C. Cabral

6.1k citations

153 papers · 4.8k indexed · 1 hit paper · h-index 34

Electronic, Optical and Magnetic Materials top 1%
- Copper Interconnects and Reliability 47
Electrical and Electronic Engineering top 1%
- Semiconductor materials and devices 67
- Silicon and Solar Cell Technologies 16
- Integrated Circuits and Semiconductor Failure Analysis 15
- Electronic Packaging and Soldering Technologies 15
Atomic and Molecular Physics, and Optics top 1%
- Semiconductor materials and interfaces 66
Mechanics of Materials top 1%
- Metal and Thin Film Mechanics 24
Materials Chemistry top 5%
Mechanical Engineering
- Intermetallics and Advanced Alloy Properties 21

Co-authors: J. M. E. Harper C. Lavoie F. M. d’Heurle Katayun Barmak Christophe Detavernier L. A. Clevenger Jean Jordan‐Sweet M. Copel
Cited by: Electronic, Optical and Magnetic Materials Electrical and Electronic Engineering Atomic and Molecular Physics, and Optics
Journals: Journal of Applied Physics (27 papers)Applied Physics Letters (15 papers)Journal of materials research/Pratt's guide to venture capital sources (9 papers)
Partner nations: United States Germany Sweden

In The Last Decade

C. Cabral

151 papers receiving 4.5k citations

Hit Papers

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Peers

Countries citing papers authored by C. Cabral

Since Specialization

Citations

This map shows the geographic impact of C. Cabral's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by C. Cabral with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites C. Cabral more than expected).

Fields of papers citing papers by C. Cabral

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by C. Cabral. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by C. Cabral. The network helps show where C. Cabral may publish in the future.

Co-authorship network

The 25 scholars most cited alongside C. Cabral, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with C. Cabral Line = papers co-authored together C. Cabral links everyone, so they are left out of the graph.

