoluminescence (4 papers), Photorefractive and Nonlinear Optics (4 papers), Ion-surface interactions and analysis (3 papers), Catalytic Processes in Materials Science (3 papers), Photonic and Optical Devices (3 papers) and Optical Coatings and Gratings (3 papers). The work is most often cited by research in Surfaces, Coatings and Films (38 citations), Materials Chemistry (156 citations), Electronic, Optical and Magnetic Materials (62 citations), Electrical and Electronic Engineering (175 citations) and Catalysis (20 citations). C.M. Leewis has collaborated with scholars based in Netherlands, Belgium and United States. Frequent co-authors include M. C. M. van de Sanden, W. M. M. Kessels, Dirk J. Broer, L.J. van IJzendoorn, Arthur M. de Jong, D. C. Schram, J. W. Niemantsverdriet, J. J. H. Gielis, Johan Lub and B. M. I. van der Zande. Their work appears in journals such as Journal of Applied Physics, Applied Surface Science, Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms, Journal of Vacuum Science & Technology A Vacuum Surfaces and Films and Applied Physics Letters.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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2026