All Works

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20 of 20 papers shown

#	Work
1	3-D Die Stacking With 55 μm Pitch Interconnections on Advanced Ground-Rule Laminate for Artificial Intelligence System IEEE Transactions on Components Packaging and Manufacturing Technology ·Katsuyuki Sakuma,Erstes Intermezzo,Paul Andry,C. Cabral,Kathleen McAllen,Y-C Gu,R. Divakaruni	2021	4
2	Resistive Random Access Memory Filament Visualization and Characterization Using Photon Emission Microscopy IEEE Electron Device Letters ·Franco Stellari,Ernest Y. Wu,Takashi Ando,E. Cartier,Martin M. Frank,C. Cabral,Peilin Song,Dirk Pfeiffer	2021	5
3	Dust‐Sized High‐Power‐Density Photovoltaic Cells on Si and SOI Substrates for Wafer‐Level‐Packaged Small Edge Computers Advanced Materials ·Ning Li,きぬ子横井,杨焕章,Stephen W. Bedell,Jinhan Ren,Oki Gunawan,J. A. Ott,Marinus Hopstaken,C. Cabral,Frank Libsch,Toshihiro Nakajima,G. Shahidi,D. K. Sadana	2020	8
4	Characterization of room temperature recrystallization kinetics in electroplated copper thin films with concurrent x-ray diffraction and electrical resistivity measurements Journal of Applied Physics ·Giulia Reimann,Christian Witt,C. Cabral,Conal E. Murray,Jean Jordan‐Sweet,R. Rosenberg,Eric Eisenbraun,I. C. Noyan	2013	7
5	Crystallization Characteristics of Ge-Sb Phase Change Materials MRS Proceedings ·Simone Raoux,C. Cabral,L. Krusin‐Elbaum,Jean Jordan‐Sweet,Martin Salinga,Anita Madan,Wiktoria Sowińska	2009	3
6	Irreversible modification of Ge2Sb2Te5 phase change material by nanometer-thin Ti adhesion layers in a device-compatible stack Applied Physics Letters ·C. Cabral,Kuan‐Neng Chen,L. Krusin‐Elbaum,V. R. Deline	2007	73
7	Texture of TiSi2 thin films on Si (001) Journal of Applied Physics ·Ahmet S. Özcan,Karl Ludwig,Ermes Giuzio,C. Lavoie,C. Cabral,J. M. E. Harper	2002	25
8	Cu and Dilute Binary Cu(Ti), Cu(Sn) and Cu(Al) Thin Films: Texture, Grain Growth and Resistivity MRS Proceedings ·Dirk Basart,Katayun Barmak,Anthony D. Rollett,C. Cabral,J. M. E. Harper	2002	2
9	Texture and resistivity of dilute binary Cu(Al), Cu(In), Cu(Ti), Cu(Nb), Cu(Ir), and Cu(W) alloy thin films Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ·Dirk Basart,Katayun Barmak,Anthony D. Rollett,C. Cabral,J. M. E. Harper	2002	18
10	Formation of C54 TiSi2: Effects of niobium additions on the apparent activation energy Journal of Applied Physics ·F. M. d’Heurle,R Sivakumar,C. Lavoie,P. Gas,C. Cabral,J. M. E. Harper	2001	5
11	Dissociation of dilute immiscible copper alloy thin films Journal of Applied Physics ·Katayun Barmak,G. Lucadamo,C. Cabral,C. Lavoie,J. M. E. Harper	2000	48
12	Effects of annealing conditions on charge loss mechanisms in MOCVD Ba0·7Sr0·3TiO3 thin film capacitors Journal of the European Ceramic Society ·J. D. Baniecki,R. B. Laibowitz,T. M. Shaw,K. L. Saenger,P. R. Duncombe,C. Cabral,David E. Kotecki,Haibo Shen,Yasutaka Akitsu,Q.Y. Ma	1999	44
13	The Future Of Silicide For CMOS Contacts MRS Proceedings ·R. Roy,C. Cabral,C. Lavoie	1999	10
14	Evidence of a two-stage reaction mechanism in sputter deposited Nb/Al multilayer thin-films studied by in situ synchrotron X-ray diffraction Materials Letters ·G. Lucadamo,Katayun Barmak,Seungmin Hyun,C. Cabral,C. Lavoie	1999	20
15	Interdiffusion studies of single crystal TiN/NbN superlattice thin films Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ·Álvaro Foresti,Jens Birch,Lars Hultman,C. Lavoie,C. Cabral,Jean Jordan‐Sweet,Jan‐Otto Carlsson	1999	43
16	Activation energy for CoSi and CoSi2 formation measured during rapid thermal annealing Journal of Applied Physics ·E. G. Colgan,C. Cabral,David E. Kotecki	1995	24
17	Crystallographic texture change during abnormal grain growth in Cu-Co thin films Applied Physics Letters ·J. M. E. Harper,純森泉,D. A. Smith,Madhusudhana Reddy H,Karen Holloway,C. Cabral,D. P. Tracy,D. B. Knorr	1994	31
18	Giant magnetoresistance of dilute Cu(Co) granular films Journal of Applied Physics ·R. J. Gambino,T. R. McGuire,J. M. E. Harper,C. Cabral	1994	11
19	Rapid Evaluation of Thin Film Interfacial Reactions Using Temperature-Ramped Measurements MRS Proceedings ·J. M. E. Harper,L. A. Clevenger,E. G. Colgan,C. Cabral,W. Hachmann	1993	4
20	Detection of Titanium Silicide Formation and Phase Transformation by Picosecond Ultrasonics MRS Proceedings ·Heh‐Nan Lin,Robert Stoner,Humphrey J. Maris,J. M. E. Harper,C. Cabral,J.-M. Halbout,Gary W. Rubloff	1992	1

About C. Cabral

C. Cabral is a scholar working on Electronic, Optical and Magnetic Materials, Atomic and Molecular Physics, and Optics, Electrical and Electronic Engineering, Mechanics of Materials and Materials Chemistry, having authored 153 papers that have together received 4.8k indexed citations. Recurring topics across this work include Semiconductor materials and devices (67 papers), Semiconductor materials and interfaces (66 papers), Copper Interconnects and Reliability (47 papers), Metal and Thin Film Mechanics (24 papers), Intermetallics and Advanced Alloy Properties (21 papers), Silicon and Solar Cell Technologies (16 papers), Integrated Circuits and Semiconductor Failure Analysis (15 papers) and Electronic Packaging and Soldering Technologies (15 papers). The work is most often cited by research in Electronic, Optical and Magnetic Materials (1.7k citations), Electrical and Electronic Engineering (3.7k citations), Atomic and Molecular Physics, and Optics (1.8k citations), Mechanics of Materials (914 citations) and Materials Chemistry (1.6k citations). C. Cabral has collaborated with scholars based in United States, Germany and Sweden. Frequent co-authors include J. M. E. Harper, C. Lavoie, F. M. d’Heurle, Katayun Barmak, Christophe Detavernier, L. A. Clevenger, Jean Jordan‐Sweet, M. Copel, K. L. Saenger and Karen Holloway. Their work appears in journals such as Journal of Applied Physics, Applied Physics Letters, Journal of materials research/Pratt's guide to venture capital sources, Thin Solid Films and Journal of Vacuum Science & Technology A Vacuum Surfaces and Films.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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